1. Improved ohmic contacts for SiC nanowire devices with nickel-silicide
- Author
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Dae-Young Jeon, Maelig Ollivier, Laurence Latu-Romain, Francesca Rossi, Min-Kyu Joo, Ji-Hoon Choi, Louis Fradetal, Giovanni Attolini, Edwige Bano, Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC), Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut National Polytechnique de Grenoble (INPG)-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS), Laboratoire des technologies de la microélectronique (LTM), Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS), School of Electrical Engineering [Korea University], Korea University [Seoul], Laboratoire des matériaux et du génie physique (LMGP ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut National Polytechnique de Grenoble (INPG)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Istituto dei Materiali per l'Elettronica ed il Magnetismo [Genova] (IMEM-CNR), National Research Council of Italy | Consiglio Nazionale delle Ricerche (CNR), European Project: 257375,ICT,FP7-ICT-2009-5,NANOFUNCTION(2010), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS), Institut National Polytechnique de Grenoble (INPG)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), and Consiglio Nazionale delle Ricerche (CNR)
- Subjects
Materials science ,Annealing (metallurgy) ,Nanowire ,02 engineering and technology ,01 natural sciences ,Diffusion ,chemistry.chemical_compound ,0103 physical sciences ,Silicide ,Materials Chemistry ,Silicon carbide ,Ohmic contact ,010302 applied physics ,business.industry ,Mechanical Engineering ,Metals and Alloys ,Heterojunction ,Nanostructured materials ,[CHIM.MATE]Chemical Sciences/Material chemistry ,021001 nanoscience & nanotechnology ,Electrical transport ,Semiconductor ,Semiconductors ,chemistry ,Mechanics of Materials ,Optoelectronics ,0210 nano-technology ,business ,Current density - Abstract
International audience; The effect of annealing temperature has been investigated to obtain a low ohmic contact for silicon carbide nanowire field-effect transistor (SiC NW FET). Fabrication of two types of SiC NW FET has been studied using cylinder and needle shapes of SiC NW. The experimental results show that an annealing temperature of 650 °C leads to the lowest ohmic contact resistance on SiC NW FET. It is believed that the Ni silicide phases formed on SiC NWs make low resistance ohmic contacts. Ni silicide phases begin to intrude into the SiC NW channel after an annealing step at 700 °C for 30 s and consequently, it forms either a SiC/Ni silicide heterostructure or a fully Ni silicidized SiC NW depending on the channel length. A fully silicidized SiC NW exhibits a low channel resistance (740 Ω) and a high current density (1.46 × 107 A cm−2 at 1.4 V). The needle shape of SiC NWs is transformed into a bead necklace like morphology after Ni silicide intrusion.
- Published
- 2015
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