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Vertical optical confinement is a critical requirement for a wide range of III-V photonic devices where Al2O3 material is the typical oxide used due to its low refractive index. This oxide layer can be formed from the oxidation of AlAs in an epitaxial GaAs/AlAs/GaAs or AlGaAs/AlAs/GaAs stack, with the advantage that the top layer remains single-crystalline. The thick film oxidation of AlAs is required for photonic applications. In this article, we report the oxidation processes developed to fully convert AlAs to AlOx films by analyzing both thin (100 nm) and thick (500 nm) AlAs films on GaAs (001) and 2° miscut GaAs (111)A substrate. Systematic microscopic characterization is performed to demonstrate the absence of any delamination at the oxide interfaces and the evolution of the diffusive oxidation process microscopically characterized is compared with an optical (µ-Raman) characterization. We demonstrate the selectivity of the AlAs oxidation process with respect to the active Al0.18Ga0.82As layer and the GaAs substrate. Finally, the proposed method is adopted to create a high refractive index contrast between the active optical material and the environment in the specific case of a III-V photonic crystal device, highlighting the potential of this approach for non-linear photonic applications.

Inversion-symmetry breaking for second-harmonic generation in centrosymmetric Si and Ge is artificially realized with a pair of asymmetric-coupled SiGe quantum wells. Laser spectroscopy experiments demonstrate a nonlinear susceptibility four orders of magnitude larger than that of natural nonlinear materials in the visible range.

The spin-orbit interaction permits to control the state of a spin qubit via electric fields. For holes it is particularly strong, allowing for fast all electrical qubit manipulation, and yet an in-depth understanding of this interaction in hole systems is missing. Here we investigate, experimentally and theoretically, the effect of the cubic Rashba spin-orbit interaction on the mixing of the spin states by studying singlet-triplet oscillations in a planar Ge hole double quantum dot. Landau-Zener sweeps at different magnetic field directions allow us to disentangle the effects of the spin-orbit induced spin-flip term from those caused by strongly site-dependent and anisotropic quantum dot g tensors. Our work, therefore, provides new insights into the hole spin-orbit interaction, necessary for optimizing future qubit experiments. published

We report on a systematic analysis of phosphorus diffusion in silicon on insulator thin film via spin-on-dopant process (SOD). This method is used to provide an impurity source for semiconductor junction fabrication. The dopant is first spread into the substrate via SOD and then diffused by a rapid thermal annealing process. The dopant concentration and electron mobility were characterized at room and low temperature by four-probe and Hall bar electrical measurements. Time-of-flight-secondary ion mass spectroscopy was performed to estimate the diffusion profile of phosphorus for different annealing treatments. We find that a high phosphorous concentration (greater than 1020 atoms cm−3) with a limited diffusion of other chemical species and allowing to tune the electrical properties via annealing at high temperature for short time. The ease of implementation of the process, the low cost of the technique, the possibility to dope selectively and the uniform doping manufactured with statistical process control show that the methodology applied is very promising as an alternative to the conventional doping methods for the implementation of optoelectronic devices.

Spin qubits are considered to be among the most promising candidates for building a quantum processor. Group IV hole spin qubits are particularly interesting owing to their ease of operation and compatibility with Si technology. In addition, Ge offers the option for monolithic superconductor-semiconductor integration. Here, we demonstrate a hole spin qubit operating at fields below 10 mT, the critical field of Al, by exploiting the large out-of-plane hole g-factors in planar Ge and by encoding the qubit into the singlet-triplet states of a double quantum dot. We observe electrically controlled g-factor difference-driven and exchange-driven rotations with tunable frequencies exceeding 100 MHz and dephasing times of 1 μs, which we extend beyond 150 μs using echo techniques. These results demonstrate that Ge hole singlet-triplet qubits are competing with state-of-the-art GaAs and Si singlet-triplet qubits. In addition, their rotation frequencies and coherence are comparable with those of Ge single spin qubits, but singlet-triplet qubits can be operated at much lower fields, emphasizing their potential for on-chip integration with superconducting technologies.

We investigate spin transport in a set of $\text{Ge}/{\text{Si}}_{0.15}{\text{Ge}}_{0.85}$ multiple quantum wells (MQWs) as a function of the well thickness. We exploit optical orientation to photogenerate spin-polarized electrons in the discrete energy levels of the well conduction band at the $\mathrm{\ensuremath{\Gamma}}$ point of the Brillouin zone. After diffusion, we detect the optically oriented spins by means of the inverse spin-Hall effect (ISHE) taking place in a thin Pt layer grown on top of the heterostructure. The employed spin injection/detection scheme is sensitive to in-plane spin-polarized electrons, therefore, by detecting the ISHE signal as a function of the photon energy, we evaluate the spin polarization generated by optical transitions driven by the component of the light wave vector in the plane of the wells. In this way, we also gain insight into the electron spin-diffusion length in the MQWs. The sensitivity of the technique to in-plane spin-related properties is a powerful tool for the investigation of the in-plane component of the spin polarization in MQWs, which is otherwise commonly inaccessible.

We present the theoretical investigation and the experimental demonstration of second harmonic generation in the mid-infrared by hole-doped Ge/SiGe asymmetric quantum wells.

InGaN alloys are of raising interest for many applications. The possibility of tuning their functional properties with the composition sets the importance of finding methods to characterize these materials in a fast and non-destructive way. Raman spectroscopy is one of these techniques, being able to yield information about the composition, strain, and other relevant parameters. However, the method of measuring the composition with a calibration of the maximum A1(LO) band is today limited to regions which are either rich in In or in Ga. The middle composition range still needs a calibration. By measuring the Raman spectra of different In x Ga1-xN alloys grown epitaxially on Si and by comparing them with the results from X-ray diffraction, we investigated this missing region of compositions. Within the range of 30%-65%, we have found that the position of the maximum of A1(LO) scales with the In fraction x as ω x = 736-135x-24x 2 cm-1. With this calibration, it is possible to determine, by Raman spectroscopy, the composition of an unknown alloy with an uncertainty of 5%

The hopping ac conductance, which is realized at the transverse conductance minima in the regime of the integer Hall effect, has been measured using a combination of acoustic and microwave methods. Measurements have been made in the p-GeSi/Ge/GeSi structures with quantum wells in a wide frequency range (30-1200 MHz). The experimental frequency dependences of the real part of ac conductance $\sigma_1$ have been interpreted on the basis of the model presuming hops between localized electronic states belonging to isolated clusters. At high frequencies, dominating clusters are pairs of close states; upon a decrease in frequency, large clusters that merge into an infinite percolation cluster as the frequency tends to zero become important. In this case, the frequency dependences of the ac conductance can be represented by a universal curve. The scaling parameters and their magnetic-field dependence have been determined., Comment: 9 pages, 12 figures, 1 table

Interfaces play a crucial role in the study of novel phenomena emerging at heterostructures comprising metals and functional oxides. In this work, we consider Cr/BaTiO3 heterostructures grown on Nb:SrTiO3 (0 0 1) substrates. Chromium thin films with 2 nm nominal thickness are deposited by molecular beam epitaxy on the BaTiO3 layer, and subsequently annealed in vacuum at temperatures ranging from 800 K to 970 K, and finally exposed to 10−7 torr of molecular oxygen for 300 s. Highly ordered films are obtained for each of this condition, ranging from metallic Cr to insulating Cr2O3 with tetragonal structure. Quite unexpectedly, an intermediate – fully ordered – case exists, with the co-presence of Cr and Cr2O3 compounds, each one with its proper crystal orientation. These results show the opportunity of controlling the metal/oxide state of crystalline Cr films grown onto the ferroelectric template BaTiO3/Nb:SrTiO3.

We report on the design and simulation of a waveguide-integrated Ge/SiGe quantum-confined Stark effect (QCSE) optical modulator based on the use of a Ge-rich SiGe relaxed buffer on a graded buffer as an optical waveguide. Despite the promising potential of this waveguide platform, efficient and wideband optical integration with a Ge-based active device has not been properly addressed so far. In this paper, via 3D finite-difference time domain simulation, we demonstrate that a simple 2D taper is sufficient to enable adiabatic optical coupling from the fundamental mode of the input SiGe waveguide to the fundamental mode of the Ge/SiGe multiple quantum well (MQW) modulator without the excitation of higher-order modes in Ge/SiGe MQWs. The 2D taper shows good fabrication tolerance considering critical variations in its dimensions. Significantly, wideband optical modulation performance in terms of extinction ratio and insertion loss is presented over the whole low-loss spectral range of the Ge/SiGe MQWs at different electrical bias values, device lengths, and numbers of quantum wells in order to comprehensively report its potential for Si-based optical modulators.

Extending the functionality of ubiquitous Si-based microelectronic devices often requires combining materials with different lattice parameters and thermal expansion coefficients. In this paper, scanning X-ray nanodiffraction is used to map the lattice bending produced by thermal strain relaxation in heteroepitaxial Ge microcrystals of various heights grown on high aspect ratio Si pillars. The local crystal lattice tilt and curvature are obtained from experimental three-dimensional reciprocal space maps and compared with diffraction patterns simulated by means of the finite element method. The simulations are in good agreement with the experimental data for various positions of the focused X-ray beam inside a Ge microcrystal. Both experiment and simulations reveal that the crystal lattice bending induced by thermal strain relaxation vanishes with increasing Ge crystal height.

SiGe nanostructures on Ge membranes have been fabricated by electron beam lithography and anisotropic wet-chemical etching, starting from SiGe/Ge heterostructures epitaxially deposited on Si substrates. Two different top-down approaches have been studied in order to obtain the best freestanding structures. We find that the process in which the Ge membrane is suspended after the lithography of the SiGe nanostructures leads to high quality SiGe nanostructures without damage to either the SiGe nanostructures or the Ge membrane. The structures have been systematically analyzed at every step of the fabrication process, by scanning electron microscopy and by atomic force microscopy. Display Omitted SiGe nanostructures on Ge membranes have been fabricated by electron beam lithography and anisotropic wet-chemical etching.Two different top-down approaches have been studied in order to obtain the best nanostructures on freestanding structures.The quality of the obtained SiGe nanostructures is very high, neither the SiGe nanostructures nor the Ge membrane are damaged.

International audience; In this paper, the recent progress on a new Ge-rich SiGe platform for mid-IR integrated photonics is presented. Low-loss spiral waveguides working over a broadband wavelength range are discussed, followed by a sensing proof-of-concept using a standalone photoresist with a known spectral absorption pattern. In addition, the development of new mid-IR interferometric devices for wavelength filtering and enhancement of the light-matter interaction are presented. Finally, efficient designs to exploit the third-order nonlinearities in these Ge-rich SiGe waveguides at mid-IR wavelengths are shown. The demonstration of these key building blocks will pave the way towards the implementation of new mid-IR photonic integrated systems with multiple functionalities.

The growth dynamics of Ga(In)N semiconductors by Plasma-Assisted Molecular Beam Epitaxy (PAMBE) at low temperatures (T = 450 °C) is here investigated. The presence of droplets at the growth surface strongly affects the adatom incorporation dynamics, making the growth rate a decreasing function of the metal flux impinging on the surface. We explain this phenomenon via a model that considers droplet effects on the incorporation of metal adatoms into the crystal. A relevant role is played by the vapor-liquid-solid growth mode that takes place under the droplets due to nitrogen molecules directly impinging on the droplets. The role of droplets in the growth dynamics here observed and modeled in the case of Nitride semiconductors is general and it can be extended to describe the growth of the material class of binary compounds when droplets are present on the surface.

The effective g-factor of 2D holes in modulation doped \mbox{p-SiGe/Ge/SiGe} structures was studied. The AC conductivity of samples with hole densities from $3.9 \times 10^{11}$~to $6.2 \times 10^{11}~\text{cm}^{-2}$ was measured in perpendicular magnetic fields up to $8~\text{T}$ using a contactless acoustic method. From the analysis of the temperature dependence of conductivity oscillations, the $\mathrm{g}_{\perp}$-factor of each sample was determined. The $\mathrm{g}_{\perp}$-factor was found to be decreasing approximately linearly with hole density. This effect is attributed to non-parabolicity of the valence band., 4 pages, 5 figures

Germanium (Ge) has played a key role in silicon photonics as an enabling material for datacom applications. Indeed, the unique properties of Ge have been leveraged to develop high performance integrated photodectors, which are now mature devices. Ge is also very useful for the achievement of compact modulators and monolithically integrated laser sources on silicon. Interestingly, research efforts in these domains also put forward the current revolution of mid-IR photonics. Ge and Ge-based alloys also present strong advantages for mid-infrared photonic platform such as the extension of the transparency window for these materials, which can operate at wavelengths beyond 8 μm. Different platforms have been proposed to take benefit from the broad transparency of Ge up to 15 μm, and the main passive building blocks are now being developed. In this review, we will present the most relevant Ge-based platforms reported so far that have led to the demonstration of several passive and active building blocks for mid-IR photonics. Seminal works on mid-IR optical sensing using integrated platforms will also be reviewed.

[object Object]Tungsten-on-n+ silicon ohmic contacts were obtained by depositing 100 nm-thick W coatings on silicon substrates using pulsed laser deposition at room temperature, without native oxide removal. The high energy of the impinging species (about 10-100 eV per atom) led to sputtering phenomena and to the implantation of Watoms through the Si oxide. W coatings were characterized, as-deposited and after performing rapid thermal annealing steps. The morphology and crystallinity were characterized by scanning electron microscopy, X-ray diffraction and reflectometry. The interdiffusion of W and Si was shown by scanning Auger microscopy. The ohmic character of the contacts and contact resistance were investigated by the transfer length method. Fast annealing at moderate temperatures (450 °C) remarkably improved contact performance without significant variation of the features of either W film or Si substrates. The ohmic character of the contact was preserved even after annealing at high temperature (1000 °C) at which a complete interdiffusion of Si into the W film takes place.

We experimentally investigate the smallest germanium waveguide cavity resonators on silicon that can be designed to work around 1.55 mu m wavelength and observe an almost 30-fold enhancement in the collected spontaneous emission per unit volume when compared to a continuous germanium film of the same thickness. The enhancement is due to an effective combination of (i) excitation enhancement at the pump wavelength, (ii) emission enhancement (Purcell effect) at the emission wavelength, and (iii) effective beaming by the nanoresonators, which act as optical antennas to enhance the radiation efficiency. Our results set a basis for the understanding and engineering of light emission based on subwavelength, CMOS-compatible nanostructures operating at telecommunication wavelengths.

International audience; Electro-refraction in standard (sQW) and coupled (cQW) Ge/SiGe quantum wells grown on Si have been investigated by means of optical transmission measurements performed on planar waveg-uides. The anomalous Quantum confined Stark Effect observed in the coupled quantum well structure strongly enhance the electro-refractive effect with respect to sQW.

The introduction of strain in semiconductors is a well-known technique exploited in microelectronics to increase their mobility and thus to enhance the performance of silicon-based electronic devices. Moreover, tensile strain is one feasible route towards converting Ge into an efficient light emitter. Here we show how the application of local strain via nanopatterning opens a wider parameter space for strain engineering in semiconductors of the Si/Ge material system. The general approach relies on the top-down fabrication of SiGe stressors realized by electron-beam lithography (EBL) and reactive-ion etching (RIE). Specifically, compressive strain can be locally applied to pure Si and tensile strain can be applied to pure Ge. Raman spectroscopy is used to investigate the strain induced in Si or Ge bulk like substrates. Furthermore, the realization of stressors on micro-bridges demonstrates higher achievable strain level if compared to the attached bulk-like case. The strain enhancement is due to the high sharing of elastic energy in between the nanostructures and the bridges. The SiGe stressor approach hence presents a CMOS compatible alternative for strain creation in Si, Ge and SiGe.

International audience; This work explores the use of Ge-rich graded-index Si 1-x Ge x rib waveguides as building blocks to develop integrated nonlinear optical devices for broadband operation in the mid-IR. The vertical Ge gradient concentration in the waveguide core renders unique properties to the guided optical mode, providing tight mode confinement over a broadband mid-IR wavelength range from λ = 3 µm to 8 µm. Additionally, the gradual vertical confinement pulls the optical mode upwards in the waveguide core, overlapping with the Ge-rich area where the nonlinear refractive index is larger. Moreover, the Ge-rich graded-index Si 1-x Ge x waveguides allow efficient tailoring of the chromatic dispersion curves, achieving flat anomalous dispersion for the quasi-TM optical mode with D ≤ 14 ps/nm/km over a ~ 1.4 octave span while retaining an optimum third-order nonlinear parameter, γ eff. These results confirm the potential of Ge-rich graded-index Si 1-x Ge x waveguides as an attractive platform to develop mid-IR nonlinear approaches requiring broadband dispersion engineering.

In the last years Ge/SiGe multiple quantum wells (MQW) have received a great attention in the context of silicon photonics for the realization of efficient electro-absorption modulators based on the quantum confined stark effect. At present day, one of the main problems to be addressed toward the integration of Ge/SiGe MQW modulators is their coupling with passive optical components such as waveguides. In particular, the integration with silicon waveguides is very difficult due to the presence of a thick SiGe layer which act as a virtual substrate (VS) for the MQW stack. In this work we demonstrate that the VS can be used as a low loss optical waveguide by choosing a suitable compositional mismatch with respect to the MQW stack. A photonic interconnection made by a Ge/SiGe MQW modulator connected to a Ge/SiGe MQW photodetector through a SiGe waveguide has been fabricated and tested in order to demonstrate the great potential of this approach. The whole structure has been deposited on a silicon substrate in a single epitaxial step by low energy plasma enhanced chemical vapor deposition. The optical insertion loss of the device is less than 5 dB/cm. 5 and 10 µA are obtained in the photodetector with 1V and 3V voltage swing at the modulator. The photodetector bias is -1V and the dark current is 10 nA. Similar performance can be obtained in a wide spectral range from 1430 nm to 1450 nm. This demonstration confirms that Ge quantum well interconnects are feasible for low-voltage broadband optical links integrated on silicon chips. Our approach can be extended to any kind of Ge-based optoelectronic devices working within telecommunication wavelengths as long as a suitable Ge concentration is selected for the Ge-rich virtual substrate.

The concept of growing epitaxial Ge and SiGe crystals onto tall Si pillars may provide a means for solving the problems associated with lattice parameter and thermal expansion coefficient mismatch, i.e., dislocations, wafer bowing and cracks. For carefully tuned epitaxial growth conditions the lateral expansion of crystals stops once nearest neighbors get sufficiently close. We have carried out scanning nano-diffraction experiments at the ID01 beam-line of the European Synchrotron Radiation Facility (ESRF) in Grenoble on the resulting space-filling arrays of micron-sized crystals to assess their structural properties and crystal quality. Elastic relaxation of the thermal strain causes lattice bending close to the Si interface, while the dislocation network is responsible for minute tilts of the crystals as a whole. To exclude any interference from nearest neighbors, individual Ge crystals were isolated first by chemical etching followed by micro-manipulation inside a scanning electron microscope. This permitted us to scan an X-ray beam, focused to a spot a few hundreds of nm in size, along the height of a single crystal and to record three-dimensional reciprocal space maps at chosen heights. The resolution limited width of the scattered X-ray beams reveals that the epitaxial structures evolve into perfect single crystals sufficiently far away from the heavily dislocated interface.

The paper reports on the developments of Ge/SiGe quantum well (QW) waveguide modulators operating at 1.3 μm. Two modulator configurations have been studied: The first one is based on QW structures grown on a 13-μm SiGe buffer on bulk silicon. Light was directly coupled and propagated in Ge/Si0.35Ge0.65 QWs. Using a 3-μm-wide and 50-μm-long modulator, an extinction ratio (ER) up to 6 dB was obtained at 1.3 μm. In the second configuration, the aim is to integrate Ge/SiGe QW on standard silicon-on-insulator (SOI) waveguides. A reduction of buffer thickness is then required to allow the light coupling from Si waveguide to Ge/SiGe QW. To this purpose, first we demonstrated QCSE with a thin (360-nm-thick) Si0.08Ge0.92 buffer on silicon using the well-known Ge/Si0.15Ge0.85 QWs (operated at a wavelength of 1.4 μm). Based on these promising experimental results, we theoretically investigated properties of a Ge/Si0.65Ge0.35 QW modulator integrated on SOI waveguides. 7.7 dB ER were predicted with 4 dB optical insertion loss and an estimated energy consumption of 59 fJ/bit for a modulator length as short as 69 μm.

We present a method for monolithically integrating mismatched semiconductor materials with Si, coined three-dimensional (3D) heteroepitaxy. The method comprises the replacement of conventional, continuous epilayers by dense arrays of strain- and defect-free, micron-sized crystals. The crystals are formed by a combination of deep-patterning of the Si substrates and self-limited lateral expansion during the epitaxial growth. Consequently, the longstanding issues of crack formation and wafer bowing can be avoided. Moreover, threading dislocations can be eliminated by appropriately choosing pattern sizes, layer thicknesses and surface morphology, the latter being dependent on the growth temperature. We show this approach to be valid for various material combinations, pattern geometries and substrate orientations. We demonstrate that Ge crystals evolve into perfect structures away from the heavily dislocated interface with Si, by using a synchrotron X-ray beam focused to a spot a few hundred nanometers in size and by recording 3D reciprocal space maps along their height. Room temperature photoluminescence (PL) experiments reveal that the interband integrated PL intensity of the Ge crystals is enhanced by almost three orders of magnitude with respect to that of Ge epilayers directly grown on flat Si substrates. Electrical measurements performed on single heterojunction diodes formed between 3D Ge crystals and the Si substrate exhibit rectifying behavior with dark currents of the order of 1 mA/cm2. For GaAs the thermal strain relaxation as a function of pattern size is similar to that found for group IV materials. Significant differences exist, however, in the evolution of crystal morphology with pattern size, which more and more tends to a pyramidal shape defined by stable {111} facets with decreasing width of the Si pillars. © 2013 Elsevier B.V.

Hole mobilities at low and room temperature (RT) have been studied for a strained sGe/SiGe heterostructure using standard Van der Pauw resistivity and Hall effect measurements. The range of magnetic field and temperatures used were - 14 T < B < + 14 T and 1.5 K < T < 300 K respectively. Using maximum entropy-mobility spectrum analysis (ME-MSA) and Bryan's algorithm mobility spectrum (BAMS) analysis, a RT two dimensional hole gas drift mobility of (3.9 ± 0.4) × 103 cm2/V s was determined for a sheet density (ps) 9.8 × 1010 cm− 2 (by ME-MSA) and (3.9 ± 0.2) × 103 cm2/V s for a sheet density (ps) 5.9 × 1010 cm− 2 (by BAMS).

Germanium/Silicon-Germanium (Ge/SiGe) multiple quantum wells receive great attention for the realization of Si-based optical modulators, photodetectors, and light emitters for short distance optical interconnects on Si chips. Ge quantum wells incorporated between SiGe barriers, allowing a strong electro-absorption mechanism of the quantum-confined Stark effect (QCSE) within telecommunication wavelengths. In this review, we respectively discuss the current state of knowledge and progress of developing optical modulators, photodetectors, and emitters based on Ge/SiGe quantum wells. Key performance parameters, including extinction ratio, optical loss, swing bias voltages, and electric fields, and modulation bandwidth for optical modulators, dark currents, and optical responsivities for photodetectors, and emission characteristics of the structures will be presented.

Despite being an indirect bandgap material, germanium (Ge) recently appeared as a material of choice for low power consumption optical link on silicon. Thanks to a low energy difference between direct and indirect energy bandgap, optical transitions around the direct gap can be used to achieve strong electroabsorption or photodetection in a material already used in microelectronics circuits. However, many challenges have to be addressed such as the growth of germanium-rich structures on silicon or the modeling of these structures around both direct and indirect bandgaps. This paper will explore recent achievements in Ge/SiGe quantum wells structures. Quantum confined Stark effect has been studied for different quantum well designs and light polarization. Both absorption and phase variations have been characterized and will be reported. Carrier recombination processes is also an intense research topic, in order to evaluate the competition between direct and indirect band gap emission as a function of temperature. Main results and conclusion will be introduced. Finally, high performance photonic devices (modulator and photodetector) that have already been demonstrated will be presented. At the end the challenges faced by Ge/SiGe QW as a new photonic platform will be presented.

Thermoelectrics are presently used in a number of applications for both turning heat into electricity and also for using electricity to produce cooling. Mature Si/SiGe and Ge/SiGe heteroepitaxial growth technology would allow highly efficient thermoelectric materials to be engineered, which would be compatible and integrable with complementary metal oxide silicon micropower circuits used in autonomous systems. A high thermoelectric figure of merit requires that electrical conductivity be maintained while thermal conductivity is reduced; thermoelectric figures of merit can be improved with respect to bulk thermoelectric materials by fabricating low-dimensional structures which enhance the density of states near the Fermi level and through phonon scattering at heterointerfaces. We have grown and characterized Ge-rich Ge/SiGe/Si superlattices for nanofabricated thermoelectric generators. Low-energy plasma-enhanced chemical vapor deposition has been used to obtain nanoscale-heterostructured material which is several microns thick. Crystal quality and strain control have been investigated by means of high resolution X-ray diffraction. High-resolution transmission electron microscopy images confirm the material and interface quality. Electrical conductivity has been characterized by the mobility spectrum technique.

We report on light modulation, detection, and emission characteristics of Ge/SiGe multiple quantum well waveguides using the same epitaxial growth and fabrication steps. As an electro-absorption modulator, the device exhibits the capability to achieve high extinction ratio with low swing bias voltages and high modulation bandwidth. As a photodetector, dark currents, optical responsivities, and high speed performance have been studied. High speed light detection up to 10 Gb/s has been obtained simultaneously with good values of optical responsivity. As a light emitting diode, direct gap electroluminescence (EL) from the Ge/SiGe MQW waveguides has been experimentally demonstrated at room temperature within the spectral range of light modulation and detection.

Thermoelectric materials have great potential for a range of energy harvesting applications. The thermoelectric performance of Ge/SiGe heterostructures is presented with the aim of developing materials to be used as power sources for autonomous sensing applications. Seebeck coefficients up to 279.5 {plus minus} 1.2 µV/K with electrical conductivities of 77,200 S/m are demonstrated at room temperature with power factors of 6.02 {plus minus} 0.05 mW m-1K-2.

A new technique to measure the thermal conductivity of thermoelectric materials at the microscale has been developed. The structure allows the electrical conductivity, thermal conductivity, and Seebeck coefficient to be measured on a single device. The thermal conductivity is particularly difficult to measure since it requires precise estimation of the heat flux injected into the material. The new technique is based on a differential method where the parasitic contributions of the supporting beams of a Hall bar are removed. The thermal measurements with integrated platinum thermometers on the device are cross-checked using thermal atomic force microscopy and validated by finite-element analysis simulations.

Graded Si 1−x Ge x waveguides with tight mode confinement in a broadband range of mid-infrared wavelengths are presented. Optimum TM mode confinement is observed due to the vertical variation of the refractive index. These waveguides show good potential for implementation as passive elements in mid-infrared optical circuits where strong mode confinement is required for a broadband range of wavelengths.

Photoluminescence up to 2.25 μm wavelength is demonstrated from Ge nanopillars strained by silicon nitride stressor layers. Tensile biaxial equivalent strains of up to ~ 1.35% and ~ 0.9% are shown from 200 × 200 nm, and 300 × 300 nm square top Ge pillars respectively. Strain in the latter is confirmed by Raman spectroscopy, and supported by finite element modelling, which gives an insight into the strain distribution and its effect on the band structure, in pillar structures fully coated by silicon nitride stressor layers.

We present a study on the crystallization process of undoped and Ta doped TiO2 amorphous thin films. In particular, the effect of ultra-fast annealing treatments in environments characterized by different oxygen concentrations is investigated via in-situ resistance measurements. The accurate examination of the key parameters involved in this process allows us to reduce the time needed to obtain highly conducting and transparent polycrystalline thin films (resistivity about $6 \times 10^{-4}$ {\Omega}cm, mean transmittance in the visible range about $81\%$) to just 5 minutes (with respect to the 180 minutes required for a standard vacuum annealing treatment) in nitrogen atmosphere (20 ppm oxygen concentration) at ambient pressure. Experimental evidence of superficial oxygen incorporation in the thin films and its detrimental role for the conductivity are obtained by employing different concentrations of traceable 18O isotopes during ultra-fast annealing treatments. The results are discussed in view of the possible implementation of the ultra-fast annealing process for TiO2-based transparent conducting oxides as well as electron selective layers in solar cell devices; taking advantage of the high control of the ultra-fast crystallization processes which has been achieved, these two functional layers are shown to be obtainable from the crystallization of a single homogeneous thin film., Comment: 30 pages (including Supporting Information and graphical TOC), 4 figures

In this work we will show how local substrate patterning leads to a long range controlled propagation of dislocations in SiGe films grown on Si(001) substrates. Dislocations preferentially nucleate in the inhomogeneous strain field associated with the patterned pits, and then partialize on the local (111) surfaces which form the pit sidewalls. The resulting V-shaped defects extend for several microns and effectively block the propagation of randomly nucleated dislocations which propagate in the perpendicular direction. The surface morphology and strain fields associated with the extended defects have been characterized by atomic force microscopy and μRaman spectroscopy, and the defects have been directly observed with high resolution transmission electron microscopy.

Silicon and germanium materials have demonstrated an increasing attraction for energy harvesting, due to their sustainability and integrability with complementary metal oxide semiconductor and micro-electro-mechanical-system technology. The thermoelectric efficiencies for these materials, however, are very poor at room temperature and so it is necessary to engineer them in order to compete with telluride based materials, which have demonstrated at room temperature the highest performances in literature [1].\ud \ud Micro-fabricated devices consisting of mesa structures with integrated heaters, thermometers and Ohmic contacts were used to extract the cross-plane values of the Seebeck coefficient and the thermal conductivity from p- and n-Ge/SixGe1-x superlattices. A second device consisting in a modified circular transfer line method structure was used to extract the electrical conductivity of the materials. A range of p-Ge/Si0.5Ge0.5 superlattices with different doping levels was investigated in detail to determine the role of the doping density in dictating the thermoelectric properties. A second set of n-Ge/Si0.3Ge0.7 superlattices was fabricated to study the impact that quantum well thickness might have on the two thermoelectric figures of merit, and also to demonstrate a further reduction of the thermal conductivity by scattering phonons at different wavelengths. This technique has demonstrated to lower the thermal conductivity by a 25% by adding different barrier thicknesses per period.

The monolithic integration of photonic functionality into silicon microtechnology is widely advanced. Yet, there is no final solution for the realization of a light source compatible with the prevailing complementary metal-oxide-semiconductor technology. A lot of research effort focuses on germanium (Ge) on silicon (Si) heterostructures and tensile strain application to Ge is accepted as one feasible route to make Ge an efficient light emitter. Prior work has documented the special suitability of Ge membranes to reach the high tensile strain. We present a top-down approach for the creation of SiGe stressors on Ge micro-bridges and compare the obtained strain to the case of an attached bulk-like Ge layer. We could show that the Ge influenced by a SiGe stressor is under tensile strain; absolute strain values are of the order of 0.7% for both micro-bridge and bulk. The relative strain induced by the nanostructures in the micro-bridge is 1.3% due to the high sharing of elastic energy between nanostructures and bridges.