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Investigation of ZrSi2 for application to EUV pellicle
- Source :
- International Conference on Extreme Ultraviolet Lithography 2022.
- Publication Year :
- 2022
- Publisher :
- SPIE, 2022.
Details
- Database :
- OpenAIRE
- Journal :
- International Conference on Extreme Ultraviolet Lithography 2022
- Accession number :
- edsair.doi...........c29a81153cdd13fea62180dab216fef9
- Full Text :
- https://doi.org/10.1117/12.2641822