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Erratum: "Modeling the temporal evolution and stability of thin evaporating films for wafer surface processing" [J. Chem. Phys. 157, 084706 (2022)].

Authors :
Huber, Max
Hu, Xiao
Zienert, Andreas
Schuster, Jörg
Schulz, Stefan E.
Source :
Journal of Chemical Physics; 10/7/2024, Vol. 161 Issue 13, p1-1, 1p
Publication Year :
2024

Subjects

Subjects :
THIN films

Details

Language :
English
ISSN :
00219606
Volume :
161
Issue :
13
Database :
Complementary Index
Journal :
Journal of Chemical Physics
Publication Type :
Academic Journal
Accession number :
180155634
Full Text :
https://doi.org/10.1063/5.0237668