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Analysis of ordering in GaInP by means of x-ray diffraction.

Authors :
Liu, Q.
Lakner, H.
Scheffer, F.
Lindner, A.
Prost, W.
Source :
Journal of Applied Physics. 3/15/1993, Vol. 73 Issue 6, p2770. 5p. 2 Diagrams, 1 Chart, 2 Graphs.
Publication Year :
1993

Abstract

Presents a detailed characterization of the ordered structure in silicon-doped Ga[sub0.51]In[sub0.49]P. Influence of silicon doping on the ordering in GaInP layers; Analysis of undoped layers grown at various substrate temperatures; Relationships between photoluminescence peak energy and electron concentration of silicon-doped samples at room temperature.

Details

Language :
English
ISSN :
00218979
Volume :
73
Issue :
6
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7634139
Full Text :
https://doi.org/10.1063/1.353052