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Mechanism of chemical erosion of sputter-deposited C:H films.
- Source :
-
Applied Physics Letters . 11/16/1992, Vol. 61 Issue 20, p2414. 3p. 3 Graphs. - Publication Year :
- 1992
-
Abstract
- Investigates the mechanism of thermally activated chemical erosion of sputter-deposited carbon:hydrogen (C:H) films. Desorption of methane as gaseous products; Determination of C-CH bond breaking as rate limiting step of hydrocarbon production; Occurrence of CH[sub 3] radical desorption from the surface of the C:H films.
- Subjects :
- *CHEMICAL denudation
*THIN films
*SPUTTERING (Physics)
Subjects
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 61
- Issue :
- 20
- Database :
- Academic Search Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 4240794
- Full Text :
- https://doi.org/10.1063/1.108182