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Effect of surface roughness on magnetization reversal of Co films on plasma-etched Si(100)...
- Source :
-
Journal of Applied Physics . 6/1/1998 Part 2 of 2, Vol. 83 Issue 11, p6287. 3p. 4 Diagrams, 1 Chart, 2 Graphs. - Publication Year :
- 1998
-
Abstract
- Studies the effect of surface roughness on the magnetization reversal of cobalt (Co) films on plasma-etched silicone (Si(100) substrates using thermal evaporation in high vacuum. Measurement of the surface morphologies and magnetic properties of Co films; Suggestion that the magnetization reversal process changed with the surface roughness.
- Subjects :
- *PHYSICS experiments
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 83
- Issue :
- 11
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 845397
- Full Text :
- https://doi.org/10.1063/1.367718