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1. Investigation of the Adaptability of Pt/HfO2/n+Si Memristors with Self‐Limiting Oxygen‐Deficient Hafnium Oxide Films under Repetitive Pulse Stimuli

2. Uniform Oxide Layer Integration in Amorphous IGZO Thin Film Transistors for Enhanced Multilevel-Cell NAND Memory Performance

3. Bipolar Plasticity in Synaptic Transistors: Utilizing HfSe2 Channel with Direct-Contact HfO2 Gate Dielectrics

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