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Analysis of ordering in GaInP by means of x-ray diffraction.
- Source :
-
Journal of Applied Physics . 3/15/1993, Vol. 73 Issue 6, p2770. 5p. 2 Diagrams, 1 Chart, 2 Graphs. - Publication Year :
- 1993
-
Abstract
- Presents a detailed characterization of the ordered structure in silicon-doped Ga[sub0.51]In[sub0.49]P. Influence of silicon doping on the ordering in GaInP layers; Analysis of undoped layers grown at various substrate temperatures; Relationships between photoluminescence peak energy and electron concentration of silicon-doped samples at room temperature.
- Subjects :
- *SILICON
*SEMICONDUCTOR doping
*PHOTOLUMINESCENCE
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 73
- Issue :
- 6
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7634139
- Full Text :
- https://doi.org/10.1063/1.353052