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Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition.
- Source :
- Chinese Physics; Jul2000, Vol. 9 Issue 7, p1-1, 1p
- Publication Year :
- 2000
Details
- Language :
- English
- ISSN :
- 10091963
- Volume :
- 9
- Issue :
- 7
- Database :
- Complementary Index
- Journal :
- Chinese Physics
- Publication Type :
- Academic Journal
- Accession number :
- 98344658
- Full Text :
- https://doi.org/10.1088/1009-1963/9/7/015