A high accuracy and high throughput electron beam reticle writing system for 16M dynamic random access memory class and beyond devices.

Details

Language :

English

ISSN :

0734211X

Volume :

8

Issue :

6

Database :

Complementary Index

Journal :

Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena

Publication Type :

Academic Journal

Accession number :

74326474

Full Text :

https://doi.org/10.1116/1.585177