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New method for the preparation of S doped Fe samples characterized by AES and TOF-SIMS depth profiling
- Source :
- Surface and Interface Analysis. 46:1064-1067
- Publication Year :
- 2014
- Publisher :
- Wiley, 2014.
-
Abstract
- A new method for the preparation of sulfur (S) doped iron (Fe) samples is presented. The required amount of S in Fe is obtained by allowing the vaporized form of S to diffuse into a Fe sample (10 mm diameter, 0.5 mm thick) kept at a temperature of 750 K. Depth profile analysis using Auger Electron Spectroscopy and Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) showed that the method is reproducible and can be used for the preparation of samples with different S concentrations. It was also found that S deposited onto Fe forms the desired FeS phase, which will prevent S from evaporating when the sample is annealed. Prepared samples were annealed to obtain homogeneity of S in Fe, after which the amount of S in the respective samples was determined by quantitative TOF-SIMS. The outcome of the results suggests the application of this method to other high melting point host and low melting point dopant systems. Copyright © 2014 John Wiley & Sons, Ltd.
- Subjects :
- Auger electron spectroscopy
Materials science
Dopant
Doping
Analytical chemistry
chemistry.chemical_element
Low melting point
Surfaces and Interfaces
General Chemistry
Condensed Matter Physics
Sulfur
Surfaces, Coatings and Films
Secondary ion mass spectrometry
chemistry
Homogeneity (physics)
Materials Chemistry
Melting point
Subjects
Details
- ISSN :
- 01422421
- Volume :
- 46
- Database :
- OpenAIRE
- Journal :
- Surface and Interface Analysis
- Accession number :
- edsair.doi...........1ab25624fdb85ac92097c02e9382b734
- Full Text :
- https://doi.org/10.1002/sia.5448