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SiC-GTO Thyristor Gate and Drift-Region Dopant Polarity Analysis Using Electrothermal Simulation.

Authors :
Shah, Pankaj B.
Source :
IEEE Transactions on Electron Devices. Nov2002, Vol. 49 Issue 11, p2064. 6p. 1 Black and White Photograph, 1 Diagram, 11 Graphs.
Publication Year :
2002

Abstract

Reports on two-dimensional electrothermal simulations to improve the reliability of high-power silicon carbide-gate turnoff thyristors. Occurrence of less device heating in a given number of cycles as indicated by transient mixed mode results; Observation of the hot spot to move from beneath the gate at the start of the turnoff to the corner formed by mesa isolation.

Subjects

Subjects :
*THYRISTORS
*SILICON carbide

Details

Language :
English
ISSN :
00189383
Volume :
49
Issue :
11
Database :
Academic Search Index
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
8915254
Full Text :
https://doi.org/10.1109/TED.2002.804691