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Mechanism of the formation of hydrogen-induced interface states for Pt/silicon oxide/Si metal-oxide-semiconductor tunneling diodes

Authors :
Kobayashi, H.
Iwadate, H.
Kogetsu, Y.
Nakato, Y.
Source :
Journal of Applied Physics. Dec 1, 1995, Vol. 78 Issue 11, p6554, 8 p.
Publication Year :
1995

Details

ISSN :
00218979
Volume :
78
Issue :
11
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.18022683