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Superresolution lithography from the viewpoint of partially coherent imaging theory Part II: Isolated structures
- Source :
- Microelectronic Engineering. 26:93-106
- Publication Year :
- 1995
- Publisher :
- Elsevier BV, 1995.
-
Abstract
- From the viewpoint of partially coherent imaging theory we discuss the possibilities of modern optical methods in superresolution lithography for imaging of isolated structures. It could be shown that small isolated structures are nonresolved structures in the understanding of optical imaging theory. They can be described approximately by point objects. This results in a nearly plane-wave illumination of the pupil plane, so that the image intensity is mainly determined by the special filter function.
- Subjects :
- Physics
Plane (geometry)
business.industry
Filter (function)
Physics::Optics
Coherent imaging
Condensed Matter Physics
Superresolution
Atomic and Molecular Physics, and Optics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
law.invention
Optical imaging
Optics
law
Computer Science::Computer Vision and Pattern Recognition
Point (geometry)
Electrical and Electronic Engineering
Photolithography
business
Lithography
Subjects
Details
- ISSN :
- 01679317
- Volume :
- 26
- Database :
- OpenAIRE
- Journal :
- Microelectronic Engineering
- Accession number :
- edsair.doi...........171c0566692a920f69c15af2c781579a
- Full Text :
- https://doi.org/10.1016/0167-9317(94)00043-t