Short-range order, microstructure and their correlation with light-induced degradation in hydrogenated amorphous silicon deposited at high growth rates by cathode heating technique.

Examines the short-range order and microstructure of a set of films deposited in different plasma conditions using Raman scattering, small-angle x-ray scattering and infrared vibrational spectroscopy. Information on the plasma enhanced chemical vapor deposition technique; Method used for the powder formation in the plasma; Factors considered in the deposition rates attained and sites of powder growth in the chamber for α-Si:H films.