Back to Search
Start Over
Mechanism of the formation of hydrogen-induced interface states for Pt/silicon oxide/Si metal-oxide-semiconductor tunneling diodes
- Source :
- Journal of Applied Physics. Dec 1, 1995, Vol. 78 Issue 11, p6554, 8 p.
- Publication Year :
- 1995
Details
- ISSN :
- 00218979
- Volume :
- 78
- Issue :
- 11
- Database :
- Gale General OneFile
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.18022683