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Two-dimensional MEMS array for maskless lithography and wavefront modulation
- Source :
- SPIE Proceedings.
- Publication Year :
- 2007
- Publisher :
- SPIE, 2007.
-
Abstract
- We review the fabrication process of a recently introduced phase only MEMS based spatial light modulators for maskless lithography. A brief description of this device is presented. The physical properties of its structural layers and the difficulties encountered during its fabrication process are described in detail.
Details
- ISSN :
- 0277786X
- Database :
- OpenAIRE
- Journal :
- SPIE Proceedings
- Accession number :
- edsair.doi...........238c7a8ea01034b8735dc0f85053ddb1