Control of powder formation in silane discharge by cathode heating and hydrogen dilution for high-rate deposition of hydrogenated amorphous silicon thin films.

Authors :: Banerjee, Ratnabali
Sharma, S. N.
Chattopadhyay, S.
Batabyal, A. K.
Barua, A. K.
Source :: Journal of Applied Physics. 10/1/1993, Vol. 74 Issue 7, p4540. 6p. 1 Diagram, 1 Chart, 7 Graphs.
Publication Year :: 1993
Abstract: Reports on the control of powder formation in silane discharge by cathode heating and hydrogen dilution for high-rate deposition of hydrogenated amorphous silicon thin films. Characterization of the films; Illustration of plasma chemical vapor deposition reactor; Variation of deposition rate with cathode temperature.

Subjects :: *SILANE
*CATHODES
*SILICON
*THIN films
*CHEMICAL vapor deposition

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