8 results on '"Wu, Yuan-Hsun"'
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2. Application of CPL mask for whole chip 65nm DRAM patterning
3. Effects of mask bias on the mask error enhancement factor (MEEF) for low k1 lithography process
4. Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPL technology
5. Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPL technology.
6. Effects of mask bias on the mask error enhancement factor (MEEF) for low k1 lithography process.
7. Application of CPL mask for whole chip 65nm DRAM patterning.
8. Permeability and volume-change characteristics of bentonite-sand mixes in a contaminant environment
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