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Investigation of self-assembled monolayer treatment on SiO2 gate insulator of poly(3-hexylthiophene) thin-film transistors

Authors :
Horii, Yoshinori
Ikawa, Mitsuhiro
Sakaguchi, Koichi
Chikamatsu, Masayuki
Yoshida, Yuji
Azumi, Reiko
Mogi, Hiroshi
Kitagawa, Masahiko
Konishi, Hisatoshi
Yase, Kiyoshi
Source :
Thin Solid Films. Nov2009, Vol. 518 Issue 2, p642-646. 5p.
Publication Year :
2009

Abstract

Abstract: We have investigated self-assembled monolayer (SAM) treatment on SiO2 gate insulator of poly(3-hexylthiophene) (P3HT) thin-film transistor (TFT), and demonstrated a correlation between mobility and surface free energy of the insulator. The device with lower surface free energy shows higher mobility. The docosyltrichlorosilane (DCTS)-treated device exhibits the best performance among the various SAM-treated devices examined. Field-effect mobility, on/off ratio and threshold voltage of the DCTS-treated P3HT TFT were 0.015cm2/Vs, >105 and −14V, respectively. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00406090
Volume :
518
Issue :
2
Database :
Academic Search Index
Journal :
Thin Solid Films
Publication Type :
Academic Journal
Accession number :
44696613
Full Text :
https://doi.org/10.1016/j.tsf.2009.07.060