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Closed-loop bias voltage control for plasma etching

Authors :
Patrick, Roger
Baldwin, Scott
Williams, Norman
Source :
Solid State Technology. February, 2000, Vol. 43 Issue 2, p59
Publication Year :
2000

Abstract

The stated goal for high-density etchers of completely decoupling plasma generation from ion energy control cannot be achieved with conventional methods of monitoring RF power delivery. By using a closed-loop […]

Subjects

Subjects :
Plasma etching -- Design and construction -- Product information
Metal products industry -- Product information
Engraving -- Product information

Details

Language :
English
ISSN :
0038111X
Volume :
43
Issue :
2
Database :
Gale General OneFile
Journal :
Solid State Technology
Publication Type :
Periodical
Accession number :
edsgcl.60111270

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