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1. Cleaning and Strip Requirement for Metal Gate Based CMOS Integration

Author

Martine Cleas, Johan Albert, E. Rohr, Tom Schram, S. Kubicek, Masayuki Wada, Rita Vos, and Sebai Farid

Subjects
Focus (computing), CMOS, Hardware_GENERAL, Computer science, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Process (computing), Hardware_PERFORMANCEANDRELIABILITY, Dielectric, Metal gate, Hardware_LOGICDESIGN, Dual (category theory)
Abstract

This paper describes the basic process steps involved in the dual metal gate CMOS integration. It focuses on the differences between a dual metal dual dielectric and single metal dual dielectric integration. The focus is on basic process steps involved in both process flows, but device data are also presented to illustrate the processes.

Published
2009

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