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Highly ordered polycrystalline indium gallium oxide (PC-IGO) film is obtained by the crystallization of room temperature sputtered amorphous IGO on a hot plate at 350 °C for 1 h and then annealed for 1 h in an N

Indium-tin-zinc oxide (ITZO) films were deposited at various nitrogen flow ratios using magnetron sputtering. At a nitrogen flow ratio of 40%, the structure of ITZO film changed from amorphous, with a short-range-ordered In2O3 phase, to a c-axis oriented InN polycrystalline phase, where InN starts to nucleate from an amorphous In2O3 matrix. Whereas, nitrogen addition had no obvious effect on the structure of indium-gallium-zinc oxide (IGZO) films even at a nitrogen flow ratio of 100%. Nitrogen addition also suppressed the formation of oxygen-related vacancies in ITZO films when the nitrogen flow ratio was less than 20%, and higher nitrogen addition led to an increase in carrier density. Moreover, a red-shift in the optical band edge was observed as the nitrogen flow ratio increased, which could be attributed to the generation of InN crystallites. We anticipate that the present findings demonstrating nitrogen-addition induced structural changes can help to understand the environment-dependent instability in amorphous IGZO or ITZO based thin-film transistors (TFTs).

We have succeeded in developing high-performance p-type of organic semiconductors with phenylethynyl groups, which have high filed-effect mobilities (> 3cm2V-1s-1) by improving molecular planarity. A single crystal of the organic semiconductors has a herringbone structure. It plays an important role for carrier transport. In addition, we found that they had lower contact resistances to Au electrodes as well. Then, we used the materials for the carrier injection layer deposited onto another organic semiconductor we developed recently, which achieved a high field-effect mobility, and a low threshold voltage (Vth).

Objective Intraoperative auditory brainstem response (ABR)-monitoring is useful for hearing preservation in patients undergoing cerebellopontine angle surgery. Prolongation of the latency of wave V, for example, is observed under surgical stress such as cerebellar retraction. We analyzed intraoperative ABR findings to study the neurophysiological mechanism(s) underlying latency prolongation. Methods The ABR recorded during microvascular decompression surgery was studied in 18 patients with hemifacial spasm. We measured each trace of the ABR records, both the latency of each wave and some interpeak latencies. We also analyzed their waveforms especially in the early component, to assess changes during surgery. Results The latency of wave V varied with cerebellar retraction. The delayed latency of wave V was correlated with the prolonged interpeak latency of waves I–III. An additional wave (designated wave I′) between waves I and II was appeared; it was accompanied by a prolongation in the latency of wave V. Wave I′ contributed to prolongation of the interpeak latency of waves I–III, resulting in a delay in the latency of wave V. Chronological analysis revealed that the minimum latency of wave I′ was the same as wave IN, suggesting that wave I′ arose near the porus acusticus internus (PAI). Conclusion Our study showed that cerebellar retraction may result in conduction impairment of the auditory nerve near the PAI, suggesting that the Obersteiner-Redlich zone is an electrophysiologically vulnerable site and wave I′ is derived from the change in the vector of wave IN. Significance Our findings may provide neurophysiological evidence to support the theoretical model of ABR generators by Scherg and von Cramon.

In a previous work, we reported the high field effect mobility of ZnO-doped In2O3 (IZO) thin film transistors (TFTs) irradiated by excimer laser annealing (ELA) [M. Fujii et al., Appl. Phys. Lett. 102, 122107 (2013)]. However, a deeper understanding of the effect of ELA on the IZO film characteristics based on crystallinity, carrier concentrations, and optical properties is needed to control localized carrier concentrations for fabricating self-aligned structures in the same oxide film and to adequately explain the physical characteristics. In the case of as-deposited IZO film used as the channel, a high carrier concentration due to a high density of oxygen vacancies was observed; such a film does not show the required TFT characteristics but can act as a conductive film. We achieved a decrease in the carrier concentration of IZO films by crystallization using ELA. This means that ELA can form localized conductive or semi-conductive areas on the IZO film. We confirmed that the reason for the carrier concentration decrease was the decrease of oxygen-deficient regions and film crystallization. The annealed IZO films showed nano-crystalline phase, and the temperature at the substrate was substantially less than the temperature limit for flexible films such as plastic, which is 50°C. This paves the way for the formation of self-aligned structures and separately formed conductive and semi-conductive regions in the same oxide film.

Amorphous indium–gallium–zinc oxide (a-IGZO) films were deposited by DC magnetron sputtering and post-annealed in air at 300–1000 °C for 1 h to investigate the crystallization behavior in detail. X-ray diffraction, electron beam diffraction, and high-resolution electron microscopy revealed that the IGZO films showed an amorphous structure after post-annealing at 300 °C. At 600 °C, the films started to crystallize from the surface with c-axis preferred orientation. At 700–1000 °C, the films totally crystallized into polycrystalline structures, wherein the grains showed c-axis preferred orientation close to the surface and random orientation inside the films. The current–gate voltage (I d–V g) characteristics of the IGZO thin-film transistor (TFT) showed that the threshold voltage (V th) and subthreshold swing decreased markedly after the post-annealing at 300 °C. The TFT using the totally crystallized films also showed the decrease in V th, whereas the field-effect mobility decreased considerably.

Degradation caused by Joule heating of transparent amorphous oxide semiconductor thin-film transistors (TFTs) is an important issue for display technology. Deep understanding of the mechanism of self-heating degradation generated by driving pulse voltage will pave the way for the development of highly reliable flexible displays. In this work, by using a pseudo interval measurement method, we examined the relationship of the highest and the lowest heating temperature in pulse 1 cycle and frequency. These self-heating converged to a constant temperature under pulse voltage applied at 1 kHz. Moreover, the long-term reliability under positive-bias stress voltage at 1 kHz of low converged temperature condition was improved relative to that of the stress voltage at 10 Hz of dynamic temperature change condition. We discussed the degradation mechanism of oxide TFTs generated by pulse voltage, and clarified that the degradation was accelerated by thermionic emission which occurred at low frequency.

This work presents the spatial distribution of electrical characteristics of amorphous indium-tin-zinc oxide film (a-ITZO), and how they depend on the magnetron sputtering conditions using O2, H2O, and N2O as the reactive gases. Experimental results show that the electrical properties of the N2O incorporated a-ITZO film has a weak dependence on the deposition location, which cannot be explained by the bombardment effect of high energy particles, and may be attributed to the difference in the spatial distribution of both the amount and the activity of the reactive gas reaching the substrate surface. The measurement for the performance of a-ITZO thin film transistor (TFT) also suggests that the electrical performance and device uniformity of a-ITZO TFTs can be improved significantly by the N2O introduction into the deposition process, where the field mobility reach to 30.8 cm2 V–1 s–1, which is approximately two times higher than that of the amorphous indium-gallium-zinc oxide TFT.