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Threshold voltage variation in SOI Schottky-barrier MOSFETs

Authors :
Min Zhang
Knoch, Joachim
Shi-Li Zhang
Feste, Sebastian
Schroter, Michael
Mantl, Siegfried
Source :
IEEE Transactions on Electron Devices. March, 2008, Vol. 55 Issue 3, p858, 8 p.
Publication Year :
2008

Abstract

The threshold voltage variation in Schottky-barrier (SB) MOSFETs with different geometric parameters as well as devices with dopant segregation is examined. A multigate structure has suppressed the threshold voltage variation by improving carrier injection by reducing its sensitivity to the SB height inhomogeneity.

Details

Language :
English
ISSN :
00189383
Volume :
55
Issue :
3
Database :
Gale General OneFile
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
edsgcl.176716945