X-ray study of strain and composition of Si/Ge0.85Si0.15 (111) islands grown in Volmer-Weber mode.

Si islands were grown on Ge (111) in Volmer-Weber growth mode with a 40-nm thick Ge0.85Si0.15 buffer. The state of strain and chemical composition of these islands were evaluate by grazing incidence anomalous x-ray diffraction. The results show evidence of lattice coherence and Ge-Si intermixing. A direct relationship between increase in substrate temperature and enhancement of alloying was found, evidencing the importance of atomic interdiffusion in this growth mode. [ABSTRACT FROM AUTHOR]