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Study on chemical bonding states at electrode–silicon interface fabricated with fire-through control paste.

Authors :
Takuya Hiyama
Takuto Kojima
Kosuke Kinoshita
Tappei Nishihara
Kohei Onishi
Kazuo Muramatsu
Aki Tanaka
Yoshio Ohshita
Atsushi Ogura
Source :
Japanese Journal of Applied Physics; Aug2018 Supplement, Vol. 57 Issue 8S3, p1-1, 1p
Publication Year :
2018

Abstract

We investigated the interface phenomena between the electrode by a low fire-through electrode paste and the silicon substrate in a crystalline silicon solar cell. Oblique polishing was used to evaluate the chemical bonding states in the depth direction. From the evaluation by X-ray photoelectron spectroscopy (XPS) and the hard X-ray photoelectron spectroscopy (HAXPES), we found changes in the chemical bonding states of Ag 3d, Si 2p, O 1s, and N 1s at the electrode–silicon interface. In addition, it was possible to confirm the reduction of Ag induced by the heat treatment at the interface. Thus, it became possible to evaluate the chemical bonding states at the interface between the electrode and the silicon substrate by adapting oblique polishing and XPS measurement. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00214922
Volume :
57
Issue :
8S3
Database :
Complementary Index
Journal :
Japanese Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
134570000
Full Text :
https://doi.org/10.7567/JJAP.57.08RB23