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Chemical trimming overcoat: an advanced spin-on process for photoresist enhancement in EUV lithography

Authors :
Guerrero, Douglas
Amblard, Gilles R.
Hou, Xisen
Cen, Yinjie
Baranowsky, Paul
Kang, Doris
Liu, Cong
Xu, Chengbai
Source :
Proceedings of SPIE; May 2023, Vol. 12498 Issue: 1 p124980Q-124980Q-8, 1124829p
Publication Year :
2023

Details

Language :
English
ISSN :
0277786X
Volume :
12498
Issue :
1
Database :
Supplemental Index
Journal :
Proceedings of SPIE
Publication Type :
Periodical
Accession number :
ejs63131849
Full Text :
https://doi.org/10.1117/12.2658882