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Mask absorber for next generation EUV lithography.
- Source :
- Proceedings of SPIE; 8/2/2020, Vol. 11517, p1151706-1151706, 1p
- Publication Year :
- 2020
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 11517
- Database :
- Complementary Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Conference
- Accession number :
- 146703661
- Full Text :
- https://doi.org/10.1117/12.2572114