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A study of the oxygen precipitation kinetics in zirconium-doped silicon

Authors :
V. K. Prokof’eva
B. N. Rygalin
A. G. Grishin
V. V. Svetukhin
T. S. Il’ina
Source :
Technical Physics Letters. 28:962-963
Publication Year :
2002
Publisher :
Pleiades Publishing Ltd, 2002.

Abstract

The kinetics of oxygen precipitation at 900 and 1050°C was studied in Czochralski-grown silicon single crystals doped to various levels with zirconium. It is established that zirconium, while not participating in the nucleation of oxygen precipitates, decreases the concentration of interstitial oxygen in the crystals.

Details

ISSN :
10906533 and 10637850
Volume :
28
Database :
OpenAIRE
Journal :
Technical Physics Letters
Accession number :
edsair.doi...........2601f6f951aab80dba858cc76d329e5c
Full Text :
https://doi.org/10.1134/1.1526897