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Droplet-free high-density metal ion source for plasma immersion ion implantation
- Source :
-
Nuclear Instruments & Methods in Physics Research Section B . Jan2006, Vol. 242 Issue 1/2, p315-317. 3p. - Publication Year :
- 2006
-
Abstract
- Abstract: This paper reports on plasma parameters and ion composition of droplet-free Zr ion source for plasma immersion ion implantation and deposition (PIII&D). Zirconium (Zr) ions were obtained by ionizing sputtered Zr atoms in inductively-coupled argon discharge. The characteristics of plasma density, plasma potential and electron temperature were typical ones of such a inductive discharge, and the plasma parameters were not significantly influenced by mixing the sputtered Zr atoms into the plasma. Actually, the main ionic component was still Ar+ ions, and the ion density ratio of [Zr+]/[Ar+] was as low as ∼8%. Increase in sputtering rate of the Zr source will be necessary to improve the ion density ratio. [Copyright &y& Elsevier]
Details
- Language :
- English
- ISSN :
- 0168583X
- Volume :
- 242
- Issue :
- 1/2
- Database :
- Academic Search Index
- Journal :
- Nuclear Instruments & Methods in Physics Research Section B
- Publication Type :
- Academic Journal
- Accession number :
- 19182426
- Full Text :
- https://doi.org/10.1016/j.nimb.2005.08.050