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Superresolution lithography from the viewpoint of partially coherent imaging theory Part II: Isolated structures

Authors :
R. Hild
G. Nitzsche
U. Altenburger
Source :
Microelectronic Engineering. 26:93-106
Publication Year :
1995
Publisher :
Elsevier BV, 1995.

Abstract

From the viewpoint of partially coherent imaging theory we discuss the possibilities of modern optical methods in superresolution lithography for imaging of isolated structures. It could be shown that small isolated structures are nonresolved structures in the understanding of optical imaging theory. They can be described approximately by point objects. This results in a nearly plane-wave illumination of the pupil plane, so that the image intensity is mainly determined by the special filter function.

Details

ISSN :
01679317
Volume :
26
Database :
OpenAIRE
Journal :
Microelectronic Engineering
Accession number :
edsair.doi...........171c0566692a920f69c15af2c781579a
Full Text :
https://doi.org/10.1016/0167-9317(94)00043-t