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A high accuracy and high throughput electron beam reticle writing system for 16M dynamic random access memory class and beyond devices.
- Source :
- Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1990, Vol. 8 Issue 6, p1877-1881, 5p
- Publication Year :
- 1990
Details
- Language :
- English
- ISSN :
- 0734211X
- Volume :
- 8
- Issue :
- 6
- Database :
- Complementary Index
- Journal :
- Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena
- Publication Type :
- Academic Journal
- Accession number :
- 74326474
- Full Text :
- https://doi.org/10.1116/1.585177