1. Thermal recovery from stress-induced high-[kappa] dielectric film degradation
- Author
-
O'Sullivan, B. J., Pantisano, L., Roussel, P., Degraeve, R., Groeseneken, G., DeGendt, S., and Heyns, M. M.
- Subjects
Hafnium -- Electric properties ,Hafnium -- Mechanical properties ,Hafnium -- Acoustic properties ,Silicon compounds -- Electric properties ,Silicon compounds -- Mechanical properties ,Silicon compounds -- Acoustic properties ,Nitrogen compounds -- Electric properties ,Nitrogen compounds -- Acoustic properties ,Nitrogen compounds -- Mechanical properties ,Oxides -- Mechanical properties ,Oxides -- Electric properties ,Oxides -- Acoustic properties ,Physics - Abstract
The ability of several high-[kappa] materials to recover from the Fowler-Nordbeim stress-induced degradation is analyzed. The study of various structural differences in the dielectrics and charge centroids show that high temperature annealing can help in a complete recovery of the stress-induced damage in Hf[O.sub.2] molecules.
- Published
- 2007