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7. Effect of Chemical Pressure on High Temperature Ferrimagnetic Double Perovskites Sr2CrOsO6 and Ca2CrOsO6

9. Hybrid Edge Termination for High-Voltage Vertical GaN Devices: Empirical Validation and Robust Processing Tolerance

12. Activation of implanted Si, Ge, and Sn donors in high-resistivity halide vapor phase epitaxial β-Ga2O3:N with high mobility

13. A Simple Edge Termination Design for Vertical GaN P-N Diodes

16. Beryllium doped semi-insulating GaN without surface accumulation for homoepitaxial high power devices.

17. Microstructural evolution of extended defects in 25 μm thick GaN homo-epitaxial layers.

21. Characterization and Modeling of a 1.3 kV Vertical GaN Diode

23. Activation of implanted Si, Ge, and Sn donors in high-resistivity halide vapor phase epitaxial β-Ga2O3:N with high mobility.

24. Delta-doped β-(AlxGa1−x)2O3/Ga2O3 heterostructure field-effect transistors by ozone molecular beam epitaxy

28. Structural and electronic properties of Si- and Sn-doped (−201) β-Ga2O3 annealed in nitrogen and oxygen atmospheres

30. Room-temperature skyrmions in strain-engineered FeGe thin films

33. Market Basket Analysis with Shortened Web Link Click Data

34. Demonstration of CuI as a P–N heterojunction toβ-Ga2O3

36. GaN-On-Diamond HEMT Technology With TAVG = 176°C at PDC,max = 56 W/mm Measured by Transient Thermoreflectance Imaging

37. Vertical power devices enabled by bulk GaN substrates

38. High resistivity halide vapor phase homoepitaxial β-Ga2O3 films co-doped by silicon and nitrogen

39. Characterization of β-Ga2O3 homoepitaxial films and MOSFETs grown by MOCVD at high growth rates.

45. High resistivity halide vapor phase homoepitaxial β-Ga2O3 films co-doped by silicon and nitrogen.

46. (Invited) Recent Progress in Medium-Voltage Vertical GaN Power Devices.

47. Study of anode doping and avalanche in foundry compatible 1.2 kV vertical GaN PiN diodes

49. Exceptionally high magnetization of stoichiometric Y3Fe5O12 epitaxial films grown on Gd3Ga5O12

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