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Effect of annealing on electrical and structural properties of LaNiO3− δ thin films
- Source :
-
Radiation Physics & Chemistry . Oct2009 Supplement, Vol. 78 Issue 10, pS29-S33. 0p. - Publication Year :
- 2009
-
Abstract
- Abstract: Thin LaNiO3− δ films with pseudocubic (100) preferred orientation were prepared by reactive DC magnetron sputtering and in situ annealed in O2 and vacuum. X-ray photoelectron spectroscopy (XPS) was used to determine the variation in composition of the films under high-temperature annealing. The experimental O 1s spectrum of LaNiO3− δ films was analyzed in terms of “O2−”, “O−”/“(OH)−”, and weakly adsorbed oxygen species. It was shown that the change in the type of conductivity from the metallic to the semiconducting one is accompanied by a marked increase in the intensity of the lateral (∼531eV) peak of oxygen. These variations in conductivity and surface composition were attributed to the loss of lattice oxygen with subsequent adsorption from ambient air “O−” and “(OH)−” anions and weakly adsorbed oxygen species. [Copyright &y& Elsevier]
Details
- Language :
- English
- ISSN :
- 0969806X
- Volume :
- 78
- Issue :
- 10
- Database :
- Academic Search Index
- Journal :
- Radiation Physics & Chemistry
- Publication Type :
- Academic Journal
- Accession number :
- 44033664
- Full Text :
- https://doi.org/10.1016/j.radphyschem.2009.05.016