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Transadmittance Efficiency Under NQS Operation in Asymmetric Double Gate FDSOI MOSFET.

Authors :
El Ghouli, Salim
Sallese, Jean-Michel
Juge, Andre
Scheer, Patrick
Lallement, Christophe
Source :
IEEE Transactions on Electron Devices. Jan2019, Vol. 66 Issue 1, p300-307. 8p.
Publication Year :
2019

Abstract

The state-of-the-art RF and millimeter-wave circuits design requires accurate prediction of the nonquasi-static (NQS) effects at high frequency for all levels of channel inversion. This paper provides a practical insight to help high-frequency performance assessment of ultrathin body and box fully depleted silicon-on-insulator MOSFETs through a powerful frequency normalization scheme. Frequency dependence of small signal characteristics derived from experimental S-parameters is analyzed and reveals that the transconductance efficiency (${g}_{\textsf {m}}/{I}_{\textsf {D}}$) concept, already adopted as a low-frequency analog figure-of-merit (FoM), can be generalized to high frequency, including under asymmetric operation. We report that the normalized frequency dependence of the generalized transadmittance efficiency (${y}_{\textsf {m}}/{I}_{\textsf {D}}$) FoM only depends on the mobility and inversion coefficient. In addition, this approach is also used to extract essential parameters such as the critical NQS frequency ${f}_{\textsf {NQS}}$. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00189383
Volume :
66
Issue :
1
Database :
Academic Search Index
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
137215197
Full Text :
https://doi.org/10.1109/TED.2018.2882539