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Effect of oxide layer growth conditions on radiation detection performance of Ni/SiO2/epi-4H-SiC MOS capacitors

Authors :
OmerFaruk Karadavut
Sandeep K. Chaudhuri
Joshua W. Kleppinger
Ritwik Nag
Krishna C. Mandal
Source :
Journal of Crystal Growth. 584:126566
Publication Year :
2022
Publisher :
Elsevier BV, 2022.

Details

ISSN :
00220248
Volume :
584
Database :
OpenAIRE
Journal :
Journal of Crystal Growth
Accession number :
edsair.doi...........f7c925a7f5e9c777a83379256920c7b7
Full Text :
https://doi.org/10.1016/j.jcrysgro.2022.126566