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Control of Contact Hole Distortion by Using Polymer Deposition Process (PDP) for sub-65nm Technology and Beyond.
- Source :
- 17th Annual SEMI/IEEE ASMC 2006 Conference; 2006, p83-87, 5p
- Publication Year :
- 2006
Details
- Language :
- English
- ISBNs :
- 9781424402540
- Database :
- Complementary Index
- Journal :
- 17th Annual SEMI/IEEE ASMC 2006 Conference
- Publication Type :
- Conference
- Accession number :
- 81288433
- Full Text :
- https://doi.org/10.1109/ASMC.2006.1638728