28 results on '"Tilmant, Pascal"'
Search Results
2. Tests sur la Medusa de AllResist
- Author
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Deblock, Yves, Boyaval, Christophe, Elegbe, J., Ouendi, Saliha, Tilmant, Pascal, Vaurette, Francois, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-JUNIA (JUNIA), Université catholique de Lille (UCL)-Université catholique de Lille (UCL), Centrale de Micro Nano Fabrication - IEMN (CMNF - IEMN), Université catholique de Lille (UCL)-Université catholique de Lille (UCL)-Centrale Lille-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-JUNIA (JUNIA), Renatech Network, and CMNF
- Subjects
[PHYS]Physics [physics] ,[SPI]Engineering Sciences [physics] - Abstract
National audience
- Published
- 2023
3. Tests sur la HSQ en poudre de EMResist
- Author
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Deblock, Yves, Boyaval, Christophe, Elegbe, J., Ouendi, Saliha, Tilmant, Pascal, Vaurette, Francois, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-JUNIA (JUNIA), Université catholique de Lille (UCL)-Université catholique de Lille (UCL), Centrale de Micro Nano Fabrication - IEMN (CMNF - IEMN), Université catholique de Lille (UCL)-Université catholique de Lille (UCL)-Centrale Lille-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-JUNIA (JUNIA), Renatech Network, and CMNF
- Subjects
[PHYS]Physics [physics] ,[SPI]Engineering Sciences [physics] - Abstract
National audience
- Published
- 2023
4. Gallium nitride MEMS resonators: how residual stress impacts design and performances
- Author
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Morelle, Christophe, Théron, Didier, Derluyn, Joff, Degroote, Stefan, Germain, Marianne, Zhang, Victor, Buchaillot, Lionel, Grimbert, Bertrand, Tilmant, Pascal, Vaurette, François, Roch-Jeune, Isabelle, Brandli, Virginie, Avramovic, Vanessa, Okada, Etienne, and Faucher, Marc
- Published
- 2017
- Full Text
- View/download PDF
5. Electron beam nanolithography in AZnLOF 2020
- Author
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Herth, Etienne, Tilmant, Pascal, Faucher, Marc, François, Marc, Boyaval, Christophe, Vaurette, Francois, Deblocq, Yves, Legrand, Bernard, and Buchaillot, Lionel
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- 2010
- Full Text
- View/download PDF
6. Study of Various PhotoResist for Bosch Process
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Pageau, Arnaud, Curley, Garrett, Tilmant, Pascal, Vaurette, Francois, Yarekha, Dmitri, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Centrale de Micro Nano Fabrication - IEMN (CMNF - IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), and Renatech Network
- Subjects
[SPI]Engineering Sciences [physics] ,Dry etching ,ComputingMilieux_MISCELLANEOUS - Abstract
International audience
- Published
- 2019
7. AlGaN/GaN high electron mobility transistors on diamond substrate obtained through aluminum nitride bonding technology
- Author
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Abou Daher, Mahmoud, primary, Lesecq, Marie, additional, Tilmant, Pascal, additional, Defrance, Nicolas, additional, Rousseau, Michel, additional, Cordier, Yvon, additional, De Jaeger, Jean Claude, additional, and Tartarin, Jean Guy, additional
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- 2020
- Full Text
- View/download PDF
8. Air-bridge interconnection and bondpad process for non-planar compound semiconductor devices
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Ulliac, Gwenn, Garidel, Sophie, Vilcot, Jean-Pierre, and Tilmant, Pascal
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- 2005
- Full Text
- View/download PDF
9. Versatile bondpad report process for non-planar compound semiconductor devices
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Garidel, Sophie, Vilcot, Jean-Pierre, Zaknoune, Mohammed, and Tilmant, Pascal
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- 2004
- Full Text
- View/download PDF
10. Interface characterization at nanometer scale using very high frequency ultrasounds
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Reda, Hilal, primary, Carlier, Julien, additional, Toubal, Malika, additional, Campistron, Pierre, additional, Tilmant, Pascal, additional, and Nongaillard, Bertrand, additional
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- 2018
- Full Text
- View/download PDF
11. La lithographie à l'IEMN : de la micro à la nanostructuration
- Author
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Vaurette, Francois, François, Marc, Deblock, Yves, Tilmant, Pascal, Boyaval, Christophe, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Centrale de Micro Nano Fabrication - IEMN (CMNF - IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), and RENATECH network
- Subjects
[SPI]Engineering Sciences [physics] - Abstract
International audience
- Published
- 2016
12. Step conformal solid electrolyte deposited by ALD on robust 3D silicon scaffold for on chip Li-ion microbattery
- Author
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Létiche, Manon, Eustache, Étienne, Freixas, Jeremy, Morgenroth, Laurence, Tilmant, Pascal, Roussel, Pascal, Brousse, Thierry, Lethien, Christophe, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Unité de Catalyse et Chimie du Solide - UMR 8181 (UCCS), Centrale Lille Institut (CLIL)-Université d'Artois (UA)-Centrale Lille-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Université de Lille, and Université d'Artois (UA)-Centrale Lille-Institut de Chimie du CNRS (INC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)
- Subjects
[CHIM.INOR]Chemical Sciences/Inorganic chemistry ,ComputingMilieux_MISCELLANEOUS - Abstract
International audience
- Published
- 2016
13. Interface characterization at nanometer scale using very high frequency ultrasounds.
- Author
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Reda, Hilal, Carlier, Julien, Toubal, Malika, Campistron, Pierre, Tilmant, Pascal, and Nongaillard, Bertrand
- Subjects
NANOSTRUCTURED materials ,TRIBOLOGY ,SILICON ,ELASTICITY ,SOLID-solid interfaces - Abstract
The main objective of this work is to study the solid-solid interfaces using a very high frequency (3GHz) ultrasonic method in order to deduce in a non-destructive way and quantitatively the quality contact at the interface, fundamental parameter in tribology. The very high frequencies allow prospecting the state of contact at the nanometer scale. The determination of the contact surface between two polished materials (Silicon-Silica) was carried out. From the measured echoes diagram, the reflection coefficient and the elasticity of the interface were extracted and compared to the ones determined by a numerical approach presented by Greenwood and Williamson [ABSTRACT FROM AUTHOR]
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- 2019
- Full Text
- View/download PDF
14. Sputtered thin films for lithium ion microbatteries : recent results on TiN lithium barrier diffusion layer, Au negative and C-LiFePO4 positive electrodes
- Author
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Eustache, Etienne, Freixas, Jeremy, Crosnier, Olivier, Tilmant, Pascal, Yarekha, Dmitri, Roussel, Pascal, Rolland, Nathalie, Brousse, Thierry, Lethien, Christophe, Institut des Matériaux Jean Rouxel (IMN), Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Réseau sur le stockage électrochimique de l'énergie (RS2E), Université de Nantes (UN)-Aix Marseille Université (AMU)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Collège de France (CdF (institution))-Université de Picardie Jules Verne (UPJV)-Ecole Nationale Supérieure de Chimie de Montpellier (ENSCM)-Ecole Nationale Supérieure de Chimie de Paris - Chimie ParisTech-PSL (ENSCP), Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Université de Pau et des Pays de l'Adour (UPPA)-Institut de Chimie du CNRS (INC)-Université de Montpellier (UM)-Sorbonne Université (SU)-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université de Toulouse (UT)-Université de Toulouse (UT)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA)-Université Grenoble Alpes (UGA), Unité de Catalyse et Chimie du Solide - UMR 8181 (UCCS), Université d'Artois (UA)-Centrale Lille-Institut de Chimie du CNRS (INC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS), Université de Nantes (UN)-Université de Nantes (UN)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN), Université de Picardie Jules Verne (UPJV)-Institut de Chimie du CNRS (INC)-Aix Marseille Université (AMU)-Université de Pau et des Pays de l'Adour (UPPA)-Université de Nantes (UN)-Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS)-Sorbonne Université (SU)-Ecole Nationale Supérieure de Chimie de Paris - Chimie ParisTech-PSL (ENSCP), Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Collège de France (CdF (institution))-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA)-Université Grenoble Alpes (UGA)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université Fédérale Toulouse Midi-Pyrénées-Université Fédérale Toulouse Midi-Pyrénées-Ecole Nationale Supérieure de Chimie de Montpellier (ENSCM), and Centrale Lille Institut (CLIL)-Université d'Artois (UA)-Centrale Lille-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Université de Lille
- Published
- 2014
15. [Invited] 3D substrates for improved performance of Li-ion microbatteries
- Author
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Eustache, Etienne, Crosnier, Olivier, Tilmant, Pascal, Morgenroth, Laurence, Roussel, Pascal, Rolland, Nathalie, Lethien, Christophe, Brousse, Thierry, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Institut des Matériaux Jean Rouxel (IMN), Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN), Réseau sur le stockage électrochimique de l'énergie (RS2E), Université de Picardie Jules Verne (UPJV)-Institut de Chimie du CNRS (INC)-Aix Marseille Université (AMU)-Université de Pau et des Pays de l'Adour (UPPA)-Université de Nantes (UN)-Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS)-Sorbonne Université (SU)-Ecole Nationale Supérieure de Chimie de Paris - Chimie ParisTech-PSL (ENSCP), Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Collège de France (CdF (institution))-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA)-Université Grenoble Alpes (UGA)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université Fédérale Toulouse Midi-Pyrénées-Université Fédérale Toulouse Midi-Pyrénées-Ecole Nationale Supérieure de Chimie de Montpellier (ENSCM), Unité de Catalyse et Chimie du Solide - UMR 8181 (UCCS), Centrale Lille Institut (CLIL)-Université d'Artois (UA)-Centrale Lille-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Université de Lille, Université de Nantes (UN)-Université de Nantes (UN)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Université de Nantes (UN)-Aix Marseille Université (AMU)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Collège de France (CdF (institution))-Université de Picardie Jules Verne (UPJV)-Ecole Nationale Supérieure de Chimie de Montpellier (ENSCM)-Ecole Nationale Supérieure de Chimie de Paris - Chimie ParisTech-PSL (ENSCP), Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Université de Pau et des Pays de l'Adour (UPPA)-Institut de Chimie du CNRS (INC)-Université de Montpellier (UM)-Sorbonne Université (SU)-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université de Toulouse (UT)-Université de Toulouse (UT)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA)-Université Grenoble Alpes (UGA), and Université d'Artois (UA)-Centrale Lille-Institut de Chimie du CNRS (INC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)
- Published
- 2014
16. Step-conformal deposition of TiO2 and MnO2 electrodes on advanced silicon microstructures for 3D Li-ion microbatteries and micro-supercapacitors
- Author
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EUSTACHE, E., DOUARD, C., Tilmant, Pascal, Morgenroth, Laurence, Roussel, P., Brousse, Thierry, Lethien, Christophe, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Institut des Matériaux Jean Rouxel (IMN), Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN), Réseau sur le stockage électrochimique de l'énergie (RS2E), Université de Picardie Jules Verne (UPJV)-Institut de Chimie du CNRS (INC)-Aix Marseille Université (AMU)-Université de Pau et des Pays de l'Adour (UPPA)-Université de Nantes (UN)-Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS)-Sorbonne Université (SU)-Ecole Nationale Supérieure de Chimie de Paris - Chimie ParisTech-PSL (ENSCP), Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Collège de France (CdF (institution))-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA)-Université Grenoble Alpes (UGA)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université Fédérale Toulouse Midi-Pyrénées-Université Fédérale Toulouse Midi-Pyrénées-Ecole Nationale Supérieure de Chimie de Montpellier (ENSCM), Unité de Catalyse et Chimie du Solide - UMR 8181 (UCCS), Centrale Lille Institut (CLIL)-Université d'Artois (UA)-Centrale Lille-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Université de Lille, Université de Nantes (UN)-Université de Nantes (UN)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Université de Nantes (UN)-Aix Marseille Université (AMU)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Collège de France (CdF (institution))-Université de Picardie Jules Verne (UPJV)-Ecole Nationale Supérieure de Chimie de Montpellier (ENSCM)-Ecole Nationale Supérieure de Chimie de Paris - Chimie ParisTech-PSL (ENSCP), Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Université de Pau et des Pays de l'Adour (UPPA)-Institut de Chimie du CNRS (INC)-Université de Montpellier (UM)-Sorbonne Université (SU)-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université de Toulouse (UT)-Université de Toulouse (UT)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA)-Université Grenoble Alpes (UGA), and Université d'Artois (UA)-Centrale Lille-Institut de Chimie du CNRS (INC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)
- Subjects
[PHYS]Physics [physics] - Abstract
Symposium C - Solid state ionics: thin films for energy and information applications; To get autonomous smart microsystem, a miniaturized power source should be integrated. As the device is surface limited, the energy and power performances of commercially available planar microbatteries and micro-supercapacitors are not sufficient to reach this goal. To improve their performances while keeping constant the footprint area of such devices, a 3D topology is proposed. The silicon micropillars and microtubes fabricated by a top down approach allows to reach a high area enlargement factor (AEF). Energy density can be increased by one or two orders of magnitude compared to standard planar micro-devices, thus providing improved autonomy to the powered microsytems. Step conformal deposition of platinum (current collector) and TiO2 (negative electrode of the Li-ion microbattery) are performed on the 3D structures by Atomic Layer Deposition facility. With a 3D scaffold having an AEF close to 25 combined with a 150 nm thick TiO2, a surface capacity of 0.2 mAh/cm2 at C/10 is reported. A micro-supercapacitor electrode based on a thin manganese dioxide film is conformably grown by pulsed electrodeposition on the 3D topologies. A MnO2 film (275 nm thick) reaches 250 mF/cm? at 5 mV/s. The surface capacitance is drastically enhanced compared to a standard 2D electrode with a comparable thickness. This study shows promising AEF leading to high energy density while keeping enough spacing in the microstuctrures array to allow the deposition of the overlying layers.
- Published
- 2014
17. Atomic Layer Deposition of Functional Layers for on Chip 3D Li‐Ion All Solid State Microbattery
- Author
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Létiche, Manon, primary, Eustache, Etienne, additional, Freixas, Jeremy, additional, Demortière, Arnaud, additional, De Andrade, Vincent, additional, Morgenroth, Laurence, additional, Tilmant, Pascal, additional, Vaurette, François, additional, Troadec, David, additional, Roussel, Pascal, additional, Brousse, Thierry, additional, and Lethien, Christophe, additional
- Published
- 2016
- Full Text
- View/download PDF
18. Gallium nitride MEMS resonators: how residual stress impacts design and performances.
- Author
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Morelle, Christophe, Théron, Didier, Derluyn, Joff, Degroote, Stefan, Germain, Marianne, Zhang, Victor, Buchaillot, Lionel, Grimbert, Bertrand, Tilmant, Pascal, Vaurette, François, Roch-Jeune, Isabelle, Brandli, Virginie, Avramovic, Vanessa, Okada, Etienne, and Faucher, Marc
- Subjects
MEMS resonators ,GALLIUM nitride ,RESIDUAL stresses ,CRYSTAL growth ,PIEZOELECTRIC transducers - Abstract
Starting from Gallium Nitride epitaxially grown on silicon, pre-stressed micro-resonators with integrated piezoelectric transducers have been designed, fabricated, and characterized. In clamped-clamped beams, it is well known that tensile stress can be used to increase the resonant frequency. Here we calculate the mode shape functions of out-of-plane flexural modes in pre-stressed beams and we derive a model to predict both the resonant frequency and the piezoelectric actuation factor. We show that a good agreement between theory and experimental results can be obtained and we derive the optimal design for the electromechanical transduction. Finally, our model predicts an increase of the quality factor due to the tensile stress, which is confirmed by experimental measurements under vacuum. This study demonstrates how to take advantage from the material quality and initial stress resulting of the epitaxial process. [ABSTRACT FROM AUTHOR]
- Published
- 2018
- Full Text
- View/download PDF
19. GaN MEMS resonators : from demonstration to microsystem-compatible performances
- Author
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Faucher, Marc, Ben Amar, Achraf, Zhang, Victor, Cordier, Yvon, Werquin, Matthieu, Brandli, Virginie, Grimbert, Bertrand, Vaurette, Francois, Tilmant, Pascal, François, Marc, Boyaval, Christophe, Lepilliet, Sylvie, Ducatteau, Damien, Gaquière, Christophe, Buchaillot, Lionel, Theron, Didier, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Centre de recherche sur l'hétéroepitaxie et ses applications (CRHEA), Université Nice Sophia Antipolis (1965 - 2019) (UNS), and COMUE Université Côte d'Azur (2015-2019) (COMUE UCA)-COMUE Université Côte d'Azur (2015-2019) (COMUE UCA)-Centre National de la Recherche Scientifique (CNRS)-Université Côte d'Azur (UCA)
- Subjects
[SPI]Engineering Sciences [physics] - Abstract
International audience
- Published
- 2012
20. Atomic Layer Deposition of Functional Layers for on Chip 3D Li-Ion All Solid State Microbattery.
- Author
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Létiche, Manon, Eustache, Etienne, Freixas, Jeremy, Demortière, Arnaud, De Andrade, Vincent, Morgenroth, Laurence, Tilmant, Pascal, Vaurette, François, Troadec, David, Roussel, Pascal, Brousse, Thierry, and Lethien, Christophe
- Subjects
SOLID state batteries ,TRANSMISSION electron microscopes ,THIN films spectra ,GEOMETRIC surfaces ,SYNCHROTRON radiation - Abstract
Nowadays, millimeter scale power sources are key devices for providing autonomy to smart, connected, and miniaturized sensors. However, until now, planar solid state microbatteries do not yet exhibit a sufficient surface energy density. In that context, architectured 3D microbatteries appear therefore to be a good solution to improve the material mass loading while keeping small the footprint area. Beside the design itself of the 3D microbaterry, one important technological barrier to address is the conformal deposition of thin films (lithiated or not) on 3D structures. For that purpose, atomic layer deposition (ALD) technology is a powerful technique that enables conformal coatings of thin film on complex substrate. An original, robust, and highly efficient 3D scaffold is proposed to significantly improve the geometrical surface of miniaturized 3D microbattery. Four functional layers composing the 3D lithium ion microbattery stacking has been successfully deposited on simple and double microtubes 3D templates. In depth synchrotron X-ray nanotomography and high angle annular dark field transmission electron microscope analyses are used to study the interface between each layer. For the first time, using ALD, anatase TiO
2 negative electrode is coated on 3D tubes with Li3 PO4 lithium phosphate as electrolyte, opening the way to all solid-state 3D microbatteries. The surface capacity is significantly increased by the proposed topology (high area enlargement factor - 'thick' 3D layer), from 3.5 μA h cm−2 for a planar layer up to 0.37 mA h cm−2 for a 3D thin film (105 times higher). [ABSTRACT FROM AUTHOR]- Published
- 2017
- Full Text
- View/download PDF
21. Sputtered Thin Films for Lithium Ion Microbatteries: Recent Results on TiN Lithium Barrier Diffusion Layer, Au Negative and C-LiFePO4 Positive Electrodes
- Author
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Eustache, Etienne, primary, Freixas, Jeremy, additional, Crosnier, Olivier, additional, Tilmant, Pascal, additional, Yarekha, Dmitri, additional, Roussel, Pascal, additional, Rolland, Nathalie, additional, Brousse, Thierry, additional, and Lethien, Christophe, additional
- Published
- 2014
- Full Text
- View/download PDF
22. 3D Micro-Supercapacitor Based on MnO2 Electrodes on Silicon Substrate
- Author
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Eustache, Etienne, primary, Douard, Camille, additional, Tilmant, Pascal, additional, Yarekha, Dmitri, additional, Morgenroth, Laurence, additional, Lethien, Christophe, additional, and Brousse, Thierry, additional
- Published
- 2014
- Full Text
- View/download PDF
23. Silicon-Microtube Scaffold Decorated with Anatase TiO2as a Negative Electrode for a 3D Litium-Ion Microbattery
- Author
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Eustache, Etienne, primary, Tilmant, Pascal, additional, Morgenroth, Laurence, additional, Roussel, Pascal, additional, Patriarche, Gilles, additional, Troadec, David, additional, Rolland, Nathalie, additional, Brousse, Thierry, additional, and Lethien, Christophe, additional
- Published
- 2014
- Full Text
- View/download PDF
24. Bias Dependence of Gallium Nitride Micro-Electro-Mechanical Systems Actuation Using a Two-Dimensional Electron Gas
- Author
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Amar, Achraf Ben, primary, Faucher, Marc, additional, Grimbert, Bertrand, additional, Cordier, Yvon, additional, François, Marc, additional, Tilmant, Pascal, additional, Werquin, Matthieu, additional, Zhang, Victor, additional, Ducatteau, Damien, additional, Gaquière, Christophe, additional, Buchaillot, Lionel, additional, and Théron, Didier, additional
- Published
- 2012
- Full Text
- View/download PDF
25. Amplified piezoelectric transduction of nanoscale motion in gallium nitride electromechanical resonators
- Author
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Faucher, Marc, primary, Grimbert, Bertrand, additional, Cordier, Yvon, additional, Baron, Nicolas, additional, Wilk, Arnaud, additional, Lahreche, Hacène, additional, Bove, Philippe, additional, François, Marc, additional, Tilmant, Pascal, additional, Gehin, Thomas, additional, Legrand, Christiane, additional, Werquin, Matthieu, additional, Buchaillot, Lionel, additional, Gaquière, Christophe, additional, and Théron, Didier, additional
- Published
- 2009
- Full Text
- View/download PDF
26. Silicon-Microtube Scaffold Decorated with Anatase TiO2 as a Negative Electrode for a 3D Litium-Ion Microbattery.
- Author
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Eustache, Etienne, Tilmant, Pascal, Morgenroth, Laurence, Roussel, Pascal, Patriarche, Gilles, Troadec, David, Rolland, Nathalie, Brousse, Thierry, and Lethien, Christophe
- Subjects
- *
SILICON , *LITHIUM-ion batteries , *MICROELECTRONICS , *TITANIUM dioxide - Abstract
An optimized scaffold based on silicon microtubes is designed to increase the surface capacity of 3D lithium-ion microbatteries. High-depth, mechanically robust microstructures are fabricated using microelectronic facilities. Conformal deposition of anatase TiO2 is achieved using atomic layer deposition, realizing the targeted improvement for microbatteries; a surface capacity of 0.2 mA h cm-2 at a charge rate of C/10 is obtained in standard liquid electrolyte. This work paves the way for the fabrication of solid-state 3D Li-ion microbatteries with an efficient 3D scaffold. [ABSTRACT FROM AUTHOR]
- Published
- 2014
- Full Text
- View/download PDF
27. High Surface Capacity Li-Ion All Solid State 3D Microbattery Based on Anatase TiO2Deposited by ALD on Silicon Microstructures
- Author
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Eustache, Etienne, Tilmant, Pascal, Morgenroth, Laurence, Roussel, Pascal, Rolland, Nathalie, Brousse, Thierry, and Lethien, Christophe
- Abstract
The proposed study deals with the design, the fabrication and the characterization of 3D silicon microstructures decorated with step conformal and pin hole free anatase TiO2negative electrode deposited by atomic layer deposition. A high aspect ratio and dense array of 3D silicon micropillars or microtubes are fabricated on silicon wafer. The obtained surface capacity of the TiO2layer (150nm) deposited on 3D microtubes (area enlargement factor =25) reaches 0.15 mAh/cm2at C/4. The reported 3D topologies enhance the capacity of standard TiO22D thin film electrode.
- Published
- 2013
- Full Text
- View/download PDF
28. InGaAs quantum dot chains grown by twofold selective area molecular beam epitaxy.
- Author
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Barbot C, Rondeau-Body C, Coinon C, Deblock Y, Tilmant P, Vaurette F, Yarekha D, Berthe M, Thomas L, Diesinger H, Capiod P, Desplanque L, and Grandidier B
- Abstract
Increasing quantum confinement in semiconductor quantum dot (QD) systems is essential to perform robust simulations of many-body physics. By combining molecular beam epitaxy and lithographic techniques, we developed an approach consisting of a twofold selective area growth to build QD chains. Starting from 15 nm-thick and 65 nm-wide in-plane In
0.53 Ga0.47 As nanowires on InP substrates, linear arrays of In0.53 Ga0.47 As QDs were grown on top, with tunable lengths and separations. Kelvin probe force microscopy performed at room temperature revealed a change of quantum confinement in chains with decreasing QD sizes, which was further emphasized by the spectral shift of quantum levels resolved in the conduction band with low temperature scanning tunneling spectroscopy. This approach, which allows the controlled formation of 25 nm-thick QDs with a minimum length and separation of 30 nm and 22 nm respectively, is suitable for the construction of scalable fermionic quantum lattices., (© 2024 IOP Publishing Ltd.)- Published
- 2024
- Full Text
- View/download PDF
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