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28 results on '"X.T. Chen"'

1. Search for a massless particle beyond the Standard Model in the Σ+ → p + invisible decay

Author

M. Ablikim, M.N. Achasov, P. Adlarson, O. Afedulidis, X.C. Ai, R. Aliberti, A. Amoroso, Q. An, Y. Bai, O. Bakina, I. Balossino, Y. Ban, H.-R. Bao, V. Batozskaya, K. Begzsuren, N. Berger, M. Berlowski, M. Bertani, D. Bettoni, F. Bianchi, E. Bianco, A. Bortone, I. Boyko, R.A. Briere, A. Brueggemann, H. Cai, X. Cai, A. Calcaterra, G.F. Cao, N. Cao, S.A. Cetin, J.F. Chang, G.R. Che, G. Chelkov, C. Chen, C.H. Chen, Chao Chen, G. Chen, H.S. Chen, H.Y. Chen, M.L. Chen, S.J. Chen, S.L. Chen, S.M. Chen, T. Chen, X.R. Chen, X.T. Chen, Y.B. Chen, Y.Q. Chen, Z.J. Chen, Z.Y. Chen, S.K. Choi, G. Cibinetto, F. Cossio, J.J. Cui, H.L. Dai, J.P. Dai, A. Dbeyssi, R.E. de Boer, D. Dedovich, C.Q. Deng, Z.Y. Deng, A. Denig, I. Denysenko, M. Destefanis, F. De Mori, B. Ding, X.X. Ding, Y. Ding, J. Dong, L.Y. Dong, M.Y. Dong, X. Dong, M.C. Du, S.X. Du, Z.H. Duan, P. Egorov, Y.H. Fan, J. Fang, S.S. Fang, W.X. Fang, Y. Fang, Y.Q. Fang, R. Farinelli, L. Fava, F. Feldbauer, G. Felici, C.Q. Feng, J.H. Feng, Y.T. Feng, M. Fritsch, C.D. Fu, J.L. Fu, Y.W. Fu, H. Gao, X.B. Gao, Y.N. Gao, Yang Gao, S. Garbolino, I. Garzia, L. Ge, P.T. Ge, Z.W. Ge, C. Geng, E.M. Gersabeck, A. Gilman, K. Goetzen, L. Gong, W.X. Gong, W. Gradl, S. Gramigna, M. Greco, M.H. Gu, Y.T. Gu, C.Y. Guan, Z.L. Guan, A.Q. Guo, L.B. Guo, M.J. Guo, R.P. Guo, Y.P. Guo, A. Guskov, J. Gutierrez, K.L. Han, T.T. Han, X.Q. Hao, F.A. Harris, K.K. He, K.L. He, F.H. Heinsius, C.H. Heinz, Y.K. Heng, C. Herold, T. Holtmann, P.C. Hong, G.Y. Hou, X.T. Hou, Y.R. Hou, Z.L. Hou, B.Y. Hu, H.M. Hu, J.F. Hu, S.L. Hu, T. Hu, Y. Hu, G.S. Huang, K.X. Huang, L.Q. Huang, X.T. Huang, Y.P. Huang, T. Hussain, F. Hölzken, N. Hüsken, N. in der Wiesche, J. Jackson, S. Janchiv, J.H. Jeong, Q. Ji, Q.P. Ji, W. Ji, X.B. Ji, X.L. Ji, Y.Y. Ji, X.Q. Jia, Z.K. Jia, D. Jiang, H.B. Jiang, P.C. Jiang, S.S. Jiang, T.J. Jiang, X.S. Jiang, Y. Jiang, J.B. Jiao, J.K. Jiao, Z. Jiao, S. Jin, Y. Jin, M.Q. Jing, X.M. Jing, T. Johansson, S. Kabana, N. Kalantar-Nayestanaki, X.L. Kang, X.S. Kang, M. Kavatsyuk, B.C. Ke, V. Khachatryan, A. Khoukaz, R. Kiuchi, O.B. Kolcu, B. Kopf, M. Kuessner, X. Kui, N. Kumar, A. Kupsc, W. Kühn, J.J. Lane, P. Larin, L. Lavezzi, T.T. Lei, Z.H. Lei, M. Lellmann, T. Lenz, C. Li, C.H. Li, Cheng Li, D.M. Li, F. Li, G. Li, H.B. Li, H.J. Li, H.N. Li, Hui Li, J.R. Li, J.S. Li, Ke Li, L.J. Li, L.K. Li, Lei Li, M.H. Li, P.R. Li, Q.M. Li, Q.X. Li, R. Li, S.X. Li, T. Li, W.D. Li, W.G. Li, X. Li, X.H. Li, X.L. Li, X.Z. Li, Xiaoyu Li, Y.G. Li, Z.J. Li, Z.X. Li, C. Liang, H. Liang, Y.F. Liang, Y.T. Liang, G.R. Liao, L.Z. Liao, J. Libby, A. Limphirat, C.C. Lin, D.X. Lin, T. Lin, B.J. Liu, B.X. Liu, C. Liu, C.X. Liu, F.H. Liu, Fang Liu, Feng Liu, G.M. Liu, H. Liu, H.B. Liu, H.M. Liu, Huanhuan Liu, Huihui Liu, J.B. Liu, J.Y. Liu, K. Liu, K.Y. Liu, Ke Liu, L. Liu, L.C. Liu, Lu Liu, M.H. Liu, P.L. Liu, Q. Liu, S.B. Liu, T. Liu, W.K. Liu, W.M. Liu, X. Liu, Y. Liu, Y.B. Liu, Z.A. Liu, Z.D. Liu, Z.Q. Liu, X.C. Lou, F.X. Lu, H.J. Lu, J.G. Lu, X.L. Lu, Y. Lu, Y.P. Lu, Z.H. Lu, C.L. Luo, M.X. Luo, T. Luo, X.L. Luo, X.R. Lyu, Y.F. Lyu, F.C. Ma, H. Ma, H.L. Ma, J.L. Ma, L.L. Ma, M.M. Ma, Q.M. Ma, R.Q. Ma, T. Ma, X.T. Ma, X.Y. Ma, Y. Ma, Y.M. Ma, F.E. Maas, M. Maggiora, S. Malde, Y.J. Mao, Z.P. Mao, S. Marcello, Z.X. Meng, J.G. Messchendorp, G. Mezzadri, H. Miao, T.J. Min, R.E. Mitchell, X.H. Mo, B. Moses, N.Yu. Muchnoi, J. Muskalla, Y. Nefedov, F. Nerling, L.S. Nie, I.B. Nikolaev, Z. Ning, S. Nisar, Q.L. Niu, W.D. Niu, Y. Niu, S.L. Olsen, Q. Ouyang, S. Pacetti, X. Pan, Y. Pan, A. Pathak, P. Patteri, Y.P. Pei, M. Pelizaeus, H.P. Peng, Y.Y. Peng, K. Peters, J.L. Ping, R.G. Ping, S. Plura, V. Prasad, F.Z. Qi, H. Qi, H.R. Qi, M. Qi, T.Y. Qi, S. Qian, W.B. Qian, C.F. Qiao, X.K. Qiao, J.J. Qin, L.Q. Qin, L.Y. Qin, X.S. Qin, Z.H. Qin, J.F. Qiu, Z.H. Qu, C.F. Redmer, K.J. Ren, A. Rivetti, M. Rolo, G. Rong, Ch. Rosner, S.N. Ruan, N. Salone, A. Sarantsev, Y. Schelhaas, K. Schoenning, M. Scodeggio, K.Y. Shan, W. Shan, X.Y. Shan, Z.J. Shang, J.F. Shangguan, L.G. Shao, M. Shao, C.P. Shen, H.F. Shen, W.H. Shen, X.Y. Shen, B.A. Shi, H. Shi, H.C. Shi, J.L. Shi, J.Y. Shi, Q.Q. Shi, S.Y. Shi, X. Shi, J.J. Song, T.Z. Song, W.M. Song, Y.J. Song, Y.X. Song, S. Sosio, S. Spataro, F. Stieler, Y.J. Su, G.B. Sun, G.X. Sun, H. Sun, H.K. Sun, J.F. Sun, K. Sun, L. Sun, S.S. Sun, T. Sun, W.Y. Sun, Y. Sun, Y.J. Sun, Y.Z. Sun, Z.Q. Sun, Z.T. Sun, C.J. Tang, G.Y. Tang, J. Tang, M. Tang, Y.A. Tang, L.Y. Tao, Q.T. Tao, M. Tat, J.X. Teng, V. Thoren, W.H. Tian, Y. Tian, Z.F. Tian, I. Uman, Y. Wan, S.J. Wang, B. Wang, B.L. Wang, Bo Wang, D.Y. Wang, F. Wang, H.J. Wang, J.J. Wang, J.P. Wang, K. Wang, L.L. Wang, M. Wang, Meng Wang, N.Y. Wang, S. Wang, T. Wang, T.J. Wang, W. Wang, W.P. Wang, X. Wang, X.F. Wang, X.J. Wang, X.L. Wang, X.N. Wang, Y. Wang, Y.D. Wang, Y.F. Wang, Y.L. Wang, Y.N. Wang, Y.Q. Wang, Yaqian Wang, Yi Wang, Z. Wang, Z.L. Wang, Z.Y. Wang, Ziyi Wang, D.H. Wei, F. Weidner, S.P. Wen, Y.R. Wen, U. Wiedner, G. Wilkinson, M. Wolke, L. Wollenberg, C. Wu, J.F. Wu, L.H. Wu, L.J. Wu, X. Wu, X.H. Wu, Y. Wu, Y.H. Wu, Y.J. Wu, Z. Wu, L. Xia, X.M. Xian, B.H. Xiang, T. Xiang, D. Xiao, G.Y. Xiao, S.Y. Xiao, Y.L. Xiao, Z.J. Xiao, C. Xie, X.H. Xie, Y. Xie, Y.G. Xie, Y.H. Xie, Z.P. Xie, T.Y. Xing, C.F. Xu, C.J. Xu, G.F. Xu, H.Y. Xu, M. Xu, Q.J. Xu, Q.N. Xu, W. Xu, W.L. Xu, X.P. Xu, Y.C. Xu, Z.P. Xu, Z.S. Xu, F. Yan, L. Yan, W.B. Yan, W.C. Yan, X.Q. Yan, H.J. Yang, H.L. Yang, H.X. Yang, Tao Yang, Y. Yang, Y.F. Yang, Y.X. Yang, Yifan Yang, Z.W. Yang, Z.P. Yao, M. Ye, M.H. Ye, J.H. Yin, Z.Y. You, B.X. Yu, C.X. Yu, G. Yu, J.S. Yu, T. Yu, X.D. Yu, Y.C. Yu, C.Z. Yuan, J. Yuan, L. Yuan, S.C. Yuan, Y. Yuan, Y.J. Yuan, Z.Y. Yuan, C.X. Yue, A.A. Zafar, F.R. Zeng, S.H. Zeng, X. Zeng, Y. Zeng, Y.J. Zeng, X.Y. Zhai, Y.C. Zhai, Y.H. Zhan, A.Q. Zhang, B.L. Zhang, B.X. Zhang, D.H. Zhang, G.Y. Zhang, H. Zhang, H.C. Zhang, H.H. Zhang, H.Q. Zhang, H.R. Zhang, H.Y. Zhang, J. Zhang, J.J. Zhang, J.L. Zhang, J.Q. Zhang, J.S. Zhang, J.W. Zhang, J.X. Zhang, J.Y. Zhang, J.Z. Zhang, Jianyu Zhang, L.M. Zhang, Lei Zhang, P. Zhang, Q.Y. Zhang, R.Y. Zhang, Shuihan Zhang, Shulei Zhang, X.D. Zhang, X.M. Zhang, X.Y. Zhang, Y. Zhang, Y.T. Zhang, Y.H. Zhang, Y.M. Zhang, Yan Zhang, Yao Zhang, Z.D. Zhang, Z.H. Zhang, Z.L. Zhang, Z.Y. Zhang, Z.Z. Zhang, G. Zhao, J.Y. Zhao, J.Z. Zhao, Lei Zhao, Ling Zhao, M.G. Zhao, N. Zhao, R.P. Zhao, S.J. Zhao, Y.B. Zhao, Y.X. Zhao, Z.G. Zhao, A. Zhemchugov, B. Zheng, B.M. Zheng, J.P. Zheng, W.J. Zheng, Y.H. Zheng, B. Zhong, X. Zhong, H. Zhou, J.Y. Zhou, L.P. Zhou, S. Zhou, X. Zhou, X.K. Zhou, X.R. Zhou, X.Y. Zhou, Y.Z. Zhou, J. Zhu, K. Zhu, K.J. Zhu, K.S. Zhu, L. Zhu, L.X. Zhu, S.H. Zhu, S.Q. Zhu, T.J. Zhu, W.D. Zhu, Y.C. Zhu, Z.A. Zhu, J.H. Zou, and J. Zu

Subjects
BESIII, FCNC process, Hyperon decay, BSM particle, Physics, QC1-999
Abstract

A massless particle beyond the Standard Model is searched for in the two-body decay Σ+→p+invisible using (1.0087±0.0044)×1010 J/ψ events collected at a center-of-mass energy of s=3.097GeV with the BESIII detector at the BEPCII collider. No significant signal is observed, and the upper limit on the branching fraction B(Σ+→p+invisible) is determined to be 3.2×10−5 at the 90% confidence level. This is the first search for a flavor-changing neutral current process with missing energy in hyperon decays which plays an important role in constraining new physics models.

Published
2024
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2. Determination of spin and parity of D(s)⁎ mesons

Author

M. Ablikim, M.N. Achasov, P. Adlarson, R. Aliberti, A. Amoroso, M.R. An, Q. An, Y. Bai, O. Bakina, I. Balossino, Y. Ban, V. Batozskaya, K. Begzsuren, N. Berger, M. Berlowski, M. Bertani, D. Bettoni, F. Bianchi, E. Bianco, J. Bloms, A. Bortone, I. Boyko, R.A. Briere, A. Brueggemann, H. Cai, X. Cai, A. Calcaterra, G.F. Cao, N. Cao, S.A. Cetin, J.F. Chang, T.T. Chang, W.L. Chang, G.R. Che, G. Chelkov, C. Chen, Chao Chen, G. Chen, H.S. Chen, M.L. Chen, S.J. Chen, S.M. Chen, T. Chen, X.R. Chen, X.T. Chen, Y.B. Chen, Y.Q. Chen, Z.J. Chen, W.S. Cheng, S.K. Choi, X. Chu, G. Cibinetto, S.C. Coen, F. Cossio, J.J. Cui, H.L. Dai, J.P. Dai, A. Dbeyssi, R.E. de Boer, D. Dedovich, Z.Y. Deng, A. Denig, I. Denysenko, M. Destefanis, F. De Mori, B. Ding, X.X. Ding, Y. Ding, J. Dong, L.Y. Dong, M.Y. Dong, X. Dong, S.X. Du, Z.H. Duan, P. Egorov, Y.L. Fan, J. Fang, S.S. Fang, W.X. Fang, Y. Fang, R. Farinelli, L. Fava, F. Feldbauer, G. Felici, C.Q. Feng, J.H. Feng, K Fischer, M. Fritsch, C. Fritzsch, C.D. Fu, Y.W. Fu, H. Gao, Y.N. Gao, Yang Gao, S. Garbolino, I. Garzia, P.T. Ge, Z.W. Ge, C. Geng, E.M. Gersabeck, A Gilman, K. Goetzen, L. Gong, W.X. Gong, W. Gradl, S. Gramigna, M. Greco, M.H. Gu, Y.T. Gu, C.Y Guan, Z.L. Guan, A.Q. Guo, L.B. Guo, R.P. Guo, Y.P. Guo, A. Guskov, X.T. H., W.Y. Han, X.Q. Hao, F.A. Harris, K.K. He, K.L. He, F.H. Heinsius, C.H. Heinz, Y.K. Heng, C. Herold, T. Holtmann, P.C. Hong, G.Y. Hou, Y.R. Hou, Z.L. Hou, H.M. Hu, J.F. Hu, T. Hu, Y. Hu, G.S. Huang, K.X. Huang, L.Q. Huang, X.T. Huang, Y.P. Huang, T. Hussain, N Hüsken, W. Imoehl, M. Irshad, J. Jackson, S. Jaeger, S. Janchiv, J.H. Jeong, Q. Ji, Q.P. Ji, X.B. Ji, X.L. Ji, Y.Y. Ji, Z.K. Jia, P.C. Jiang, S.S. Jiang, T.J. Jiang, X.S. Jiang, Y. Jiang, J.B. Jiao, Z. Jiao, S. Jin, Y. Jin, M.Q. Jing, T. Johansson, X. K., S. Kabana, N. Kalantar-Nayestanaki, X.L. Kang, X.S. Kang, R. Kappert, M. Kavatsyuk, B.C. Ke, A. Khoukaz, R. Kiuchi, R. Kliemt, L. Koch, O.B. Kolcu, B. Kopf, M. Kuessner, A. Kupsc, W. Kühn, J.J. Lane, J.S. Lange, P. Larin, A. Lavania, L. Lavezzi, T.T. Lei, Z.H. Lei, H. Leithoff, M. Lellmann, T. Lenz, C. Li, C.H. Li, Cheng Li, D.M. Li, F. Li, G. Li, H. Li, H.B. Li, H.J. Li, H.N. Li, Hui Li, J.R. Li, J.S. Li, J.W. Li, Ke Li, L.J Li, L.K. Li, Lei Li, M.H. Li, P.R. Li, S.X. Li, T. Li, W.D. Li, W.G. Li, X.H. Li, X.L. Li, Xiaoyu Li, Y.G. Li, Z.J. Li, Z.X. Li, Z.Y. Li, C. Liang, H. Liang, Y.F. Liang, Y.T. Liang, G.R. Liao, L.Z. Liao, J. Libby, A. Limphirat, D.X. Lin, T. Lin, B.J. Liu, B.X. Liu, C. Liu, C.X. Liu, D. Liu, F.H. Liu, Fang Liu, Feng Liu, G.M. Liu, H. Liu, H.B. Liu, H.M. Liu, Huanhuan Liu, Huihui Liu, J.B. Liu, J.L. Liu, J.Y. Liu, K. Liu, K.Y. Liu, Ke Liu, L. Liu, L.C. Liu, Lu Liu, M.H. Liu, P.L. Liu, Q. Liu, S.B. Liu, T. Liu, W.K. Liu, W.M. Liu, X. Liu, Y. Liu, Y.B. Liu, Z.A. Liu, Z.Q. Liu, X.C. Lou, F.X. Lu, H.J. Lu, J.G. Lu, X.L. Lu, Y. Lu, Y.P. Lu, Z.H. Lu, C.L. Luo, M.X. Luo, T. Luo, X.L. Luo, X.R. Lyu, Y.F. Lyu, F.C. Ma, H.L. Ma, J.L. Ma, L.L. Ma, M.M. Ma, Q.M. Ma, R.Q. Ma, R.T. Ma, X.Y. Ma, Y. Ma, F.E. Maas, M. Maggiora, S. Maldaner, S. Malde, A. Mangoni, Y.J. Mao, Z.P. Mao, S. Marcello, Z.X. Meng, J.G. Messchendorp, G. Mezzadri, H. Miao, T.J. Min, R.E. Mitchell, X.H. Mo, N.Yu. Muchnoi, Y. Nefedov, F. Nerling, I.B. Nikolaev, Z. Ning, S. Nisar, Y. Niu, S.L. Olsen, Q. Ouyang, S. Pacetti, X. Pan, Y. Pan, A. Pathak, Y.P. Pei, M. Pelizaeus, H.P. Peng, K. Peters, J.L. Ping, R.G. Ping, S. Plura, S. Pogodin, V. Prasad, F.Z. Qi, H. Qi, H.R. Qi, M. Qi, T.Y. Qi, S. Qian, W.B. Qian, C.F. Qiao, J.J. Qin, L.Q. Qin, X.P. Qin, X.S. Qin, Z.H. Qin, J.F. Qiu, S.Q. Qu, C.F. Redmer, K.J. Ren, A. Rivetti, V. Rodin, M. Rolo, G. Rong, Ch. Rosner, S.N. Ruan, N. Salone, A. Sarantsev, Y. Schelhaas, K. Schoenning, M. Scodeggio, K.Y. Shan, W. Shan, X.Y. Shan, J.F. Shangguan, L.G. Shao, M. Shao, C.P. Shen, H.F. Shen, W.H. Shen, X.Y. Shen, B.A. Shi, H.C. Shi, J.L. Shi, J.Y. Shi, Q.Q. Shi, R.S. Shi, X. Shi, J.J. Song, T.Z. Song, W.M. Song, Y.J. Song, Y.X. Song, S. Sosio, S. Spataro, F. Stieler, Y.J. Su, G.B. Sun, G.X. Sun, H. Sun, H.K. Sun, J.F. Sun, K. Sun, L. Sun, S.S. Sun, T. Sun, W.Y. Sun, Y. Sun, Y.J. Sun, Y.Z. Sun, Z.T. Sun, Y.X. Tan, C.J. Tang, G.Y. Tang, J. Tang, Y.A. Tang, L.Y Tao, Q.T. Tao, M. Tat, J.X. Teng, V. Thoren, W.H. Tian, Y. Tian, Z.F. Tian, I. Uman, B. Wang, B.L. Wang, Bo Wang, C.W. Wang, D.Y. Wang, F. Wang, H.J. Wang, H.P. Wang, K. Wang, L.L. Wang, M. Wang, Meng Wang, S. Wang, T. Wang, T.J. Wang, W. Wang, W.H. Wang, W.P. Wang, X. Wang, X.F. Wang, X.J. Wang, X.L. Wang, Y. Wang, Y.D. Wang, Y.F. Wang, Y.H. Wang, Y.N. Wang, Y.Q. Wang, Yaqian Wang, Yi Wang, Z. Wang, Z.L. Wang, Z.Y. Wang, Ziyi Wang, D. Wei, D.H. Wei, F. Weidner, S.P. Wen, C.W. Wenzel, U. Wiedner, G. Wilkinson, M. Wolke, L. Wollenberg, C. Wu, J.F. Wu, L.H. Wu, L.J. Wu, X. Wu, X.H. Wu, Y. Wu, Y.J Wu, Z. Wu, L. Xia, X.M. Xian, T. Xiang, D. Xiao, G.Y. Xiao, H. Xiao, S.Y. Xiao, Y.L. Xiao, Z.J. Xiao, C. Xie, X.H. Xie, Y. Xie, Y.G. Xie, Y.H. Xie, Z.P. Xie, T.Y. Xing, C.F. Xu, C.J. Xu, G.F. Xu, H.Y. Xu, Q.J. Xu, W.L. Xu, X.P. Xu, Y.C. Xu, Z.P. Xu, F. Yan, L. Yan, W.B. Yan, W.C. Yan, X.Q Yan, H.J. Yang, H.L. Yang, H.X. Yang, Tao Yang, Y. Yang, Y.F. Yang, Y.X. Yang, Yifan Yang, Z.W. Yang, M. Ye, M.H. Ye, J.H. Yin, Z.Y. You, B.X. Yu, C.X. Yu, G. Yu, T. Yu, X.D. Yu, C.Z. Yuan, L. Yuan, S.C. Yuan, X.Q. Yuan, Y. Yuan, Z.Y. Yuan, C.X. Yue, A.A. Zafar, F.R. Zeng, X. Zeng, Y. Zeng, Y.J. Zeng, X.Y. Zhai, Y.H. Zhan, A.Q. Zhang, B.L. Zhang, B.X. Zhang, D.H. Zhang, G.Y. Zhang, H. Zhang, H.H. Zhang, H.Q. Zhang, H.Y. Zhang, J.J. Zhang, J.L. Zhang, J.Q. Zhang, J.W. Zhang, J.X. Zhang, J.Y. Zhang, J.Z. Zhang, Jiawei Zhang, L.M. Zhang, L.Q. Zhang, Lei Zhang, P. Zhang, Q.Y. Zhang, Shuihan Zhang, Shulei Zhang, X.D. Zhang, X.M. Zhang, X.Y. Zhang, Y. Zhang, Y.T. Zhang, Y.H. Zhang, Yan Zhang, Yao Zhang, Z.H. Zhang, Z.L. Zhang, Z.Y. Zhang, G. Zhao, J. Zhao, J.Y. Zhao, J.Z. Zhao, Lei Zhao, Ling Zhao, M.G. Zhao, S.J. Zhao, Y.B. Zhao, Y.X. Zhao, Z.G. Zhao, A. Zhemchugov, B. Zheng, J.P. Zheng, W.J. Zheng, Y.H. Zheng, B. Zhong, X. Zhong, H. Zhou, L.P. Zhou, X. Zhou, X.K. Zhou, X.R. Zhou, X.Y. Zhou, Y.Z. Zhou, J. Zhu, K. Zhu, K.J. Zhu, L. Zhu, L.X. Zhu, S.H. Zhu, S.Q. Zhu, T.J. Zhu, W.J. Zhu, Y.C. Zhu, Z.A. Zhu, J.H. Zou, and J. Zu

Subjects
Charmed meson, Spin and parity, BESIII, Physics, QC1-999
Abstract

The spin and parity of the charmed mesons Ds⁎+, D⁎0 and D⁎+ are determined for the first time to be JP=1− with significances greater than 10σ over other hypotheses of 2+ and 3−, using an e+e− collision data sample with an integrated luminosity of 3.19 fb−1 collected by the BESIII detector at a center-of-mass energy of 4.178 GeV. Different spin-parity hypotheses are tested via a helicity amplitude analysis of the processes e+e−→Ds⁎+Ds−, D⁎0D0 and D⁎+D−, with Ds⁎+→Ds+γ, D⁎0→D0π0, and D⁎+→D+π0. The results confirm the quark model predictions.

Published
2023
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3. Search for the semi-leptonic decays Λc+→Λπ+π−e+νe and Λc+→pKS0π−e+νe

Author

M. Ablikim, M.N. Achasov, P. Adlarson, R. Aliberti, A. Amoroso, M.R. An, Q. An, Y. Bai, O. Bakina, I. Balossino, Y. Ban, V. Batozskaya, K. Begzsuren, N. Berger, M. Bertani, D. Bettoni, F. Bianchi, E. Bianco, J. Bloms, A. Bortone, I. Boyko, R.A. Briere, A. Brueggemann, H. Cai, X. Cai, A. Calcaterra, G.F. Cao, N. Cao, S.A. Cetin, J.F. Chang, T.T. Chang, W.L. Chang, G.R. Che, G. Chelkov, C. Chen, Chao Chen, G. Chen, H.S. Chen, M.L. Chen, S.J. Chen, S.M. Chen, T. Chen, X.R. Chen, X.T. Chen, Y.B. Chen, Y.Q. Chen, Z.J. Chen, W.S. Cheng, S.K. Choi, X. Chu, G. Cibinetto, S.C. Coen, F. Cossio, J.J. Cui, H.L. Dai, J.P. Dai, A. Dbeyssi, R.E. de Boer, D. Dedovich, Z.Y. Deng, A. Denig, I. Denysenko, M. Destefanis, F. De Mori, B. Ding, X.X. Ding, Y. Ding, J. Dong, L.Y. Dong, M.Y. Dong, X. Dong, S.X. Du, Z.H. Duan, P. Egorov, Y.L. Fan, J. Fang, S.S. Fang, W.X. Fang, Y. Fang, R. Farinelli, L. Fava, F. Feldbauer, G. Felici, C.Q. Feng, J.H. Feng, K. Fischer, M. Fritsch, C. Fritzsch, C.D. Fu, Y.W. Fu, H. Gao, Y.N. Gao, Yang Gao, S. Garbolino, I. Garzia, P.T. Ge, Z.W. Ge, C. Geng, E.M. Gersabeck, A. Gilman, K. Goetzen, L. Gong, W.X. Gong, W. Gradl, S. Gramigna, M. Greco, M.H. Gu, Y.T. Gu, C.Y. Guan, Z.L. Guan, A.Q. Guo, L.B. Guo, R.P. Guo, Y.P. Guo, A. Guskov, X.T. H, W.Y. Han, X.Q. Hao, F.A. Harris, K.K. He, K.L. He, F.H. Heinsius, C.H. Heinz, Y.K. Heng, C. Herold, T. Holtmann, P.C. Hong, G.Y. Hou, Y.R. Hou, Z.L. Hou, H.M. Hu, J.F. Hu, T. Hu, Y. Hu, G.S. Huang, K.X. Huang, L.Q. Huang, X.T. Huang, Y.P. Huang, T. Hussain, N. Hüsken, W. Imoehl, M. Irshad, J. Jackson, S. Jaeger, S. Janchiv, J.H. Jeong, Q. Ji, Q.P. Ji, X.B. Ji, X.L. Ji, Y.Y. Ji, Z.K. Jia, P.C. Jiang, S.S. Jiang, T.J. Jiang, X.S. Jiang, Y. Jiang, J.B. Jiao, Z. Jiao, S. Jin, Y. Jin, M.Q. Jing, T. Johansson, X. K, S. Kabana, N. Kalantar-Nayestanaki, X.L. Kang, X.S. Kang, R. Kappert, M. Kavatsyuk, B.C. Ke, A. Khoukaz, R. Kiuchi, R. Kliemt, L. Koch, O.B. Kolcu, B. Kopf, M. Kuessner, A. Kupsc, W. Kühn, J.J. Lane, J.S. Lange, P. Larin, A. Lavania, L. Lavezzi, T.T. Lei, Z.H. Lei, H. Leithoff, M. Lellmann, T. Lenz, C. Li, C.H. Li, Cheng Li, D.M. Li, F. Li, G. Li, H. Li, H.B. Li, H.J. Li, H.N. Li, Hui Li, J.R. Li, J.S. Li, J.W. Li, Ke Li, L.J. Li, L.K. Li, Lei Li, M.H. Li, P.R. Li, S.X. Li, T. Li, W.D. Li, W.G. Li, X.H. Li, X.L. Li, Xiaoyu Li, Y.G. Li, Z.J. Li, Z.X. Li, Z.Y. Li, C. Liang, H. Liang, Y.F. Liang, Y.T. Liang, G.R. Liao, L.Z. Liao, J. Libby, A. Limphirat, D.X. Lin, T. Lin, B.J. Liu, B.X. Liu, C. Liu, C.X. Liu, D. Liu, F.H. Liu, Fang Liu, Feng Liu, G.M. Liu, H. Liu, H.B. Liu, H.M. Liu, Huanhuan Liu, Huihui Liu, J.B. Liu, J.L. Liu, J.Y. Liu, K. Liu, K.Y. Liu, Ke Liu, L. Liu, L.C. Liu, Lu Liu, M.H. Liu, P.L. Liu, Q. Liu, S.B. Liu, T. Liu, W.K. Liu, W.M. Liu, X. Liu, Y. Liu, Y.B. Liu, Z.A. Liu, Z.Q. Liu, X.C. Lou, F.X. Lu, H.J. Lu, J.G. Lu, X.L. Lu, Y. Lu, Y.P. Lu, Z.H. Lu, C.L. Luo, M.X. Luo, T. Luo, X.L. Luo, X.R. Lyu, Y.F. Lyu, F.C. Ma, H.L. Ma, J.L. Ma, L.L. Ma, M.M. Ma, Q.M. Ma, R.Q. Ma, R.T. Ma, X.Y. Ma, Y. Ma, F.E. Maas, M. Maggiora, S. Maldaner, S. Malde, A. Mangoni, Y.J. Mao, Z.P. Mao, S. Marcello, Z.X. Meng, J.G. Messchendorp, G. Mezzadri, H. Miao, T.J. Min, R.E. Mitchell, X.H. Mo, N.Yu. Muchnoi, Y. Nefedov, F. Nerling, I.B. Nikolaev, Z. Ning, S. Nisar, Y. Niu, S.L. Olsen, Q. Ouyang, S. Pacetti, X. Pan, Y. Pan, A. Pathak, Y.P. Pei, M. Pelizaeus, H.P. Peng, K. Peters, J.L. Ping, R.G. Ping, S. Plura, S. Pogodin, V. Prasad, F.Z. Qi, H. Qi, H.R. Qi, M. Qi, T.Y. Qi, S. Qian, W.B. Qian, C.F. Qiao, J.J. Qin, L.Q. Qin, X.P. Qin, X.S. Qin, Z.H. Qin, J.F. Qiu, S.Q. Qu, C.F. Redmer, K.J. Ren, A. Rivetti, V. Rodin, M. Rolo, G. Rong, Ch. Rosner, S.N. Ruan, N. Salone, A. Sarantsev, Y. Schelhaas, K. Schoenning, M. Scodeggio, K.Y. Shan, W. Shan, X.Y. Shan, J.F. Shangguan, L.G. Shao, M. Shao, C.P. Shen, H.F. Shen, W.H. Shen, X.Y. Shen, B.A. Shi, H.C. Shi, J.L. Shi, J.Y. Shi, Q.Q. Shi, R.S. Shi, X. Shi, J.J. Song, T.Z. Song, W.M. Song, Y.J. Song, Y.X. Song, S. Sosio, S. Spataro, F. Stieler, Y.J. Su, G.B. Sun, G.X. Sun, H. Sun, H.K. Sun, J.F. Sun, K. Sun, L. Sun, S.S. Sun, T. Sun, W.Y. Sun, Y. Sun, Y.J. Sun, Y.Z. Sun, Z.T. Sun, Y.X. Tan, C.J. Tang, G.Y. Tang, J. Tang, Y.A. Tang, L.Y. Tao, Q.T. Tao, M. Tat, J.X. Teng, V. Thoren, W.H. Tian, Y. Tian, Z.F. Tian, I. Uman, B. Wang, B.L. Wang, Bo Wang, C.W. Wang, D.Y. Wang, F. Wang, H.J. Wang, H.P. Wang, K. Wang, L.L. Wang, M. Wang, Meng Wang, S. Wang, T. Wang, T.J. Wang, W. Wang, W.H. Wang, W.P. Wang, X. Wang, X.F. Wang, X.J. Wang, X.L. Wang, Y. Wang, Y.D. Wang, Y.F. Wang, Y.H. Wang, Y.N. Wang, Y.Q. Wang, Yaqian Wang, Yi Wang, Z. Wang, Z.L. Wang, Z.Y. Wang, Ziyi Wang, D. Wei, D.H. Wei, F. Weidner, S.P. Wen, C.W. Wenzel, U. Wiedner, G. Wilkinson, M. Wolke, L. Wollenberg, C. Wu, J.F. Wu, L.H. Wu, L.J. Wu, X. Wu, X.H. Wu, Y. Wu, Y.J. Wu, Z. Wu, L. Xia, X.M. Xian, T. Xiang, D. Xiao, G.Y. Xiao, H. Xiao, S.Y. Xiao, Y.L. Xiao, Z.J. Xiao, C. Xie, X.H. Xie, Y. Xie, Y.G. Xie, Y.H. Xie, Z.P. Xie, T.Y. Xing, C.F. Xu, C.J. Xu, G.F. Xu, H.Y. Xu, Q.J. Xu, W.L. Xu, X.P. Xu, Y.C. Xu, Z.P. Xu, F. Yan, L. Yan, W.B. Yan, W.C. Yan, X.Q. Yan, H.J. Yang, H.L. Yang, H.X. Yang, Tao Yang, Y. Yang, Y.F. Yang, Y.X. Yang, Yifan Yang, Z.W. Yang, M. Ye, M.H. Ye, J.H. Yin, Z.Y. You, B.X. Yu, C.X. Yu, G. Yu, T. Yu, X.D. Yu, C.Z. Yuan, L. Yuan, S.C. Yuan, X.Q. Yuan, Y. Yuan, Z.Y. Yuan, C.X. Yue, A.A. Zafar, F.R. Zeng, X. Zeng, Y. Zeng, Y.J. Zeng, X.Y. Zhai, Y.H. Zhan, A.Q. Zhang, B.L. Zhang, B.X. Zhang, D.H. Zhang, G.Y. Zhang, H. Zhang, H.H. Zhang, H.Q. Zhang, H.Y. Zhang, J.J. Zhang, J.L. Zhang, J.Q. Zhang, J.W. Zhang, J.X. Zhang, J.Y. Zhang, J.Z. Zhang, Jiawei Zhang, L.M. Zhang, L.Q. Zhang, Lei Zhang, P. Zhang, Q.Y. Zhang, Shuihan Zhang, Shulei Zhang, X.D. Zhang, X.M. Zhang, X.Y. Zhang, Y. Zhang, Y.T. Zhang, Y.H. Zhang, Yan Zhang, Yao Zhang, Z.H. Zhang, Z.L. Zhang, Z.Y. Zhang, G. Zhao, J. Zhao, J.Y. Zhao, J.Z. Zhao, Lei Zhao, Ling Zhao, M.G. Zhao, S.J. Zhao, Y.B. Zhao, Y.X. Zhao, Z.G. Zhao, A. Zhemchugov, B. Zheng, J.P. Zheng, W.J. Zheng, Y.H. Zheng, B. Zhong, X. Zhong, H. Zhou, L.P. Zhou, X. Zhou, X.K. Zhou, X.R. Zhou, X.Y. Zhou, Y.Z. Zhou, J. Zhu, K. Zhu, K.J. Zhu, L. Zhu, L.X. Zhu, S.H. Zhu, S.Q. Zhu, T.J. Zhu, W.J. Zhu, Y.C. Zhu, Z.A. Zhu, J.H. Zou, and J. Zu

Subjects
BESIII, Λc+ baryon, Semi-leptonic decays, Branching fractions, Physics, QC1-999
Abstract

We search for the semi-leptonic decays Λc+→Λπ+π−e+νe and Λc+→pKS0π−e+νe in a sample of 4.5fb−1 of e+e− annihilation data collected in the center-of-mass energy region between 4.600GeV and 4.699GeV by the BESIII detector at the BEPCII. No significant signals are observed, and the upper limits on the decay branching fractions are set to be B(Λc+→Λπ+π−e+νe)

Published
2023
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4. Search for invisible decays of a dark photon using e+e− annihilation data at BESIII

Author

M. Ablikim, M.N. Achasov, P. Adlarson, M. Albrecht, R. Aliberti, A. Amoroso, M.R. An, Q. An, X.H. Bai, Y. Bai, O. Bakina, R. Baldini Ferroli, I. Balossino, Y. Ban, V. Batozskaya, D. Becker, K. Begzsuren, N. Berger, M. Bertani, D. Bettoni, F. Bianchi, J. Bloms, A. Bortone, I. Boyko, R.A. Briere, A. Brueggemann, H. Cai, X. Cai, A. Calcaterra, G.F. Cao, N. Cao, S.A. Cetin, J.F. Chang, W.L. Chang, G. Chelkov, C. Chen, Chao Chen, G. Chen, H.S. Chen, M.L. Chen, S.J. Chen, S.M. Chen, T. Chen, X.R. Chen, X.T. Chen, Y.B. Chen, Z.J. Chen, W.S. Cheng, S.K. Choi, X. Chu, G. Cibinetto, S.C. Coen, F. Cossio, J.J. Cui, H.L. Dai, J.P. Dai, A. Dbeyssi, R.E. de Boer, D. Dedovich, Z.Y. Deng, A. Denig, I. Denysenko, M. Destefanis, F. De Mori, Y. Ding, J. Dong, L.Y. Dong, M.Y. Dong, X. Dong, S.X. Du, P. Egorov, Y.L. Fan, J. Fang, S.S. Fang, W.X. Fang, Y. Fang, R. Farinelli, L. Fava, F. Feldbauer, G. Felici, C.Q. Feng, J.H. Feng, K. Fischer, M. Fritsch, C. Fritzsch, C.D. Fu, H. Gao, Y.N. Gao, Yang Gao, S. Garbolino, I. Garzia, P.T. Ge, Z.W. Ge, C. Geng, E.M. Gersabeck, A. Gilman, K. Goetzen, L. Gong, W.X. Gong, W. Gradl, M. Greco, L.M. Gu, M.H. Gu, Y.T. Gu, C.Y. Guan, A.Q. Guo, L.B. Guo, R.P. Guo, Y.P. Guo, A. Guskov, T.T. Han, W.Y. Han, X.Q. Hao, F.A. Harris, K.K. He, K.L. He, F.H. Heinsius, C.H. Heinz, Y.K. Heng, C. Herold, M. Himmelreich, T. Holtmann, G.Y. Hou, Y.R. Hou, Z.L. Hou, H.M. Hu, J.F. Hu, T. Hu, Y. Hu, G.S. Huang, K.X. Huang, L.Q. Huang, X.T. Huang, Y.P. Huang, T. Hussain, N. Hüsken, W. Imoehl, M. Irshad, J. Jackson, S. Jaeger, S. Janchiv, E. Jang, J.H. Jeong, Q. Ji, Q.P. Ji, X.B. Ji, X.L. Ji, Y.Y. Ji, Z.K. Jia, H.B. Jiang, S.S. Jiang, X.S. Jiang, Y. Jiang, J.B. Jiao, Z. Jiao, S. Jin, Y. Jin, M.Q. Jing, T. Johansson, N. Kalantar-Nayestanaki, X.S. Kang, R. Kappert, M. Kavatsyuk, B.C. Ke, I.K. Keshk, A. Khoukaz, R. Kiuchi, R. Kliemt, L. Koch, O.B. Kolcu, B. Kopf, M. Kuemmel, M. Kuessner, A. Kupsc, W. Kühn, J.J. Lane, J.S. Lange, P. Larin, A. Lavania, L. Lavezzi, T.T. Lei, Z.H. Lei, H. Leithoff, M. Lellmann, T. Lenz, C. Li, C.H. Li, Cheng Li, D.M. Li, F. Li, G. Li, H. Li, H.B. Li, H.J. Li, H.N. Li, J.Q. Li, J.S. Li, J.W. Li, Ke Li, L.J. Li, L.K. Li, Lei Li, M.H. Li, P.R. Li, S.X. Li, S.Y. Li, T. Li, W.D. Li, W.G. Li, X.H. Li, X.L. Li, Xiaoyu Li, Z.X. Li, Z.Y. Li, H. Liang, Y.F. Liang, Y.T. Liang, G.R. Liao, L.Z. Liao, J. Libby, A. Limphirat, D.X. Lin, T. Lin, B.J. Liu, C.X. Liu, D. Liu, F.H. Liu, Fang Liu, Feng Liu, G.M. Liu, H. Liu, H.B. Liu, H.M. Liu, Huanhuan Liu, Huihui Liu, J.B. Liu, J.L. Liu, J.Y. Liu, K. Liu, K.Y. Liu, Ke Liu, L. Liu, Lu Liu, M.H. Liu, P.L. Liu, Q. Liu, S.B. Liu, T. Liu, W.K. Liu, W.M. Liu, X. Liu, Y. Liu, Y.B. Liu, Z.A. Liu, Z.Q. Liu, X.C. Lou, F.X. Lu, H.J. Lu, J.G. Lu, X.L. Lu, Y. Lu, Y.P. Lu, Z.H. Lu, C.L. Luo, M.X. Luo, T. Luo, X.L. Luo, X.R. Lyu, Y.F. Lyu, F.C. Ma, H.L. Ma, L.L. Ma, M.M. Ma, Q.M. Ma, R.Q. Ma, R.T. Ma, X.Y. Ma, Y. Ma, F.E. Maas, M. Maggiora, S. Maldaner, S. Malde, Q.A. Malik, A. Mangoni, Y.J. Mao, Z.P. Mao, S. Marcello, Z.X. Meng, J.G. Messchendorp, G. Mezzadri, H. Miao, T.J. Min, R.E. Mitchell, X.H. Mo, N.Yu. Muchnoi, Y. Nefedov, F. Nerling, I.B. Nikolaev, Z. Ning, S. Nisar, Y. Niu, S.L. Olsen, Q. Ouyang, S. Pacetti, X. Pan, Y. Pan, A. Pathak, Y.P. Pei, M. Pelizaeus, H.P. Peng, K. Peters, J.L. Ping, R.G. Ping, S. Plura, S. Pogodin, V. Prasad, F.Z. Qi, H. Qi, H.R. Qi, M. Qi, T.Y. Qi, S. Qian, W.B. Qian, Z. Qian, C.F. Qiao, J.J. Qin, L.Q. Qin, X.P. Qin, X.S. Qin, Z.H. Qin, J.F. Qiu, S.Q. Qu, K.H. Rashid, C.F. Redmer, K.J. Ren, A. Rivetti, V. Rodin, M. Rolo, G. Rong, Ch. Rosner, S.N. Ruan, A. Sarantsev, Y. Schelhaas, C. Schnier, K. Schoenning, M. Scodeggio, K.Y. Shan, W. Shan, X.Y. Shan, J.F. Shangguan, L.G. Shao, M. Shao, C.P. Shen, H.F. Shen, X.Y. Shen, B.A. Shi, H.C. Shi, J.Y. Shi, Q.Q. Shi, R.S. Shi, X. Shi, X.D. Shi, J.J. Song, W.M. Song, Y.X. Song, S. Sosio, S. Spataro, F. Stieler, K.X. Su, P.P. Su, Y.J. Su, G.X. Sun, H. Sun, H.K. Sun, J.F. Sun, L. Sun, S.S. Sun, T. Sun, W.Y. Sun, X. Sun, Y.J. Sun, Y.Z. Sun, Z.T. Sun, Y.H. Tan, Y.X. Tan, C.J. Tang, G.Y. Tang, J. Tang, L.Y. Tao, Q.T. Tao, M. Tat, J.X. Teng, V. Thoren, W.H. Tian, Y. Tian, I. Uman, B. Wang, B.L. Wang, C.W. Wang, D.Y. Wang, F. Wang, H.J. Wang, H.P. Wang, K. Wang, L.L. Wang, M. Wang, Meng Wang, S. Wang, T. Wang, T.J. Wang, W. Wang, W.H. Wang, W.P. Wang, X. Wang, X.F. Wang, X.L. Wang, Y. Wang, Y.D. Wang, Y.F. Wang, Y.H. Wang, Y.Q. Wang, Yaqian Wang, Z. Wang, Z.Y. Wang, Ziyi Wang, D.H. Wei, F. Weidner, S.P. Wen, C.W. Wenzel, D.J. White, U. Wiedner, G. Wilkinson, M. Wolke, L. Wollenberg, J.F. Wu, L.H. Wu, L.J. Wu, X. Wu, X.H. Wu, Y. Wu, Y.J. Wu, Z. Wu, L. Xia, T. Xiang, D. Xiao, G.Y. Xiao, H. Xiao, S.Y. Xiao, Y.L. Xiao, Z.J. Xiao, C. Xie, X.H. Xie, Y. Xie, Y.G. Xie, Y.H. Xie, Z.P. Xie, T.Y. Xing, C.F. Xu, C.J. Xu, G.F. Xu, H.Y. Xu, Q.J. Xu, X.P. Xu, Y.C. Xu, Z.P. Xu, F. Yan, L. Yan, W.B. Yan, W.C. Yan, H.J. Yang, H.L. Yang, H.X. Yang, L. Yang, S.L. Yang, Tao Yang, Y.F. Yang, Y.X. Yang, Yifan Yang, M. Ye, M.H. Ye, J.H. Yin, Z.Y. You, B.X. Yu, C.X. Yu, G. Yu, T. Yu, X.D. Yu, C.Z. Yuan, L. Yuan, S.C. Yuan, X.Q. Yuan, Y. Yuan, Z.Y. Yuan, C.X. Yue, A.A. Zafar, F.R. Zeng, X. Zeng, Y. Zeng, Y.H. Zhan, A.Q. Zhang, B.L. Zhang, B.X. Zhang, D.H. Zhang, G.Y. Zhang, H. Zhang, H.H. Zhang, H.Y. Zhang, J.J. Zhang, J.L. Zhang, J.Q. Zhang, J.W. Zhang, J.X. Zhang, J.Y. Zhang, J.Z. Zhang, Jianyu Zhang, Jiawei Zhang, L.M. Zhang, L.Q. Zhang, Lei Zhang, P. Zhang, Q.Y. Zhang, Shuihan Zhang, Shulei Zhang, X.D. Zhang, X.M. Zhang, X.Y. Zhang, Y. Zhang, Y.T. Zhang, Y.H. Zhang, Yan Zhang, Yao Zhang, Z.H. Zhang, Z.Y. Zhang, G. Zhao, J. Zhao, J.Y. Zhao, J.Z. Zhao, Lei Zhao, Ling Zhao, M.G. Zhao, Q. Zhao, S.J. Zhao, Y.B. Zhao, Y.X. Zhao, Z.G. Zhao, A. Zhemchugov, B. Zheng, J.P. Zheng, Y.H. Zheng, B. Zhong, C. Zhong, X. Zhong, H. Zhou, L.P. Zhou, X. Zhou, X.K. Zhou, X.R. Zhou, X.Y. Zhou, Y.Z. Zhou, J. Zhu, K. Zhu, K.J. Zhu, L.X. Zhu, S.H. Zhu, S.Q. Zhu, W.J. Zhu, Y.C. Zhu, Z.A. Zhu, B.S. Zou, J.H. Zou, and J. Zu

Subjects
Dark sector, Dark photon, Invisible decays, Physics, QC1-999
Abstract

We report a search for a dark photon using 14.9 fb−1 of e+e− annihilation data taken at center-of-mass energies from 4.13 to 4.60 GeV with the BESIII detector operated at the BEPCII storage ring. The dark photon is assumed to be produced in the radiative annihilation process of e+e− and to predominantly decay into light dark matter particles, which escape from the detector undetected. The mass range from 1.5 to 2.9 GeV is scanned for the dark photon candidate, and no significant signal is observed. The mass dependent upper limits at the 90% confidence level on the coupling strength parameter ϵ for a dark photon coupling with an ordinary photon vary between 1.6×10−3 and 5.7×10−3.

Published
2023
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5. Search for an axion-like particle in radiative J/ψ decays

Author

M. Ablikim, M.N. Achasov, P. Adlarson, R. Aliberti, A. Amoroso, M.R. An, Q. An, Y. Bai, O. Bakina, R. Baldini Ferroli, I. Balossino, Y. Ban, V. Batozskaya, D. Becker, K. Begzsuren, N. Berger, M. Bertani, D. Bettoni, F. Bianchi, E. Bianco, J. Bloms, A. Bortone, I. Boyko, R.A. Briere, A. Brueggemann, H. Cai, X. Cai, A. Calcaterra, G.F. Cao, N. Cao, S.A. Cetin, J.F. Chang, T.T. Chang, W.L. Chang, G.R. Che, G. Chelkov, C. Chen, Chao Chen, G. Chen, H.S. Chen, M.L. Chen, S.J. Chen, S.M. Chen, T. Chen, X.R. Chen, X.T. Chen, Y.B. Chen, Y.Q. Chen, Z.J. Chen, W.S. Cheng, S.K. Choi, X. Chu, G. Cibinetto, S.C. Coen, F. Cossio, J.J. Cui, H.L. Dai, J.P. Dai, A. Dbeyssi, R.E. de Boer, D. Dedovich, Z.Y. Deng, A. Denig, I. Denysenko, M. Destefanis, F. De Mori, Y. Ding, J. Dong, L.Y. Dong, M.Y. Dong, X. Dong, S.X. Du, Z.H. Duan, P. Egorov, Y.L. Fan, J. Fang, S.S. Fang, W.X. Fang, Y. Fang, R. Farinelli, L. Fava, F. Feldbauer, G. Felici, C.Q. Feng, J.H. Feng, K. Fischer, M. Fritsch, C. Fritzsch, C.D. Fu, Y.W. Fu, H. Gao, Y.N. Gao, Yang Gao, S. Garbolino, I. Garzia, P.T. Ge, Z.W. Ge, C. Geng, E.M. Gersabeck, A. Gilman, K. Goetzen, L. Gong, W.X. Gong, W. Gradl, M. Greco, M.H. Gu, Y.T. Gu, C.Y. Guan, Z.L. Guan, A.Q. Guo, L.B. Guo, R.P. Guo, Y.P. Guo, A. Guskov, X.T. H., W.Y. Han, X.Q. Hao, F.A. Harris, K.K. He, K.L. He, F.H. Heinsius, C.H. Heinz, Y.K. Heng, C. Herold, T. Holtmann, P.C. Hong, G.Y. Hou, Y.R. Hou, Z.L. Hou, H.M. Hu, J.F. Hu, T. Hu, Y. Hu, G.S. Huang, K.X. Huang, L.Q. Huang, X.T. Huang, Y.P. Huang, T. Hussain, N. Hüsken, W. Imoehl, M. Irshad, J. Jackson, S. Jaeger, S. Janchiv, J.H. Jeong, Q. Ji, Q.P. Ji, X.B. Ji, X.L. Ji, Y.Y. Ji, Z.K. Jia, P.C. Jiang, S.S. Jiang, T.J. Jiang, X.S. Jiang, Y. Jiang, J.B. Jiao, Z. Jiao, S. Jin, Y. Jin, M.Q. Jing, T. Johansson, X. K., S. Kabana, N. Kalantar-Nayestanaki, X.L. Kang, X.S. Kang, R. Kappert, M. Kavatsyuk, B.C. Ke, A. Khoukaz, R. Kiuchi, R. Kliemt, L. Koch, O.B. Kolcu, B. Kopf, M. Kuessner, A. Kupsc, W. Kühn, J.J. Lane, J.S. Lange, P. Larin, A. Lavania, L. Lavezzi, T.T. Lei, Z.H. Lei, H. Leithoff, M. Lellmann, T. Lenz, C. Li, C.H. Li, Cheng Li, D.M. Li, F. Li, G. Li, H. Li, H.B. Li, H.J. Li, H.N. Li, Hui Li, J.R. Li, J.S. Li, J.W. Li, Ke Li, L.J. Li, L.K. Li, Lei Li, M.H. Li, P.R. Li, S.X. Li, S.Y. Li, T. Li, W.D. Li, W.G. Li, X.H. Li, X.L. Li, Xiaoyu Li, Y.G. Li, Z.J. Li, Z.X. Li, Z.Y. Li, C. Liang, H. Liang, Y.F. Liang, Y.T. Liang, G.R. Liao, L.Z. Liao, J. Libby, A. Limphirat, D.X. Lin, T. Lin, B.X. Liu, B.J. Liu, C. Liu, C.X. Liu, D. Liu, F.H. Liu, Fang Liu, Feng Liu, G.M. Liu, H. Liu, H.B. Liu, H.M. Liu, Huanhuan Liu, Huihui Liu, J.B. Liu, J.L. Liu, J.Y. Liu, K. Liu, K.Y. Liu, Ke Liu, L. Liu, L.C. Liu, Lu Liu, M.H. Liu, P.L. Liu, Q. Liu, S.B. Liu, T. Liu, W.K. Liu, W.M. Liu, X. Liu, Y. Liu, Y.B. Liu, Z.A. Liu, Z.Q. Liu, X.C. Lou, F.X. Lu, H.J. Lu, J.G. Lu, X.L. Lu, Y. Lu, Y.P. Lu, Z.H. Lu, C.L. Luo, M.X. Luo, T. Luo, X.L. Luo, X.R. Lyu, Y.F. Lyu, F.C. Ma, H.L. Ma, J.L. Ma, L.L. Ma, M.M. Ma, Q.M. Ma, R.Q. Ma, R.T. Ma, X.Y. Ma, Y. Ma, F.E. Maas, M. Maggiora, S. Maldaner, S. Malde, A. Mangoni, Y.J. Mao, Z.P. Mao, S. Marcello, Z.X. Meng, J.G. Messchendorp, G. Mezzadri, H. Miao, T.J. Min, R.E. Mitchell, X.H. Mo, N.Yu. Muchnoi, Y. Nefedov, F. Nerling, I.B. Nikolaev, Z. Ning, S. Nisar, Y. Niu, S.L. Olsen, Q. Ouyang, S. Pacetti, X. Pan, Y. Pan, A. Pathak, Y.P. Pei, M. Pelizaeus, H.P. Peng, K. Peters, J.L. Ping, R.G. Ping, S. Plura, S. Pogodin, V. Prasad, F.Z. Qi, H. Qi, H.R. Qi, M. Qi, T.Y. Qi, S. Qian, W.B. Qian, C.F. Qiao, J.J. Qin, L.Q. Qin, X.P. Qin, X.S. Qin, Z.H. Qin, J.F. Qiu, S.Q. Qu, C.F. Redmer, K.J. Ren, A. Rivetti, V. Rodin, M. Rolo, G. Rong, Ch. Rosner, S.N. Ruan, A. Sarantsev, Y. Schelhaas, K. Schoenning, M. Scodeggio, K.Y. Shan, W. Shan, X.Y. Shan, J.F. Shangguan, L.G. Shao, M. Shao, C.P. Shen, H.F. Shen, W.H. Shen, X.Y. Shen, B.A. Shi, H.C. Shi, J.Y. Shi, Q.Q. Shi, R.S. Shi, X. Shi, J.J. Song, T.Z. Song, W.M. Song, Y.X. Song, S. Sosio, S. Spataro, F. Stieler, Y.J. Su, G.B. Sun, G.X. Sun, H. Sun, H.K. Sun, J.F. Sun, K. Sun, L. Sun, S.S. Sun, T. Sun, W.Y. Sun, Y. Sun, Y.J. Sun, Y.Z. Sun, Z.T. Sun, Y.X. Tan, C.J. Tang, G.Y. Tang, J. Tang, Y.A. Tang, L.Y. Tao, Q.T. Tao, M. Tat, J.X. Teng, V. Thoren, W.H. Tian, Y. Tian, Z.F. Tian, I. Uman, B. Wang, B.L. Wang, C.W. Wang, D.Y. Wang, F. Wang, H.J. Wang, H.P. Wang, K. Wang, L.L. Wang, M. Wang, Meng Wang, S. Wang, T. Wang, T.J. Wang, W. Wang, W.H. Wang, W.P. Wang, X. Wang, X.F. Wang, X.J. Wang, X.L. Wang, Y. Wang, Y.D. Wang, Y.F. Wang, Y.H. Wang, Y.N. Wang, Y.Q. Wang, Yaqian Wang, Yi Wang, Z. Wang, Z.L. Wang, Z.Y. Wang, Ziyi Wang, D. Wei, D.H. Wei, F. Weidner, S.P. Wen, C.W. Wenzel, U. Wiedner, G. Wilkinson, M. Wolke, L. Wollenberg, C. Wu, J.F. Wu, L.H. Wu, L.J. Wu, X. Wu, X.H. Wu, Y. Wu, Y.J. Wu, Z. Wu, L. Xia, X.M. Xian, T. Xiang, D. Xiao, G.Y. Xiao, H. Xiao, S.Y. Xiao, Y.L. Xiao, Z.J. Xiao, C. Xie, X.H. Xie, Y. Xie, Y.G. Xie, Y.H. Xie, Z.P. Xie, T.Y. Xing, C.F. Xu, C.J. Xu, G.F. Xu, H.Y. Xu, Q.J. Xu, X.P. Xu, Y.C. Xu, Z.P. Xu, F. Yan, L. Yan, W.B. Yan, W.C. Yan, X.Q. Yan, H.J. Yang, H.L. Yang, H.X. Yang, Tao Yang, Y. Yang, Y.F. Yang, Y.X. Yang, Yifan Yang, M. Ye, M.H. Ye, J.H. Yin, Z.Y. You, B.X. Yu, C.X. Yu, G. Yu, T. Yu, X.D. Yu, C.Z. Yuan, L. Yuan, S.C. Yuan, X.Q. Yuan, Y. Yuan, Z.Y. Yuan, C.X. Yue, A.A. Zafar, F.R. Zeng, X. Zeng, Y. Zeng, X.Y. Zhai, Y.H. Zhan, A.Q. Zhang, B.L. Zhang, B.X. Zhang, D.H. Zhang, G.Y. Zhang, H. Zhang, H.H. Zhang, H.Q. Zhang, H.Y. Zhang, J.J. Zhang, J.L. Zhang, J.Q. Zhang, J.W. Zhang, J.X. Zhang, J.Y. Zhang, J.Z. Zhang, Jiawei Zhang, L.M. Zhang, L.Q. Zhang, Lei Zhang, P. Zhang, Q.Y. Zhang, Shuihan Zhang, Shulei Zhang, X.D. Zhang, X.M. Zhang, X.Y. Zhang, Y. Zhang, Y.T. Zhang, Y.H. Zhang, Yan Zhang, Yao Zhang, Z.H. Zhang, Z.L. Zhang, Z.Y. Zhang, G. Zhao, J. Zhao, J.Y. Zhao, J.Z. Zhao, Lei Zhao, Ling Zhao, M.G. Zhao, S.J. Zhao, Y.B. Zhao, Y.X. Zhao, Z.G. Zhao, A. Zhemchugov, B. Zheng, J.P. Zheng, W.J. Zheng, Y.H. Zheng, B. Zhong, X. Zhong, H. Zhou, L.P. Zhou, X. Zhou, X.K. Zhou, X.R. Zhou, X.Y. Zhou, Y.Z. Zhou, J. Zhu, K. Zhu, K.J. Zhu, L. Zhu, L.X. Zhu, S.H. Zhu, S.Q. Zhu, T.J. Zhu, W.J. Zhu, Y.C. Zhu, Z.A. Zhu, J.H. Zou, and J. Zu

Subjects
BESIII, Axion-like particle, Pseudo-Goldstone boson, Physics, QC1-999
Abstract

We search for an axion-like particle (ALP) a through the process ψ(3686)→π+π−J/ψ, J/ψ→γa, a→γγ in a data sample of (2.71±0.01)×109 ψ(3686) events collected by the BESIII detector. No significant ALP signal is observed over the expected background, and the upper limits on the branching fraction of the decay J/ψ→γa and the ALP-photon coupling constant gaγγ are set at 95% confidence level in the mass range of 0.165≤ma≤2.84GeV/c2. The limits on B(J/ψ→γa) range from 8.3×10−8 to 1.8×10−6 over the search region, and the constraints on the ALP-photon coupling are the most stringent to date for 0.165≤ma≤1.468GeV/c2.

Published
2023
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6. Search for invisible decays of a dark photon using annihilation data at BESIII

Author

M. Ablikim, M.N. Achasov, P. Adlarson, M. Albrecht, R. Aliberti, A. Amoroso, M.R. An, Q. An, X.H. Bai, Y. Bai, O. Bakina, R. Baldini Ferroli, I. Balossino, Y. Ban, V. Batozskaya, D. Becker, K. Begzsuren, N. Berger, M. Bertani, D. Bettoni, F. Bianchi, J. Bloms, A. Bortone, I. Boyko, R.A. Briere, A. Brueggemann, H. Cai, X. Cai, A. Calcaterra, G.F. Cao, N. Cao, S.A. Cetin, J.F. Chang, W.L. Chang, G. Chelkov, C. Chen, Chao Chen, G. Chen, H.S. Chen, M.L. Chen, S.J. Chen, S.M. Chen, T. Chen, X.R. Chen, X.T. Chen, Y.B. Chen, Z.J. Chen, W.S. Cheng, S.K. Choi, X. Chu, G. Cibinetto, S.C. Coen, F. Cossio, J.J. Cui, H.L. Dai, J.P. Dai, A. Dbeyssi, R.E. de Boer, D. Dedovich, Z.Y. Deng, A. Denig, I. Denysenko, M. Destefanis, F. De Mori, Y. Ding, J. Dong, L.Y. Dong, M.Y. Dong, X. Dong, S.X. Du, P. Egorov, Y.L. Fan, J. Fang, S.S. Fang, W.X. Fang, Y. Fang, R. Farinelli, L. Fava, F. Feldbauer, G. Felici, C.Q. Feng, J.H. Feng, K. Fischer, M. Fritsch, C. Fritzsch, C.D. Fu, H. Gao, Y.N. Gao, Yang Gao, S. Garbolino, I. Garzia, P.T. Ge, Z.W. Ge, C. Geng, E.M. Gersabeck, A. Gilman, K. Goetzen, L. Gong, W.X. Gong, W. Gradl, M. Greco, L.M. Gu, M.H. Gu, Y.T. Gu, C.Y. Guan, A.Q. Guo, L.B. Guo, R.P. Guo, Y.P. Guo, A. Guskov, T.T. Han, W.Y. Han, X.Q. Hao, F.A. Harris, K.K. He, K.L. He, F.H. Heinsius, C.H. Heinz, Y.K. Heng, C. Herold, M. Himmelreich, T. Holtmann, G.Y. Hou, Y.R. Hou, Z.L. Hou, H.M. Hu, J.F. Hu, T. Hu, Y. Hu, G.S. Huang, K.X. Huang, L.Q. Huang, X.T. Huang, Y.P. Huang, T. Hussain, N. Hüsken, W. Imoehl, M. Irshad, J. Jackson, S. Jaeger, S. Janchiv, E. Jang, J.H. Jeong, Q. Ji, Q.P. Ji, X.B. Ji, X.L. Ji, Y.Y. Ji, Z.K. Jia, H.B. Jiang, S.S. Jiang, X.S. Jiang, Y. Jiang, J.B. Jiao, Z. Jiao, S. Jin, Y. Jin, M.Q. Jing, T. Johansson, N. Kalantar-Nayestanaki, X.S. Kang, R. Kappert, M. Kavatsyuk, B.C. Ke, I.K. Keshk, A. Khoukaz, R. Kiuchi, R. Kliemt, L. Koch, O.B. Kolcu, B. Kopf, M. Kuemmel, M. Kuessner, A. Kupsc, W. Kühn, J.J. Lane, J.S. Lange, P. Larin, A. Lavania, L. Lavezzi, T.T. Lei, Z.H. Lei, H. Leithoff, M. Lellmann, T. Lenz, C. Li, C.H. Li, Cheng Li, D.M. Li, F. Li, G. Li, H. Li, H.B. Li, H.J. Li, H.N. Li, J.Q. Li, J.S. Li, J.W. Li, Ke Li, L.J. Li, L.K. Li, Lei Li, M.H. Li, P.R. Li, S.X. Li, S.Y. Li, T. Li, W.D. Li, W.G. Li, X.H. Li, X.L. Li, Xiaoyu Li, Z.X. Li, Z.Y. Li, H. Liang, Y.F. Liang, Y.T. Liang, G.R. Liao, L.Z. Liao, J. Libby, A. Limphirat, D.X. Lin, T. Lin, B.J. Liu, C.X. Liu, D. Liu, F.H. Liu, Fang Liu, Feng Liu, G.M. Liu, H. Liu, H.B. Liu, H.M. Liu, Huanhuan Liu, Huihui Liu, J.B. Liu, J.L. Liu, J.Y. Liu, K. Liu, K.Y. Liu, Ke Liu, L. Liu, Lu Liu, M.H. Liu, P.L. Liu, Q. Liu, S.B. Liu, T. Liu, W.K. Liu, W.M. Liu, X. Liu, Y. Liu, Y.B. Liu, Z.A. Liu, Z.Q. Liu, X.C. Lou, F.X. Lu, H.J. Lu, J.G. Lu, X.L. Lu, Y. Lu, Y.P. Lu, Z.H. Lu, C.L. Luo, M.X. Luo, T. Luo, X.L. Luo, X.R. Lyu, Y.F. Lyu, F.C. Ma, H.L. Ma, L.L. Ma, M.M. Ma, Q.M. Ma, R.Q. Ma, R.T. Ma, X.Y. Ma, Y. Ma, F.E. Maas, M. Maggiora, S. Maldaner, S. Malde, Q.A. Malik, A. Mangoni, Y.J. Mao, Z.P. Mao, S. Marcello, Z.X. Meng, J.G. Messchendorp, G. Mezzadri, H. Miao, T.J. Min, R.E. Mitchell, X.H. Mo, N.Yu. Muchnoi, Y. Nefedov, F. Nerling, I.B. Nikolaev, Z. Ning, S. Nisar, Y. Niu, S.L. Olsen, Q. Ouyang, S. Pacetti, X. Pan, Y. Pan, A. Pathak, Y.P. Pei, M. Pelizaeus, H.P. Peng, K. Peters, J.L. Ping, R.G. Ping, S. Plura, S. Pogodin, V. Prasad, F.Z. Qi, H. Qi, H.R. Qi, M. Qi, T.Y. Qi, S. Qian, W.B. Qian, Z. Qian, C.F. Qiao, J.J. Qin, L.Q. Qin, X.P. Qin, X.S. Qin, Z.H. Qin, J.F. Qiu, S.Q. Qu, K.H. Rashid, C.F. Redmer, K.J. Ren, A. Rivetti, V. Rodin, M. Rolo, G. Rong, Ch. Rosner, S.N. Ruan, A. Sarantsev, Y. Schelhaas, C. Schnier, K. Schoenning, M. Scodeggio, K.Y. Shan, W. Shan, X.Y. Shan, J.F. Shangguan, L.G. Shao, M. Shao, C.P. Shen, H.F. Shen, X.Y. Shen, B.A. Shi, H.C. Shi, J.Y. Shi, Q.Q. Shi, R.S. Shi, X. Shi, X.D. Shi, J.J. Song, W.M. Song, Y.X. Song, S. Sosio, S. Spataro, F. Stieler, K.X. Su, P.P. Su, Y.J. Su, G.X. Sun, H. Sun, H.K. Sun, J.F. Sun, L. Sun, S.S. Sun, T. Sun, W.Y. Sun, X. Sun, Y.J. Sun, Y.Z. Sun, Z.T. Sun, Y.H. Tan, Y.X. Tan, C.J. Tang, G.Y. Tang, J. Tang, L.Y. Tao, Q.T. Tao, M. Tat, J.X. Teng, V. Thoren, W.H. Tian, Y. Tian, I. Uman, B. Wang, B.L. Wang, C.W. Wang, D.Y. Wang, F. Wang, H.J. Wang, H.P. Wang, K. Wang, L.L. Wang, M. Wang, Meng Wang, S. Wang, T. Wang, T.J. Wang, W. Wang, W.H. Wang, W.P. Wang, X. Wang, X.F. Wang, X.L. Wang, Y. Wang, Y.D. Wang, Y.F. Wang, Y.H. Wang, Y.Q. Wang, Yaqian Wang, Z. Wang, Z.Y. Wang, Ziyi Wang, D.H. Wei, F. Weidner, S.P. Wen, C.W. Wenzel, D.J. White, U. Wiedner, G. Wilkinson, M. Wolke, L. Wollenberg, J.F. Wu, L.H. Wu, L.J. Wu, X. Wu, X.H. Wu, Y. Wu, Y.J. Wu, Z. Wu, L. Xia, T. Xiang, D. Xiao, G.Y. Xiao, H. Xiao, S.Y. Xiao, Y.L. Xiao, Z.J. Xiao, C. Xie, X.H. Xie, Y. Xie, Y.G. Xie, Y.H. Xie, Z.P. Xie, T.Y. Xing, C.F. Xu, C.J. Xu, G.F. Xu, H.Y. Xu, Q.J. Xu, X.P. Xu, Y.C. Xu, Z.P. Xu, F. Yan, L. Yan, W.B. Yan, W.C. Yan, H.J. Yang, H.L. Yang, H.X. Yang, L. Yang, S.L. Yang, Tao Yang, Y.F. Yang, Y.X. Yang, Yifan Yang, M. Ye, M.H. Ye, J.H. Yin, Z.Y. You, B.X. Yu, C.X. Yu, G. Yu, T. Yu, X.D. Yu, C.Z. Yuan, L. Yuan, S.C. Yuan, X.Q. Yuan, Y. Yuan, Z.Y. Yuan, C.X. Yue, A.A. Zafar, F.R. Zeng, X. Zeng, Y. Zeng, Y.H. Zhan, A.Q. Zhang, B.L. Zhang, B.X. Zhang, D.H. Zhang, G.Y. Zhang, H. Zhang, H.H. Zhang, H.Y. Zhang, J.J. Zhang, J.L. Zhang, J.Q. Zhang, J.W. Zhang, J.X. Zhang, J.Y. Zhang, J.Z. Zhang, Jianyu Zhang, Jiawei Zhang, L.M. Zhang, L.Q. Zhang, Lei Zhang, P. Zhang, Q.Y. Zhang, Shuihan Zhang, Shulei Zhang, X.D. Zhang, X.M. Zhang, X.Y. Zhang, Y. Zhang, Y.T. Zhang, Y.H. Zhang, Yan Zhang, Yao Zhang, Z.H. Zhang, Z.Y. Zhang, G. Zhao, J. Zhao, J.Y. Zhao, J.Z. Zhao, Lei Zhao, Ling Zhao, M.G. Zhao, Q. Zhao, S.J. Zhao, Y.B. Zhao, Y.X. Zhao, Z.G. Zhao, A. Zhemchugov, B. Zheng, J.P. Zheng, Y.H. Zheng, B. Zhong, C. Zhong, X. Zhong, H. Zhou, L.P. Zhou, X. Zhou, X.K. Zhou, X.R. Zhou, X.Y. Zhou, Y.Z. Zhou, J. Zhu, K. Zhu, K.J. Zhu, L.X. Zhu, S.H. Zhu, S.Q. Zhu, W.J. Zhu, Y.C. Zhu, Z.A. Zhu, B.S. Zou, J.H. Zou, and J. Zu

Subjects
Nuclear and High Energy Physics, High Energy Physics - Experiment (hep-ex), FOS: Physical sciences, High Energy Physics - Experiment
Abstract

We report a search for a dark photon using $14.9$~fb$^{-1}$ of $e^+e^-$ annihilation data taken at center-of-mass energies from 4.13 to 4.60~GeV with the BESIII detector operated at the BEPCII storage ring. The dark photon is assumed to be produced in the radiative annihilation process of $e^+e^-$ and to predominantly decay into light dark matter particles, which escape from the detector undetected. The mass range from 1.5 to 2.9~GeV is scanned for the dark photon candidate, and no significant signal is observed. The mass dependent upper limits at the 90$\%$ confidence level on the coupling strength parameter $\epsilon$ for a dark photon coupling with an ordinary photon vary between $1.6\times 10^{-3}$ and $5.7\times10^{-3}$., Comment: 8 pages, 3 figures

Published
2023

7. Autotoxicity of continuoulys cropped passion fruit (Passiflora edulis Sims) soil

Author

Q.X. Zhang, X.T. Chen, Y.C. Wang, Y.H. Wang, C.L. Zhu, L.W. Lin, H.B. H, and H.B. Wang

Subjects
Passiflora, Horticulture, food and beverages, Autotoxicity, Plant Science, Biology, Passion fruit, biology.organism_classification, complex mixtures, Agronomy and Crop Science, Allelopathy
Abstract

We determined the soil autotoxicity in the rhizosphere soil of passion fruit continued cropping up to 3 years, and analyzed the changes in the enzyme activity, microbial quantity and diversity in rhizosphere soil. The results showed that the autotoxicity of passion fruit rhizosphere soil increases with the increase in continuous cropping years. The microbial biomass carbon, microbial respiration, and the activity of enzymes (protease, urease and catalase) in passion fruit rhizosphere soil decreased with increases in passion fruit continuous cropping years. Contrarily, the activity of polyphenol oxidase was opposite, showing an upward trend. The results of BIOLOG eco-plate showed that the differences in soil carbon sources between different continuous cropping years were mainly amino acids, carboxylic acids, phenolic acids and amine carbon sources. The ratio of bacteria, bacteria/fungus ratio, actinomycetes, protozoa and total marker PLFA in the rhizosphere soil decreased significantly with the increase of soil planting years, while the total PLFA of fungi increased. Thus, with the increase of continuous cropping years of passion fruit, the soil autotoxicity was intensified and the soil enzyme activity and soil microbial diversity decreased.

Published
2021
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8. Laser quenching of plasma nitrided 30CrMnSiA steel

Author

M.F. Yan, Chen Liang, Y. You, L.X. Guo, Bin Bai, Changjiang Zhang, Yifeng Wang, X.T. Chen, R.W. Li, and Zhong Long

Subjects
Austenite, Materials science, Phase (matter), Metallurgy, Microstructure, Indentation hardness, Layer (electronics), Nitriding, Tribometer, Eutectic system
Abstract

30CrMnSiA steel has been commonly used in many industrial applications owing to its excellent mechanical properties. However, raw 30CrMnSiA steel cannot meet the requirements of practical application, such as high surface hardness and superior wear resistance. In practice, plasma nitriding (PN) is usually conducted to strengthen the surface properties of this steel. However conventional plasma nitriding (PN) technique is always hindered by diffusion kinetics. Alternatively, the process of laser quenching (LQ) has been utilized as a unique rapid method for tailoring the surface microstructure and chemical composition to improving the mechanical properties of steels. In the present study, a laser quenching technique (LQ) is utilized as subsequent procedure of typical plasma nitriding treatment process (PN) to improve the surface properties of 30CrMnSiA steel. The microstructure and properties of such layer are compared with those obtained by PN or LQ treatment. OM, XRD, SEM and EDS analysis are conducted for microstructure observation, phase identification, and estimating the nitrogen concentration, respectively. Microhardness tester and pin-on-disc tribometer are used to investigate the mechanical properties of the modified layers. Laser quenching of plasma nitrided (PN + LQ) 30CrMnSiA steel results in great increase in the thickness and hardness of the modified layer comparing with the PN and LQ treatment due to the reduction of eutectoid point caused by introduction of nitrogen. The mechanism is also discussed systematically based on the phase diagram in the paper. Moreover, the layer treated by PN + LQ process exhibits better wear resistance than the PN treated specimen. This is attributed to the formation of retained austenite and Fe 3 O 4 according to the XRD analysis, which is beneficial to the improvement of impact toughness and the lubrication action during sliding.

Published
2014
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10. Ab Initio Simulations of Low-K and Ultra Low-K Dielectric Interconnects

Author

X.T. Chen, Ping Wu, L. Dai, Shuo-Wang Yang, and Vincent B. C. Tan

Subjects
chemistry.chemical_classification, Materials science, Diffusion barrier, Ab initio, Low-k dielectric, Polymer, Dielectric, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Metal, chemistry, Chemical physics, Computational chemistry, visual_art, Atom, visual_art.visual_art_medium, General Materials Science, Deposition (law)
Abstract

Ab initio molecular dynamics simulations were carried out to study low-k/ultra low-k dielectric systems comprising Cu/Ta/SiLK-like polymer. A study of the motion of single metal atoms of Cu and Ta in the SiLK-like polymer showed that Cu atom motions are effected by jumps between cavities inside the polymer and that Ta is more sluggish than Cu not only because of its larger mass but also because of stronger affinity to the polymer. It was also found that crosslinking of the polymer did not affect the motion of the metal atoms. Simulations of deposition showed that a thin Ta diffusion barrier does not have good structural integrity to prevent Cu-diffusion when directly deposited onto the SiLK; the barrier performance was greatly improved after introducing a Si-based film between the Ta and SiLK.

Published
2007
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12. Effect of plasma process on low-k material and barrier layer performance

Author

Dongzhi Chi, L.Y. Wong, D. Gui, Y.H. Wang, D. Lu, L.J. Tang, W.D. Wang, W.H. Li, X.T. Chen, Z.Q. Mo, and Anyan Du

Subjects
Fabrication, business.industry, Annealing (metallurgy), Chemistry, Metals and Alloys, Analytical chemistry, Copper interconnect, Low-k dielectric, Surfaces and Interfaces, Plasma, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Barrier layer, Transition metal, Materials Chemistry, Optoelectronics, business, Porous medium
Abstract

Low-k material is susceptible to the plasma damage in fabrication of damascene structure and hence the metal barrier performance will be affected. It is very important to characterize the effect of plasma process on metal barrier performance and fundamentally understand interfacial interaction between low-k material and metal barrier layer for implementing low-k, especially ultra low-k in Cu interconnect on 65 nm node and beyond. In this paper, we present our studies on the effects of two key plasma processes, H2/He reactive plasma clean treatment (RPC) and H2/N2 etch, on the barrier layer performance. We also present a solution to enhance the Ta barrier layer performance. The new implementation successfully prevented Cu from diffusing into polymer low-k after annealing at 200 °C for 1000 h. The methodology is proven to be effective for characterizing and improving pore-sealing and barrier performance for Cu/porous ultra low-k interconnect.

Published
2006
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13. Peeling and delamination in Cu/SiLK™ process during Cu-CMP

Author

T. Selvaraj, Subramanian Balakumar, X.T. Chen, B.F. Lin, Y.W. Chen, Masayo Fujimoto, Yasuhiro Shimura, Rajesh Kumar, and Tohru Hara

Subjects
Materials science, Delamination, Metals and Alloys, Copper interconnect, Surfaces and Interfaces, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Stress (mechanics), Stack (abstract data type), Chemical-mechanical planarization, Materials Chemistry, Metallizing, Composite material, Porosity, Layer (electronics)
Abstract

One of the major challenges with integration of Cu/low-k or ultralow-k materials is to eliminate delamination during chemical mechanical planarization (CMP) process due to their porous nature and weak mechanical properties. Three different kinds of peeling at various metal levels—single layer peeling, multi-stack delamination and pattern design related—were generally observed in the CMP process of Cu/SiLK™. The single stack peeling is due to poor mechanical integrity of low-k materials with barriers. Based on the results of this study, multi-stack and pattern design related peelings were attributed to the degradation of adhesion caused by accumulation of stress. Critical pressure for CMP using Al2O3 and MnO2 slurries was also determined for single and dual stacks. Robust CMP process for Cu/SiLK™ integration developed with new process concept will be discussed and seven layers of Cu/SiLK™ metallization processed with dual damascene was successfully demonstrated.

Published
2004
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14. A general model for transition to dispersed bubble flow

Author

James P. Brill, X.D. Cai, and X.T. Chen

Subjects
Range (particle radiation), Materials science, Turbulence, Applied Mathematics, General Chemical Engineering, Multiphase flow, General Chemistry, Mechanics, Kinetic energy, Slug flow, Industrial and Manufacturing Engineering, Surface energy, Physics::Fluid Dynamics, Two-phase flow, Bubble point, Simulation
Abstract

A general model for the transition to gas-liquid dispersed bubble flow is proposed in this paper, based on an assumption that dispersed bubble flow cannot exist unless the turbulent kenetic energy of the liquid phase is greater than the surface free energy of dispersed spherical bubbles. This model is capable of predicting the transition boundary to dispersed bubble flow in various closed channels over the whole range of inclination angles. It also yields a good prediction for the slug liquid holdup in gas-liquid slug flow in conjunction with the Barnea-Brauner hypothesis (1985, Int. J. Multiphase Flow 11 , 43–49).

Published
1997
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15. Slug to churn transition in upward vertical two-phase flow

Author

James P. Brill and X.T. Chen

Subjects
Engineering, biology, business.industry, Slug, Applied Mathematics, General Chemical Engineering, Flow (psychology), Thermodynamics, General Chemistry, Mechanics, Flow pattern, Wake, Slug flow, biology.organism_classification, Industrial and Manufacturing Engineering, Physics::Fluid Dynamics, Gas liquid flow, Bubble flow, Two-phase flow, business
Abstract

Based on an analysis of the physical mechanism, a new model is developed for the transitions for slug flow to churn flow in vertical pipes. The transition is attributed to the wake effect of Taylor bubbles on highly aerated liquid slugs. The new model is compared with existing models and published experimental data. It is in better agreement with experimental data than existing models.

Published
1997
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16. Study of Ta-barrier and pore sealing dielectric layer interaction for enhanced barrier performance of Cu/ultralow /spl kappa/(/spl kappa/<2.2) interconnects

Author

X.T. Chen, N. Balasubramanian, Dongzhi Chi, Dim-Lee Kwong, R. Kumar, N. Hwang, G. Q. Lo, D. Gui, W.D. Wang, and N. Babu

Subjects
Surface diffusion, Materials science, Diffusion barrier, Tantalum, chemistry.chemical_element, Dielectric, Electronic, Optical and Magnetic Materials, Barrier layer, chemistry, Electronic engineering, Electrical and Electronic Engineering, Composite material, Porosity, Porous medium, Layer (electronics)
Abstract

For Cu/ultralow /spl kappa/ application, understanding of interfacial interaction between Ta and pore-sealing layer over porous dielectric is very important in order to achieve a good barrier performance. However, characterizing the effect of pore-sealing layer on barrier performance poses a big challenge. Most studies monitored degradation of the electrical performance of the Ta barrier after integration process with little discussions on interfacial interaction. In this letter, the interaction at the interface between Ta and pore-sealing layer deposited over porous SiLK (/spl kappa//spl sim/2.2) film is investigated. The barrier performance is improved significantly by nitrogen incorporation during liner growth. This methodology is very effective for improving metal barrier and pore-sealing performance for Cu/ultralow /spl kappa/ interconnects.

Published
2005
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17. An Experimental Study on Downward Slug Flow in Inclined Pipes

Author

P.M. Roumazeilles, X.T. Chen, James P. Brill, J.F. Wilson, Cem Sarica, and J. Yang

Subjects
Pressure drop, Fuel Technology, Flow (psychology), Fluid dynamics, Plastic pipework, Fluid mechanics, Geotechnical engineering, Two-phase flow, Slug flow, Geology, Open-channel flow
Abstract

Summary The downward simultaneous flow of gas and liquid is often encountered in hilly terrain pipelines and injection wells. Most of the methods for predicting pressure drop in gas/liquid, two-phase flow in pipes have been developed for either upward vertical or upward inclined pipes. This study experimentally investigates downward co-current slug flow in inclined pipes. A new test facility was designed and built to acquire data for the entire range of pipe inclination angles. A series of slug flow experiments was conducted in a 2-in. diameter, 65-ft long clear PVC pipe installed on an inclinable structure. Liquid holdup and pressure drop measurements were obtained for downward inclination angles from 0° to −30° at different flow conditions. Translational velocity and liquid-slug holdup correlations were investigated based on the acquired data for different inclination angles.

Published
1996
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18. Ultrasensitive electrical detection of nucleic acids by hematin catalysed silver nanoparticle formation in sub-microgapped biosensors

Author

Dim-Lee Kwong, X.T. Chen, N. Balasubramanian, J.M. Kong, and Han Zhang

Subjects
Biomedical Engineering, Biophysics, Nanoparticle, Nanotechnology, Biosensing Techniques, Sensitivity and Specificity, Silver nanoparticle, Catalysis, chemistry.chemical_compound, Nucleic Acids, Electrochemistry, Molecule, Particle Size, Peptide nucleic acid, Chemistry, Reproducibility of Results, General Medicine, Equipment Design, Combinatorial chemistry, Equipment Failure Analysis, Microelectrode, Nucleic acid, Hemin, Nanoparticles, Biosensor, Microelectrodes, DNA, Biotechnology
Abstract

An ultrasensitive electrical detection method of nucleic acids has been demonstrated on sub-microgapped biosensor. In this method, peptide nucleic acid (PNA) probes were firstly immobilized in the gap areas of a pair of interdigited microelectrodes and then were hybridized with their complementary target DNA. After hybridization, hematin molecules were introduced into the DNA strand via zirconium-phosphate and zirconium-carbonate chemistries. The newly attached hematin molecules act as a catalyst to accelerate reducing ammoniacal silver ion to form silver nanoparticles, which span the gap of the interdigitated microelectrode. The conductance of the silver nanoparticles directly correlated with the number of the hybridized DNA molecules. Nearly 1 fM sensitivity was achieved under optimal conditions. This approach is also applicable to the detection of RNA.

Published
2008

20. Electrical Detection of Nucleic Acids using Target-Guided Formation of Conducting Polymer Nanowires in Nanogaps

Author

Yi Fan, J.M. Kong, X.T. Chen, Chih-Hang Tung, and Zhiqiang Gao

Subjects
chemistry.chemical_classification, Conductive polymer, Materials science, Peptide nucleic acid, Nanowire, Nanotechnology, Polymer, Combinatorial chemistry, Microelectrode, chemistry.chemical_compound, chemistry, Polyaniline, Nucleic acid, Biosensor
Abstract

A nanogapped microelectrode-based biosensor array is fabricated for ultrasensitive electrical detection of nucleic acids. After immobilizing peptide nucleic acid (PNA) capture probes in nanogaps of a pair of interdigitated microelectrodes and performing hybridization with their complementary target nucleic acids, the deposition of conducting polymer, polyaniline (PAn) nanowires, is carried out by an enzymatically catalyzed method, where the electrostatic interaction between anionic phosphate groups in nucleic acids and cationic aniline molecules is exploited to guide the formation of the PAn nanowires onto the hybridized target nucleic acids. The conductivity of the deposited PAn nanowires directly correlates to the amount of the hybridized nucleic acids. Under optimized conditions, the target nucleic acid can be quantified in a range of 10 fM-20 pM with a detection limit of 5.0 fM.

Published
2007
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21. Adhesion Enhancement for Multiple Level Cu/SiLKTM Integration

Author

P. D. Foo, X.T. Chen, D. Lu, Y. T. Tan, and Y. W. Chen

Subjects
Argon, Materials science, Hydrogen, chemistry.chemical_element, Nanotechnology, Plasma, Metal, Barrier layer, SILK, chemistry, Chemical engineering, Sputtering, visual_art, visual_art.visual_art_medium, Surface layer
Abstract

The effects of various integration processes on the adhesion of SiLKTM to the Ta barrier layer were studied. We have found that the H2/He reactive plasma clean treatment (RPC) causes poor adhesion between these two layers. The results obtained from TOF-SIMS showed that hydrogen plasma had caused damage to the SiLK surface causing molecular fragmentation. Hydrogen had also been chemically incorporated into SiLK to form a hydrogen-saturated surface. To improve adhesion, an argon sputtering process was employed to remove this altered SiLK surface layer. Adhesion was found to have been improved and no delamination was observed even up to integration of 7 metal layers.

Published
2003
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23. A Study of Slug Characteristics for Two-Phase Horizontal Flow

Author

James P. Brill, R. Marcano, X.T. Chen, and Cem Sarica

Subjects
biology, Slug, Multiphase flow, Flow (psychology), Log-normal distribution, Air compressor, Environmental science, Geotechnical engineering, Mechanics, Slug flow, Centrifugal pump, biology.organism_classification, Volumetric flow rate
Abstract

Understanding the behavior of multiphase flow in pipelines is an important factor in the safe and economical design and operation of multiphase systems. Slug flow is a common and very complex occurrence in these pipelines. Sixty-two slug-flow tests were conducted over varying combinations of gas and liquid flow rates. A total of 25,975 slugs were generated, ranging from 23 to 1145 slugs per test. The flow loop consisted of a 3.068-in diameter, 1378-ft long horizontal flowline, a two-stage air compressor, a centrifugal pump, and a data acquisition system utilizing LabVIEW™ with a Macintosh II ci computer. The primary data collected during the experimental tests consisted of continuous readings of pressures, temperatures, flow rates, and liquid holdup. Processing of this data yielded slug translational velocities, slug lengths, pressure drops, slug length distribution, and slug frequency. Analysis of the results showed that the slug length distribution followed a Lognormal pattern. New correlations were developed for slug liquid holdup, film liquid holdup, slug translational velocity, slug frequency, average slug length and design slug length. Using the data from this study, the new correlation for slug liquid holdup was compared with predictions from the correlations of Gregory et al.1 and Yang2. Similarly, the new correlation for slug frequency was compared with the correlation of Hill and Wood.

Published
1998
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24. Techniques for Measuring Wax Thickness During Single and Multiphase Flow

Author

M. Volk, James P. Brill, X.T. Chen, and T. Butler

Subjects
Wax, Materials science, visual_art, Multiphase flow, visual_art.visual_art_medium, Composite material
Abstract

Accurate measurement of wax thickness deposited on a cold pipe wall is of vital importance to the development of predictive models for paraffin deposition in flowlines and wellbores. Existing wax thickness measurement techniques, including pigging, spool piece, pressure drop, and heat transfer methods, are critically reviewed. An on-line wax thickness measurement technique, named the liquid displacement-level detection method (LD-LD), is presented. This new method is capable of giving both longitudinal and circumferential wax thickness distributions as well as the total wax deposit volume for single-phase and multiphase flow in pipes.

Published
1997
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25. Time-constant-based CMOS readout circuit for DNA detection

Author

Y. Fan, T.H. Teo, W.G. Yeoh, K.-L. Oung, X.T. Chen, and Zhiqiang Gao

Subjects
Conductive polymer, Materials science, business.industry, Capacitive sensing, Time constant, Capacitance, Nanoelectronics, CMOS, Sensor array, Electronic engineering, Optoelectronics, Electrical and Electronic Engineering, business, Biosensor
Abstract

An RC-to-time constant interface circuit was implemented in 0.18 µm CMOS to characterise the conductive polymer labelled deoxyribonucleic acid (DNA) hybridisation activity on nano-sensor micro-arrays. Measured results show that sub-picomolar DNA (0.1–10 pM) are able to be differentiated with respect to their electrical parameters of 1–23 GΩ resistances parallel with 2.8 down to 0.1 nF capacitances.

Published
2008
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26. Cu–Ni–Sn–Si alloys designed by cluster-plus-glue-atom model

Author

Q.X. Yu, X.N. Li, K.R. Wei, Z.M. Li, Y.H. Zheng, N.J. Li, X.T. Cheng, C.Y. Wang, Q. Wang, and C. Dong

Subjects
Materials of engineering and construction. Mechanics of materials, TA401-492
Abstract

Segregation in the solidification process and discontinuous precipitation during aging cause the service and processing performance of Cu–Ni–Sn alloys deteriorating severely. In this work, Si is added as a fourth element for the design of Cu80Ni15Sn5−xSix (x = 0, 0.625, 1.25, 1.875, 2.5) series alloys using cluster-plus-glue-atom model to solve these issues from the point of composition design. The results suggest that the introduction of Si leads to the disappearance of the lamellar structure formed in the as-cast alloys while also inhibiting discontinuous precipitation during aging. The solidus–liquidus temperature range is reduced with the addition of Si, and this strategy is most effective when the Si is in the solution state. With increasing Si content, the high-temperature conductive stability of the alloys is improved. Moreover, the hardness and conductivity of the Cu80Ni15Sn5 alloy designed by cluster-plus-glue-atom model are improved compared with those of C72900 (Cu78.96Ni16.65Sn4.39) commercial alloy, and the properties of Cu80Ni15Sn4.375Si0.625 alloy are basically equivalent to those of C72900 alloy. These findings indicate that alloys with excellent synthetic properties can be produced as long as the content and existential state of Si are reasonably controlled. Keywords: Cu–Ni–Sn, Segregation, Discontinuous precipitation, Solidus-liquidus temperature range, High-temperature stability, Cluster model

Published
2019
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