Back to Search Start Over

Ellipsometry and x-ray reflectometry characterization of self-assembly process of polystyrenesulfonate and polyallylamine

Authors :
Y. Lvov
A. Tronin
Claudio Nicolini
Source :
Colloid & Polymer Science. 272:1317-1321
Publication Year :
1994
Publisher :
Springer Science and Business Media LLC, 1994.

Abstract

Self-assembly of polyelectrolytes-polystyrenesulfonate (PSS) and polyallylamine (PAH) with added salts of MnCl and NaBr was studied by x-ray reflectometry and ellipsometry technique. The thickness of PSS-PAH bilayer was measured to be 5.1±0.2 nm according to reflectometry and 6.1±0.7 nm according to ellipsometry. The discrepancy in data is attributed to the difference in the interaction of the interfaces with x-rays and visible light. The films are found to be rather homogeneous and the deposition process regular. The refraction indices of the deposited films were found to ben0=1.50±0.05,k0=0.07±0.05,ne=1.53±0.05ke=0, optical axis being perpendicular to the surface. The values of refractivity characterize the whole film (up to seven bilayers) and do not vary with increasing thickness.

Details

ISSN :
14351536 and 0303402X
Volume :
272
Database :
OpenAIRE
Journal :
Colloid & Polymer Science
Accession number :
edsair.doi...........8f792960ea6252a8cef3e0d21b73ea4e