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Investigation of ZrSi2 for application to EUV pellicle

Authors :
Seong Ju Wi
Chang Soo Kim
Haneul Kim
Jaehyuck Choi
Kyoung-Won Seo
Jinho Ahn
Source :
International Conference on Extreme Ultraviolet Lithography 2022.
Publication Year :
2022
Publisher :
SPIE, 2022.

Details

Database :
OpenAIRE
Journal :
International Conference on Extreme Ultraviolet Lithography 2022
Accession number :
edsair.doi...........c29a81153cdd13fea62180dab216fef9
Full Text :
https://doi.org/10.1117/12.2641822