Back to Search
Start Over
SiC-GTO Thyristor Gate and Drift-Region Dopant Polarity Analysis Using Electrothermal Simulation.
- Source :
-
IEEE Transactions on Electron Devices . Nov2002, Vol. 49 Issue 11, p2064. 6p. 1 Black and White Photograph, 1 Diagram, 11 Graphs. - Publication Year :
- 2002
-
Abstract
- Reports on two-dimensional electrothermal simulations to improve the reliability of high-power silicon carbide-gate turnoff thyristors. Occurrence of less device heating in a given number of cycles as indicated by transient mixed mode results; Observation of the hot spot to move from beneath the gate at the start of the turnoff to the corner formed by mesa isolation.
- Subjects :
- *THYRISTORS
*SILICON carbide
Subjects
Details
- Language :
- English
- ISSN :
- 00189383
- Volume :
- 49
- Issue :
- 11
- Database :
- Academic Search Index
- Journal :
- IEEE Transactions on Electron Devices
- Publication Type :
- Academic Journal
- Accession number :
- 8915254
- Full Text :
- https://doi.org/10.1109/TED.2002.804691