Back to Search
Start Over
Plasma-assisted chemical vapour deposition of diamond by hollow cathode arc discharge
- Source :
- Thin Solid Films. 219:4-6
- Publication Year :
- 1992
- Publisher :
- Elsevier BV, 1992.
- Subjects :
- Chemistry
business.industry
Metallurgy
Metals and Alloys
Diamond
Surfaces and Interfaces
Plasma
Chemical vapor deposition
engineering.material
Cathode
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
law.invention
Electric arc
Optics
law
Cathodic arc deposition
Materials Chemistry
engineering
business
Subjects
Details
- ISSN :
- 00406090
- Volume :
- 219
- Database :
- OpenAIRE
- Journal :
- Thin Solid Films
- Accession number :
- edsair.doi...........5549ccf11c12601bf99437d2574b30c0
- Full Text :
- https://doi.org/10.1016/0040-6090(92)90716-o