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9. Effect of Nitridation for High-K Layers by ALCVDTM in Order to Decrease the Trapping in Non Volatile Memories

10. Oxidation of Suspended Stacked Silicon Nanowire for Sub-10nm Cross-Section Shape Optimization

12. 3D Suspended Nanowires Integration for CMOS and Beyond

13. Advanced Substrates for GaN-Based Power Devices

16. Embedded Vapor Chamber in Microelectronics Devices

20. Environment and baking influence on charge retention on silicon nitride charge trap layers.

21. Transistor Temperature Deviation Analysis in Monolithic 3D Standard Cells

22. Experimental Insights Into Thermal Dissipation in TSV-Based 3-D Integrated Circuits

24. Using TSVs for thermal mitigation in 3D circuits: Wish and truth

25. Thermal Effects of Silicon Thickness in 3-D ICs: Measurements and Simulations

27. Electrical and morphological assessment of via middle and backside process technology for 3D integration

29. CVD Growth and Passivation of W and TiN Nanocrystals for Non-volatile Memory Applications

30. Realization of Hybrid Silicon core/silicon Nitride Shell Nanodots by LPCVD for NVM Application

31. Impact of integrating microchannel cooling within 3D microelectronic packages for portable applications.

32. Stress Engineering in Germanium-Silicon Heterostructure Using Surface Activated Hot Bonding

34. 3D Suspended Nanowires Integration for CMOS and Beyond

35. Oxidation of Suspended Stacked Silicon Nanowire for Sub-10nm Cross-Section Shape Optimization

36. Growth and Thermal Stability of SiGe/Si Superlattices on Bulk Si Wafers

37. Effect of Nitridation for High-K Layers by ALCVDTM in Order to Decrease the Trapping in Non Volatile Memories

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