Search

Your search keyword '"Vallée, Christophe"' showing total 161 results

Search Constraints

Start Over You searched for: Author "Vallée, Christophe" Remove constraint Author: "Vallée, Christophe"
161 results on '"Vallée, Christophe"'

Search Results

5. Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments

15. Production de biocarburants à partir de la ressource oléagineuse

22. Optimization of a Topographic Selective Deposition (TSD) route by a super-cycle Atomic Layer Disposition (ALD) / Atomic Layer Etching (ALE)

23. Heavy Ions Radiation Effects on 4kb Phase-Change Memory

26. Top and Bottom Ta2O5 Topographical Selective Deposition on 3D structures by Plasma Enhanced Atomic Layer Deposition

27. Topographic Area Selective Deposition(TSD): a comparison between PEALD/q-ALE and PEALD/sputtering approaches

28. Elaboration Strategies for Topographically Selective Deposition (TSD) on 3D structures

29. Chemically Selective Deposition of TiN by Ion-Assistance during Plasma Enhanced Atomic Layer Deposition

30. In-situ stripping of native SiO2 for Area Selective Deposition (ASD) of TiN during Plasma Atomic Layer Deposition (PEALD)

31. Measuring photocarrier recombination dynamic at the nanometric scale: From surface to bulk recombination

32. Advanced TEM Techniques for Mechanisms and Reliability Analysis in State-of-the-Art OxRAM and PCM Non-Volatile Memory Devices

34. Atmospheric Plasma-Enhanced Spatial Chemical Vapor Deposition of SiO2 Using Trivinylmethoxysilane and Oxygen Plasma

35. Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

36. Comparative study of two atomic layer etching processes for GaN

38. (Invited) PEALD and ALE for Area Selective Deposition

39. Cold plasma for Atomic Layer Processing: from ALD and ALE to Area Selective Deposition

42. Varicap HfO2 memory-impedance

43. Demonstrating the Ultrathin Metal–Insulator– Metal Diode Using TiN/ZrO 2 –Al 2 O 3 –ZrO 2 Stack by Employing RuO 2 Top Electrode

46. Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2.

47. AC and DC bias effect on capacitance–voltage nonlinearities in Au/HfO2/M (M = Pt, TiN, W, and AlCu) MIM capacitors: effect of the bottom electrode material.

48. Time-Dependent Impedance Switching in HfO2 Memcapacitors

Catalog

Books, media, physical & digital resources