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Effect of annealing on electrical and structural properties of LaNiO3− δ thin films

Authors :
Mickevičius, S.
Grebinskij, S.
Bondarenka, V.
Tvardauskas, H.
Senulis, M.
Lisauskas, V.
Šliužienė, K.
Vengalis, B.
Orlowski, B.A.
Source :
Radiation Physics & Chemistry. Oct2009 Supplement, Vol. 78 Issue 10, pS29-S33. 0p.
Publication Year :
2009

Abstract

Abstract: Thin LaNiO3− δ films with pseudocubic (100) preferred orientation were prepared by reactive DC magnetron sputtering and in situ annealed in O2 and vacuum. X-ray photoelectron spectroscopy (XPS) was used to determine the variation in composition of the films under high-temperature annealing. The experimental O 1s spectrum of LaNiO3− δ films was analyzed in terms of “O2−”, “O−”/“(OH)−”, and weakly adsorbed oxygen species. It was shown that the change in the type of conductivity from the metallic to the semiconducting one is accompanied by a marked increase in the intensity of the lateral (∼531eV) peak of oxygen. These variations in conductivity and surface composition were attributed to the loss of lattice oxygen with subsequent adsorption from ambient air “O−” and “(OH)−” anions and weakly adsorbed oxygen species. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
0969806X
Volume :
78
Issue :
10
Database :
Academic Search Index
Journal :
Radiation Physics & Chemistry
Publication Type :
Academic Journal
Accession number :
44033664
Full Text :
https://doi.org/10.1016/j.radphyschem.2009.05.016