Use of Supramolecular Assemblies as Lithographic Resists

Authors :: Scott M. Lewis
George F. S. Whitehead
Fredrik Schedin
Guy A. DeRose
Stephen G. Yeates
Jesús Ferrando-Soria
Axel Scherer
Grigore A. Timco
Richard E. P. Winpenny
Hayden R. Alty
Sarah Varey
Matthew S. Hunt
Andreas K. Kostopoulos
Agnese Lagzda
Antonio Fernandez
Christopher A. Muryn
Source :: Lewis, S, Fernandez Mato, A, DeRose, G A, Hunt, M, Whitehead, G, Lagzda, A, Alty, H, Ferrando Soria, J, Varey, S, Kostopoulos, A, Schedin, B, Muryn, C, Timco, G, Scherer, A, Yeates, S & Winpenny, R 2017, ' Use of Supramolecular Assemblies as Lithographic Resists ', Angewandte Chemie-International Edition, vol. 56, no. 24 . https://doi.org/10.1002/anie.201700224
Publication Year :: 2017
Publisher :: Wiley, 2017.
Abstract: We show that by design we can create a new resist materials for electron beam lithography, based on a supramolecular assembly. The initial studies show that via this supramolecular approach high resolution structures can be written which showunprecedented selectivity when exposed to etch conditions involving plasmas.