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Aggressively scaled high-k last metal gate stack with low variability for 20nm logic high performance and low power applications.
- Source :
- 2011 Symposium on VLSI Technology (VLSIT); 2011, p32-33, 2p
- Publication Year :
- 2011
Details
- Language :
- English
- ISBNs :
- 9781424499496
- Database :
- Complementary Index
- Journal :
- 2011 Symposium on VLSI Technology (VLSIT)
- Publication Type :
- Conference
- Accession number :
- 80367811