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Composition influence on the physical and electrical properties of [Sr.sub.x][Ti.sub.1-x][O.sub.y]-based metal-insulator-metal capacitors prepared by atomic layer deposition using TiN bottom electrodes

Authors :
Menou, N.
Popovici, M.
Clima, S.
Opsomer, K.
Polspoel, W.
Kaczer, B.
Rampelberg, G.
Tomida, K.
Pawlak, M.A.
Detavernier, C.
Pierreux, D.
Swerts, J.
Maes, J.W.
Manger, D.
Badylevich, M.
Source :
Journal of Applied Physics. Nov 1, 2009, Vol. 106 Issue 9, 094101-1-094101-7
Publication Year :
2009

Abstract

The physical and electrical properties of [Sr.sub.x][Ti.sub.1-x][O.sub.y] (STO)-based metal-insulator-metal capacitors (MIMcaps) with various compositions are analyzed. The intercept of EOT vs physical thickness plot has shown that increasing the Sr-content at the film interface with the bottom TiN has resulted in lower interfacial equivalent-oxide thickness.

Details

Language :
English
ISSN :
00218979
Volume :
106
Issue :
9
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.215330543