Back to Search Start Over

Control of Contact Hole Distortion by Using Polymer Deposition Process (PDP) for sub-65nm Technology and Beyond.

Authors :
Judy Wang
Shing-li Sung
Shawming Ma
Source :
17th Annual SEMI/IEEE ASMC 2006 Conference; 2006, p83-87, 5p
Publication Year :
2006

Details

Language :
English
ISBNs :
9781424402540
Database :
Complementary Index
Journal :
17th Annual SEMI/IEEE ASMC 2006 Conference
Publication Type :
Conference
Accession number :
81288433
Full Text :
https://doi.org/10.1109/ASMC.2006.1638728