1. Performance optimization of Si/Gd extreme ultraviolet multilayers
- Author
-
Windt, David L., Bellotti, Jeffrey A., Kjornrattanawanich, Benjawan, and Seely, John F.
- Subjects
Gadolinium -- Optical properties ,Silicon -- Optical properties ,Thin films, Multilayered -- Analysis ,Optics -- Research ,Astronomy ,Physics - Abstract
We compare the performance, stability and microstructure of Si/Gd multilayers containing thin barrier layers of W, [B.sub.4] C, or Si[N.sub.x], and determine that multilayers containing 0.6 nm thick W barrier layers at each interface provide the best compromise between high peak reflectance in the extreme ultraviolet near [lambda] 60 nm and good stability upon heating. The Si/W/Gd films have sharper interfaces and also show vastly superior thermal stability relative to Si/Gd multilayers without barrier layers. We find that these structures have relatively small compressive film stresses, and show good temporal stability thus far. We measured a peak reflectance of 29.7% at [lambda] = 62.5 nm, and a spectral bandpass of [DELTA][lambda] = 9 nm (FWHM), for an optimized Si/W/Gd multilayer having a period d = 32.0 nm. [c] 2009 Optical Society of America OCIS codes: 230.4170, 310.1620, 310.6860, 340.0340, 350.1260.
- Published
- 2009