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Carbon-doped GaAs and Al x Ga 1-x As epilayers have been grown by solid source MBE using resistively heated, pyrolytic graphite filaments for the carbon source. These films were characterized by SIMS, Van der Pauw, X-ray diffraction, photoluminescence. TEM, I-V, and RHEED measurements. The diffusion coefficients and minority carrier lifetimes for C- and Be-doped epilayers are compared. Some potential device applications for C-doped layers are discussed

A laser light source for high-resolution near-field optics applications with an output power exceeding 1 mW (104 times the power from previous sources) and small (300 nm square to less than 50 nm square) output beam size is demonstrated. The very-small-aperture laser (VSAL) tremendously expands the range of applications possible with near-field optics and increases the signal-to-noise ratios and data rates obtained in existing applications. As an example, 250-nm-diam marks corresponding to 7.5 Gb/in.2 storage density have been recorded and read back in reflection and transmission on a rewritable phase-change disk at 24 Mb/s with a 250-nm-square aperture VSAL. VSALs potentially enable data storage densities of over 500 Gb/in.2 (up to 100 times today’s magnetic or optical storage densities).

Demonstration de l'influence de l'ancrage du niveau de Fermi a la surface d'un semiconducteur sur la distribution en dopant. Il resulte de la derive de l'impurete durant la croissance du cristal par epitaxie par jet moleculaire. L'etude par spectroscopie de masse d'ions secondaires (SIMS) montre une decroissance drastique de la derive du silicium de surface lors de l'ecrantage de l'interaction dipolaire. L'inversion du champ electrique de surface resulte en une migration des impuretes Be dans GaAs, de la surface vers le substrat, pendant la croissance

Spatial localization of Be in δ‐doped GaAs within few lattice constants (

Secondary ion mass spectrometry (SIMS) has been used to study the depth profiles of beryllium (Be) incorporation and diffusion in GaAs/AlGaAs heterostructures of graded index separate confinement heterostructure quantum well lasers. The epilayers were grown by molecular‐beam epitaxy with a thermally cracked As2 source. The GaAs quantum well was Be‐doped with Be at 2×1019 cm−3 using a substrate growth temperature of 580 °C and the Al0.4Ga0.6As confinement layers were grown at 630 °C. SIMS measurements show negligible diffusion of Be under these growth conditions. SIMS depth profiling was also used to resolve thin (2 nm) GaAs smoothing layers incorporated in Al0.4Ga0.6As confinement layers.

Secondary‐ion mass spectrometric analysis of InP/Ga0.47In0.53As heterostructures incorporating Sn‐doped regions has been used to study the distribution of Sn in InP during molecular beam epitaxy. Depending upon the flux conditions, up to a monolayer of Sn can accumulate on the growing InP surface, and the surface accumulation mediates the incorporation of Sn into the growing layer. The surface to bulk distribution ratio of Sn per monolayer grown is less than 10−3. Once the surface has been saturated all additional Sn in the beam is incorporated and concentrations exceeding 1020 cm−3 can be achieved.

The incorporation of Sn into Ga0.47In0.53As grown at 450 °C by hydride source molecular beam epitaxy at concentrations ranging from about 3×1018 to 1×1021 Sn/cm3 has been investigated. Sn is a well behaved donor to about n=1020 cm−3, although increasing compensation is noted with increasing doping. At total concentrations beyond about 1020 cm−3 added Sn is not electrically active although the epitaxial quality remains high without noticeable morphology changes, defects, or precipitates, to at least 1021 Sn/cm3 .

We have designed, constructed, and are now performing experiments with a proof-of-concept projection electron-beam lithography system based upon the SCALPELR (scattering with angular limitation projection electron-beam lithography) principle. This initial design has enabled us to demonstrate the feasibility of not only the electron optics, but also the scattering mask and resist platform. In this paper we report on some preliminary results which indicate the lithographic potential and benefits of this technology for the production of sub-0.18 micrometer features.

One of the fundamental requirements for reliable critical dimension measurement with a scanning probe microscope is stability of the stylus against flexing and against erosion. We report on the wear of an etched optical fiber when scanned across a variety of surfaces. The optical fiber probe tip was used in a novel scanning probe microscope employing a balance beam force sensor.

Myasthenia gravis (MG) is an antibody-mediated muscle disease in which any skeletal muscle can be affected. MG may produce numerous symptoms and signs. To doctors and patients, it may seem like lung disease, stroke, heart disease, or the effects of emotional stress. This article explores the "territory" between MG and diseases of the heart and lungs as well as the other neuromuscular diseases.

Critical dimension metrology of a phase-shifting mask must include depth as well as width measurements because both the phase and the lateral position of the transmitted photons must be controlled. Scanning probe microscopes are well suited to perform these measurements because they achieve high resolution simultaneously in all three dimensions. As with other microscopes, the probe-sample interaction strongly affects critical dimension measurement. The shape of the probe mixes with the measured object in an intrinsically nonlinear manner. We present measurements of phase-shifting masks performed with a scanning force microscope, and we discuss how they illustrate the capabilities and limitations of the technique.© (1994) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

Graded band gap ITT-V semiconductor structures have been grown by molecular beam epitaxy using electron beam evaporation of Group III metals. The deposition rates of the Group III metals are measured and controlled in real-time using Inficon Sentinel III rate monitors. The rapid response of the electron beam evaporation sources allows precise alloy grading over distances as short as 1 nm. A variety of novel 111-V device structures have been realized by this technique.

Scattering with angular limitation in projection electron-beam lithography (SCALPEL) marks for alignment and registration have been fabricated in SiO2 deposited in Si trenches using a process that is similar to that used for shallow trench isolation in complementary metal–oxide–semiconductor (CMOS) integrated circuits. The marks were detected using backscattered electrons in a SCALPEL exposure tool using 100 keV incident electrons. The signal-to-noise from the Si/SiO2 marks is comparable to that measured from Si/WSi2 marks fabricated in CMOS gate material. The Si/SiO2 marks fabricated from this process are a viable option for gate alignment to the thin oxide level and is extensible to circuits with critical dimensions less than 100 nm.

The need for sub-100 nm semiconductor devices has driven our industry to develop new resists, exposure tools (248 nm, 193 nm, extreme ultraviolet, SCALPEL, etc.), mask technologies, and processing procedures. An enormous amount of research has gone into every aspect of the semiconductor device fabrication process and new techniques to further reduce the critical dimensions need to be investigated. The work that is reported on in this article identifies a process that is referred to as liquid ashing. Liquid ashing is a novel approach to linewidth reduction of resist features patterned with positive 248 nm deep-ultraviolet (DUV) resists. The lashing process reduces linewidth through the use of a second wet development step. This process is isotropic and can be continued once started. A bake prior to the second development improves process control. Various types of phase-shifted patterns have been measured and evaluated to determine the effectiveness of this process. This process has been exercised using different resists, different developers, and several different integrated circuit (IC) test patterns. Linewidth reduction using liquid ashing is controllable, does not increase linewidth variations, and can be accomplished using existing equipment. The process was evaluated with IC test patterns that were printed using attenuated phase shifted mask technology generated photo masks and conventional DUV processes. Scanning electron microscopy was used to obtain critical dimension data and cross-sectional information. Features, ranging from 120 to 280 nm in size were reduced by 60 nm at a controllable rate of approximately 1.25 nm/s. Transistor gates as small as 60 nm have been formed in 248 nm DUV resist and successfully transferred while maintaining >85° wall profile.

Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small as 0.24 μm were measured on the mask. The thin membrane mask structure that was used is found to provide sufficient transmitted signal contrast at energies ranging from 10 to 30 keV. The linewidth measurement accuracy is mostly limited by the variations in the material and not the measurement system. It is concluded that the linewidth measurement technique using transmitted electrons is suitable for the potential certification of SCALPEL mask standards.

To measure the angle of a wall, the probe of a stylus profiler must be able to reach the wall. Sample tilting substantially expands the range of wall angles accessible to a profiler. Tilting also allows flared probe tip characterizers to be used more efficiently. The balance beam force sensor used for this work was designed to permit significant sample tilting.

We have designed and constructed a proof‐of‐concept projection electron beam lithography system based on the scattering with angular limitation projection electron beam lithography principle. In this system, a thin membrane mask is used in a 4:1 reduction projection system at 100 keV. Image contrast is formed by scattering in the mask and subsequent aperturing of the scattered electrons in the back focal plane of the projection system. We have employed a step‐and‐scan architecture which uses continuously moving mask and wafer stages to trace out the full pattern. The electron beam can thus be kept small (1×1 mm in our case) which greatly simplifies the design of the electron optical system. In addition, the membrane areas can be kept small in linear dimension in one direction, minimizing in‐plane pattern distortions. Our system will be constructed in two stages. In the first stage, the mask stage is static and the wafer stage operates in step‐and‐repeat mode. This initial version of the system allows for ...

Dimensional measurement of surface topography with a probe microscope requires surface proximity sensing, probe position measurement, a probe with known shape, and careful analysis of the image generated. Our probe microscope contains some novel features. The proximity detector is a magnetically constrained rocking‐beam force sensor stabilized with a capacitance‐based force‐balance system. This sensor accepts a wide range of probe tips, which are fabricated separately. The probes are either focused‐ion‐beam etched metal or chemically etched optical fibers. We show measurements of features arising from semiconductor manufacture.

We have used a Ga+ focused ion beam (FIB) milling technique to produce sharp scanning‐probe microscope tips. The FIB procedure employs a roughly 0.2‐μm‐diam 20 keV Ga ion beam vector scanned in an annular pattern across the apex of an electrochemically etched wire. This method usually produces exceptionally sharp conical tips, but occasionally it generates a nearly cylindrical spike at the apex. In this paper, we show examples of the spikes, and we discuss possible mechanisms by which they are produced.

A fundamental requirement in critical dimension measurement is determination of the edge positions. Edge position measurement can be degraded by many sources of error, the probe‐sample interaction usually being the most important of them. In most cases a sharp conical probe is adequate to locate the top of an edge, and it can scan the entire edge if the walls are not too steep. We discuss aspects of the measurement that affect the uncertainty, such as tip radius, instrument drift, and surface roughness. Measurements with a conical probe of two samples are included. The first is very thin chrome on a quartz substrate, and the second sample is photoresist on a Si wafer.

Profilometry of high‐aspect‐ratio, submicron lithographic features with a scanning force microscope is possible if the instrument satisfies several requirements. The probe must be slender enough to reach into narrow holes without sacrificing stability. The force sensor must follow the surface without damaging the sample or the probe. Finally, a position monitor must measure the location of the probe. With such an instrument, high‐resolution depth measurements are straightforward. Width measurements are more difficult because of the mixing of the probe shape with sidewalls, but this problem can be overcome through careful control of the probe shape. Measurements of high‐aspect ratio features with a characteristic size less than 0.5 μm will be shown, and some of the distortions caused by the probe–sample interaction will be discussed.

The maximum doping limits for C, Be, and Si in GaAs grown by solid source molecular‐beam epitaxy using As2 derived from a high temperature Ta cracker have been investigated. The C and Si‐dopant fluxes were obtained from resistively heated filaments, whereas Be was evaporated from pyrolytic BN crucible in an effusion cell. The maximum electrical carrier concentrations determined by Hall measurements were 6, 20, and 1.6 × 1019 cm−3 for C, Be, and Si, respectively. The maximum carrier densities for Be and Si‐doping were obtained at a relatively low growth temperature around 480 °C, whereas for C‐doping, the optimum growth temperature is around 600 °C. This difference is attributed to the temperature dependence of the surface vacancy concentration ratio [VGa]/[VAs], which affects the incorporation of substitutional dopant atoms. Secondary ion mass spectrometry data shows substantial in‐diffusion of Be concentrations above the solubility limit for a given growth temperature.

Eleven patients with hypertrophic obstructive cardiomyopathy and eight patients with idiopathic congestive cardiomyopathy underwent extensive neuromuscular studies to determine if a skeletal myopathy is associated with uncomplicated primary cardiomyopathy. The clinical examination revealed peripheral neuropathies in six patients, but no evidence of muscle weakness or atrophy. Nerve conduction studies demonstrated a neuropathy in five of these six and in one other patient: three were in the hypertrophic group and three in the congestive group. Seven patients had abnormal electromyography, but none had characteristic myopathic changes. Of these seven patients, muscle biopsies showed denervation in two patients in the congestive group and type II atrophy in two patients in the hypertrophic group. We found no evidence of primary skeletal muscle involvement; however, neuropathic features and biopsy changes of denervation were present in both groups.

We report the results of studies which have been made on heteroepitaxial layers of GaAs and AlGaAs grown by metalorganic chemical vapor deposition on composite substrates that consist of four different types of heteroepitaxial layered structures of Ge and Ge-Si grown by molecular beam epitaxy on (100)-oriented Si substrates. It is found that of the four structures studied, the preferred composite substrate is a single layer of Ge ∼1 µm thick grown directly on a Si buffer layer. The double-crystal X-ray rocking curves of 2 µm thick GaAs films grown on such substrates have FWHM values as small as 168 arc sec. Transmission electron micrographs of these Ge/Si composite substrates has shown that the number of dislocations in the Ge heteroepitaxial layer can be greatly reduced by an anneal at about 750° C for 30 min which is simultaneously carried out during the growth of the GaAs layer. The quality of the GaAs layers grown on these composite substrates can be greatly improved by the use of a five-period GaAs-GaAsP strained-layer superlattice (SLS). Using the results of these studies, low-threshold optically pumped AlGaAs-GaAs DH laser structures have been grown by MOCVD on MBE Ge/Si composite substrates.

Secondary ion mass spectrometry (SIMS) has been used to investigate the depth profiles of calcium (Ca) and fluorine (F) in CaF2 grown on Si(100) by molecular‐beam epitaxy. SIMS depth profiles are used to study the effects of in situ rapid thermal annealing on CaF2/Si(100). Finally, the appropriate conditions needed to perform a SIMS analysis for CaF2/Si(100) have been characterized.

The Shaman or Wizard of the proto-historic Orient, his vocation, his reputation, his strange psychosis, his claim to thaumaturgic powers, and his place in the social structure of his community, are not all these written in the chronicles of the. Works of de Groot and Shirokogaroff ?

In a recent paper in this Journal on “Chinese Writing in the Chou Dynasty in the light of Recent Discoveries”, I expressed the hope that I should be able shortly to publish in the Journal a list of the characters contained in the Chinese inscription of the Bushell Bowl, now in the Victoria and Albert Museum, with their Lesser Seal equivalents, and some additional forms besides.

The formula “Ch'ên is of the Dragon kind”, , ch'ên shu lung, applies to one of the , or Twelve Affinities, according to which each of the Cycle of Twelve Branches has an affinity to one of Twelve Animals. When this Cycle of Twelve Beasts was first known to the Chinese may be uncertain, but pure chance can hardly be responsible for the association in the list of ch'ên with lung, which must, at least, be the expression of a long tradition of affinity. That “Ch'ên is of the Dragon kind”, then, is the text on which this paper is based, and the implications of which are further developed.

THIS defiant little inscription of throe words has held its secret through wenty centuries. On the B ne relics of the Honan Find it is not uncommon, but in the inscribed Bronzes, even the oldest, it is not met. Brief and perhaps paltry as it may seem, it has not failed to engage the attention of Chinese specialists without any very convincing conclusion. But on one point Chinese critics do concur. These small three-word entries are no part of the main scription of the oracular sentence. They stand isolated in place, and have no syntactic connection with the latter. Perhaps they were archivests' memoranda, or, as I suggest, the craftsman's directions to his finisher. They have none of the importance of the sentences, and their only interest now is that they have proved inscrutable. 1, too, havo joined in the quest and havo, indeed, excogitated a conclusion acceptable to other students ! The most noteworthy contribution to the reduction of this archaic crux should be that of Mr. Tang Lan /J|f $j. He has devoted throe and a half closely printed pages to a study of the phrase, and decides that, in modern dross, it should bo ^ ;f 110, Vu /s''u ml'M> adding that z)f ts'ai has to be taken with the meaning of its near homophone jl| Isai. On the face of it that seems ambiguous. But he proceeds to an ingenious and learned argument wluch it is due to his distinction as a critic to summarize here. The first character gives no trouble at all. Jtis yp pu, the simple negative Not. With that initial negative result, however, we

Portraiture, as we now know, was a very early member of the nascent arts of primitive man.Palæolithic men were of necessity hunters. What they hunted on the plains and among the hills for food and covering, that they painted or carved on the walls and roofs of their cave dwellings and cliff shelters. The reindeer, the bison, the horse, the elephant were favourite objects of their vivid and impressionistic genius. What they lacked of imagination they made up for by exact memories and singularly skilful technique. Less frequent were their delineations of humanity, and as concerns the female part of it, most unflattering, being affected by a kind of exasperated candour. The Age of Chivalry was far distant indeed!

It must come some time and it shall come now, this confession of error committed and published, and by this writing recanted. The error concerns the date of the many fragments of inscribed bones exhumed in 1899 in the Honan province of North China. Contrary to the opinions of two Chinese authorities, Liu T'ieh-yün and Lo Chên-yü, and of a great French scholar, E. Chavannes, I had in earlier papers attributed these relics to the period of the Chou dynasty. I now subscribe fully to the view of the above-named writers in holding them to be survivals from the previous Shang dynasty. Moreover, I am a convinced convert, and can proclaim my belief in the admirably candid words of the French politician, “Moi, je soutiens que la chose est ainsi; et ceux qui ne pensent pas comme moi, sont des sots, des brigands, et des assassins.”

It seems difficult and sometimes futile to try to pursue in this year 1942 the essentially peaceful studies in ancient Chinese writing that have appeared for many years in the JRAS.

The objects illustrated in the accompanying Plates are published with the aim of bringing to the knowledge of Orientalists and others a type of Chinese relic believed to be of unique design, and presenting an interest of more than one kind. Despite their excellent preservation, they must, for reasons given below, date back at least to the later half of the third century B.C., but how much earlier than that remains at present uncertain.

The Chinese numeral 4 is a syllable pronounced ssŭ, and was originally written by four horizontal lines, , but by the time of the Han Dynasty (and perhaps before, for the formoccurs on the Stone Drums), and ever since, the scription as above was substituted. And the question with which this note is concerned is: What was the origin of this substituted form ? The author of the Shuo Wen makes the Lesser Seal Version , his 503rd Radical, and describes it thus, hsiang ssŭ fên chih hsing, depicts division into quarters. This is a poor explanation. If a quadrilateral was chosen as an adequate symbol of the numeral 4, that was surely enough, and the two interior strokes are supernous, irrelevant, and misleading.

The title of this short essay is not the outcome of any foible on my part towards a chance euphonious coupling of two not ill-suited concepts. The phrase indeed, being short, simple, and succinct, should convey accurately the motive and method which have together dictated the form of this study. Restricted as it had to be, the field of research is still wide, and the flowers that grow therein are not only time-worn, but their types show many and often baffling variations. Among these a choice had to be made, and I have made it, mainly in each case for the contrastive effect aimed at and displayed in the symbols of Then and Now.

The curious ancient figure illustrated in the last paragraph of Part I of this paper, ingeniously conjectured by Mr. Hsü-Chung-shu to stand for the modern character chüeh, in its sense of nobility, servesto introduce us to a peculiar word and its character, often used in Chinese texts dealing with the old-time agriculture.

In the passage of nearly forty years since the first discovery of the Honan relics and their strange inscriptions, great has been the progress in their decipherment. How much and how solid this gain in knowledge has been, the present writer can perhaps appreciate better than more recent students, when he looks back at his own notes and the correspondence that passed betweenthe late Mr. Frank Chalfant and himself.

It is a genuine pleasure to report the accession of another Chinese critic and investigator of the Shang dynasty writing, in the person of Mr. Wang Kuo-wei of Hai-ning Chou , in the Central Chinese Province of Chehkiang.I propose to lay before the readers of the Journal one or two of the more interesting results of his decipherments, together with a few notes of my own upon these.

The large Chinese Bronze (Plate I) which the kindness of its owner, Mr. George Eumorfopoulos, has enabled the members of our Section to inspect and examine at our leisure, is a specimen in more than one respect of exceptional importance. And being a quite recent acquisition, and not derived from any other European, American, or Japanese collection, it has been judged a very appropriate occasion to introduce it to the notice, and, I will add, to the critical scrutiny, of the sinologic world here represented.

MR. KUO MO-JO, in his essay to establish the original identity of the characters now written tsu and shê, asserts that in early ages men held the male organ to be a manifestation of divine power. Sometimes, he says, they termed this power tsu, and sometimes shê, as in the expression ch'ih shê, to hurry to the shê, that is, to hurry forward bearing the phallic divinity on their shoulders. This custom still exists. A gentleman of Yang Chou (a city in Kiangsu Province) informed Kuo that at mid-Spring, in the second month of Spring, on the shang ssŭ Festival day (i.e. 6th of the Chinese moon), the Yang Chou practice was to make enormous paper models of the male and female emblems, one of each, and for a procession of men and women carrying these on their shoulders, to hurry along to burn them in front of the Shun Yang Temple. This is called ying ch'un, Welcoming the Spring.

Among the several hundred archaic forms preserved in the inscriptions on the bone fragments of the Honan Find which research has failed to identify there is a minority demanding special attention. And in it perhaps the most outstanding challenge to aggressive epigraphists is the figure appearing in Plate II. This inscription discloses a human shape of grotesque design. Above the emaciated and linear frontal figure of a man, appears an object covering but concealing his head, which resembles an outsize and ill-designed bowler hat. From what seem like ear-flaps depend two oval earrings perhaps, and in front of the bulky headgear two small apertures are remarkable. Such is the leading figure in the sequence of the four characters in the centre of the plate. On each side of the three main rows are several characters perhaps not all connected with the three main columns.

The selection of a title is sometimes a choice of evils. Which shall most move us, the desire to attract the many, or the fear of offending the few?For the heading of this paper, the original aim had been laudable. Pith, brevity, and point were to combine with brilliant exactness of definition, alluring to the reader and doing justice to the theme. “ That,” as they say in the street, “ was the idea.” Followed an interval for intellectual refreshment and repose, and then, “ sudden in a minute,” in a flash, was captured the caption. But the disillusion of it! Gone were the pith and the brevity, and in their stead appeared a sesquipedalian pomposity. But however ponderously, the present title has the merit that it does precisely formulate the baffling and hitherto little noticed phenomena of substitutional types to which this paper essays to call attention by the illustration of a few out of many examples.

The Chinese people have two systems in current and concurrent use for writing their Numerals.Of these, one is the ordinary notation with characters of pictographic origin, except the first three cyphers.

In these Notes the numbers refer to the similarly numbered phrases and sentences published in the January number of the Journal.5. Here, and elsewhere on these bones, the word hsiang is always written with the once homophonous character for sheep, yang, both probably in ancient times being pronounced approximately tsāng.

It is the aim of the following paper to present to the readers of this Journal the problem of the origin of Chinese writing as it appears at the opening of the historical period in the ninth century b.c., and to give some account of the new light thrown upon the subject by recent discoveries in North China. It is also my hope to show that there are reasons for endeavouring to stir an interest in this question of origin, and some grounds for defining, as clearly as present conditions allow, the main features of what is already known of the problem, and indicating the lines along which fruitful investigation must advance. Especially valuable it should be to investigators of other primitive systems of writing to have a working knowledge of the rise and progressive changes of a script, probably of very ancient origin, certainly claiming a continuous history of 3,600 years, still in vigorous activity, betraying no signs of impending decay. The facts of such a life-history, properly ascertained and appreciated, might well contribute some illuminating sidelights or useful suggestions on analogous inquirics.

The Dragon is a Being, or rather, a nonentity, that though he never existed, has had to be invented. The human race soon found that it could not get on without him, and the imaginative fecundity of primitive man was called in to redress a biological oversight of Nature. When summoned to mythologic but influential life, he discovered no sinecure in his functions. Constant appeals from Oriental Rulers, Shamans, and the populace generally, to “co-ordinate” and “rationalize” his resources, in other words, to distribute rain more often, more widely, and more seasonably, may have seemed hardly compensated by his decorative popularity, or the flattering attentions of his pious but insistent devotees., Still noblesse oblige, and so the Dragon reigns among the thunder clouds above, and the thunder clouds (sooner or later) rain upon the earth beneath. Considerable research has been devoted to the Dragon by Western scholars, among whom may be mentioned Elliot Smith, and especially M. W. de Visser, who cites abundant passages from Chinese and Japanese authorities in his attractive volume. Japanese authorities in his attractive volume. And much earlier than either of the above, Gustave Schlegel had descanted fully upon the Dragon and its astronomic symbolism. The present essay, however, has a less ambitious aim, and a more restricted scope. Its object is twofold. In the first part it will present and publish (among the others) a form of the character lung “dragon”, which seems to have escaped the notice of all the Oriental epigraphists, whether Chinese or Japanese, so far as I can ascertain, but must be one of the most archaic, as it is perhaps the most elaborate, of the designs for the character in question.