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Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiNx Films Using Trichlorodisilane for Etch-Resistant Coatings
- Source :
- ACS Applied Nano Materials. 4:2558-2564
- Publication Year :
- 2021
- Publisher :
- American Chemical Society (ACS), 2021.
-
Abstract
- In recent times, the requirements have become extremely stringent for employing silicon nitride (SiNx) films in various types of applications. For instance, high etch resistance coating is required...
Details
- ISSN :
- 25740970
- Volume :
- 4
- Database :
- OpenAIRE
- Journal :
- ACS Applied Nano Materials
- Accession number :
- edsair.doi...........eb5391f4ee58adf1e60a4537f6199180
- Full Text :
- https://doi.org/10.1021/acsanm.0c03203