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Expected performance of digital scanner and the potential application for advanced semiconductor fabrication

Authors :
Yoji Watanabe
Yuho Kanaya
Yusuke Saito
Toshiaki Sakamoto
Kazuo Masaki
Soichi Owa
Thomas Koo
Bryant Lin
Michael Tan
David Tseng
Conrad Sorensen
Sujuan Li
Steve Renwick
Noriyuki Hirayanagi
Bausan Yuan
Source :
Optical and EUV Nanolithography XXXVI.
Publication Year :
2023
Publisher :
SPIE, 2023.

Details

Database :
OpenAIRE
Journal :
Optical and EUV Nanolithography XXXVI
Accession number :
edsair.doi...........ec4fda250b7401c4c0166c6b01d7f229

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