Thickness Uniformity of Large Area PZT Films Formed by Aerosol Deposition

Authors :: J. Akedo
A. Iwata
Source :: 2007 Sixteenth IEEE International Symposium on the Applications of Ferroelectrics.
Publication Year :: 2007
Publisher :: IEEE, 2007.
Abstract: PZT films were deposited on 4 inch silicon wafer substrate by aerosol deposition, based on room temperature impact consolidation (RTIC). A nozzle that blowed out aerosol beam scanned the wafer. The film thickness was evaluated through the measurements with step height of masked edges. The aerosol deposited films showed relatively good uniformity of thickness of 1.4%. The surface roughness was Ra 59 nm.

Subjects :: Materials science
Silicon
Nozzle
chemistry.chemical_element
Aerosol
Aerosol deposition
chemistry
visual_art
visual_art.visual_art_medium
Surface roughness
Wafer
Ceramic
Thin film
Composite material

ISSN :: 10994734
Database :: OpenAIRE
Journal :: 2007 Sixteenth IEEE International Symposium on the Applications of Ferroelectrics
Accession number :: edsair.doi...........bed81e54f3e5dacc111f784a494e1140
Full Text :: https://doi.org/10.1109/isaf.2007.4393294