161 results on '"Vallée, Christophe"'
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2. Surface oxidation phenomena in Ge-rich GeSbTe alloys and N doping influence for Phase-Change Memory applications
3. AC and DC bias effect on capacitance–voltage nonlinearities in Au/HfO2/M (M = Pt, TiN, W, and AlCu) MIM capacitors: effect of the bottom electrode material
4. Controlled pinewood fractionation with supercritical ethanol: A prerequisite toward pinewood conversion into chemicals and biofuels
5. Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments
6. Graphene-HfO2-based resistive RAM memories
7. L'IMAGE DES TROIS MOUSQUETAIRES UN PAVÉ DANS LA MARE!
8. Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C–V
9. TOUT SUR LA CAPTATION AUDIO DU TOURNAGE DES TROIS MOUSQUETAIRES AVEC DAVID RIT !
10. Evaluation of plasma parameters on PEALD deposited TaCN
11. Numerical simulations for steam–water CCFL tests using the 1/3 scale rectangular channel simulating a PWR hot leg
12. Counter-current flow limitation in a model of the hot leg of a PWR—Comparison between air/water and steam/water experiments
13. Application of a new drag coefficient model at CFD-simulations on free surface flows relevant for the nuclear reactor safety analysis
14. Area selective deposition using alternate deposition and etch super-cycle strategies
15. Production de biocarburants à partir de la ressource oléagineuse
16. Éternel Mucha... Grand Palais Immersif - Acte 2 !
17. CFD studies on the phenomena around counter-current flow limitations of gas/liquid two-phase flow in a model of a PWR hot leg
18. Interplay of Solid–Liquid Interactions and Anisotropic Aggregation in Solution: The Case Study of γ-AlOOH Crystallites
19. Experimental CFD grade data for stratified two-phase flows
20. Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
21. Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
22. Optimization of a Topographic Selective Deposition (TSD) route by a super-cycle Atomic Layer Disposition (ALD) / Atomic Layer Etching (ALE)
23. Heavy Ions Radiation Effects on 4kb Phase-Change Memory
24. Experimental investigation and CFD simulation of horizontal stratified two-phase flow phenomena
25. Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
26. Top and Bottom Ta2O5 Topographical Selective Deposition on 3D structures by Plasma Enhanced Atomic Layer Deposition
27. Topographic Area Selective Deposition(TSD): a comparison between PEALD/q-ALE and PEALD/sputtering approaches
28. Elaboration Strategies for Topographically Selective Deposition (TSD) on 3D structures
29. Chemically Selective Deposition of TiN by Ion-Assistance during Plasma Enhanced Atomic Layer Deposition
30. In-situ stripping of native SiO2 for Area Selective Deposition (ASD) of TiN during Plasma Atomic Layer Deposition (PEALD)
31. Measuring photocarrier recombination dynamic at the nanometric scale: From surface to bulk recombination
32. Advanced TEM Techniques for Mechanisms and Reliability Analysis in State-of-the-Art OxRAM and PCM Non-Volatile Memory Devices
33. Oxidation Process in Ge-Rich GeSbTe Alloy for Phase-Change Memory: Mechanism, Kinetic and N-Doping Influence
34. Atmospheric Plasma-Enhanced Spatial Chemical Vapor Deposition of SiO2 Using Trivinylmethoxysilane and Oxygen Plasma
35. Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition
36. Comparative study of two atomic layer etching processes for GaN
37. Durability analysis of the maritime infrastructure for the Monaco Sea extension
38. (Invited) PEALD and ALE for Area Selective Deposition
39. Cold plasma for Atomic Layer Processing: from ALD and ALE to Area Selective Deposition
40. The catalytic isomerization reactions of 2-methyl-3-butenenitrile into 3-pentenenitrile in ionic liquids
41. Optimizing MIM Device Electrical Properties. Impact of Bottom Electrodes and High K Materials
42. Varicap HfO2 memory-impedance
43. Demonstrating the Ultrathin Metal–Insulator– Metal Diode Using TiN/ZrO 2 –Al 2 O 3 –ZrO 2 Stack by Employing RuO 2 Top Electrode
44. Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
45. Hybrid‐RRAM toward Next Generation of Nonvolatile Memory: Coupling of Oxygen Vacancies and Metal Ions
46. Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2.
47. AC and DC bias effect on capacitance–voltage nonlinearities in Au/HfO2/M (M = Pt, TiN, W, and AlCu) MIM capacitors: effect of the bottom electrode material.
48. Time-Dependent Impedance Switching in HfO2 Memcapacitors
49. Roughness and chemistry of silicon and polysilicon surfaces etched in high-density plasma: XPS, AFM and ellipsometry analysis
50. Durability Design of the Concrete Caissons for the Artificial Peninsula of Monaco Territory
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