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The importance of nucleation layer for the GaN N-face purity on the annealed Al2O3 layers deposited by atomic layer deposition

Authors :
Marek Kolenda
Arūnas Kadys
Tadas Malinauskas
Edvinas Radiunas
Riina Ritasalo
Roland Tomašiūnas
Source :
Materials Science and Engineering: B. 284:115850
Publication Year :
2022
Publisher :
Elsevier BV, 2022.

Details

ISSN :
09215107
Volume :
284
Database :
OpenAIRE
Journal :
Materials Science and Engineering: B
Accession number :
edsair.doi...........284bf5fad8a4cf9e241cc01ef26f30f6
Full Text :
https://doi.org/10.1016/j.mseb.2022.115850